Mask frame and method for manufacturing the same, mask assembly for evaporation and evaporation apparatus

US11205752B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11205752-B2
Application numberUS-201816768582-A
CountryUS
Kind codeB2
Filing dateOct 11, 2018
Priority dateMar 28, 2018
Publication dateDec 21, 2021
Grant dateDec 21, 2021

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A mask frame and a method for manufacturing the same, a mask assembly for evaporation and an evaporation apparatus are provided. The mask frame includes a frame body. The frame body includes a plurality of frame members, and the frame body comprises a first surface and a second surface opposite to each other. A plurality of grooves are provided at intervals on the first surface of each of the plurality of frame members and along an extending direction of the frame member, and each groove is formed by the first surface recessing towards the second surface, and has a groove depth in a direction perpendicular to the first surface. For the plurality of grooves in each frame member, a groove depth of the groove at a middle position of the frame member is smaller than the grooves at two ends of the frame member.

First claim

Opening claim text (preview).

What is claimed is: 1. A mask frame, comprising a frame body, wherein the frame body comprises four of frame members, and the frame body comprises a first surface and a second surface opposite to each other; a plurality of grooves are provided at intervals on the first surface of each of the frame members and along an extending direction of the frame member, and each of the plurality of grooves is formed by the first surface recessing towards the second surface, and has a groove depth in a direction perpendicular to the first surface; and for the plurality of grooves in each of the frame members, the groove depth of the groove at a middle position of the frame member is smaller than the groove depths of the grooves at two ends of the frame member. 2. The mask frame according to claim 1 , wherein the groove depths of the plurality of grooves in each frame member are gradually increased from the middle position of the frame member to the two ends of the frame member. 3. The mask frame according to claim 2 , wherein among the plurality of grooves in each frame member, a distance between any two adjacent grooves in the extending direction of the frame member is equal to a distance between any other two adjacent grooves in the extending direction of the frame member, and a difference between the groove depths of each two adjacent grooves is a predetermined value. 4. The mask frame according to claim 1 , wherein among the plurality of grooves in each frame member, a difference between the groove depths of each two adjacent grooves ranges from 1 microns to 10 microns. 5. The mask frame according to claim 1 , wherein the plurality of grooves in each frame member are symmetrically distributed in the frame member with respect to an axis of symmetry, and the axis of symmetry passes through a center point between two ends of the frame member, and is perpendicular to the first surface. 6. The mask frame according to claim 1 , wherein among a pair of oppositely arranged frame members, a plurality of grooves in one of the frame members are provided in a one-to-one correspondence with a plurality of grooves in the other frame member, and the groove depth of each groove in one of the frame members is the same as the groove depth of another groove in the other frame member and corresponding to the each groove. 7. The mask frame according to claim 1 , wherein a difference between the groove depths of any two grooves is smaller than or equal to 100 microns. 8. A mask assembly for evaporation, comprising: a first mask, wherein the first mask comprises a plurality of supporting bars and a plurality of covering bars arranged in a crisscross manner; a second mask stacked on the first mask, the second mask being a fine metal mask (FMM); and a mask frame comprising a frame body, wherein the frame body comprises four frame members, and the frame body comprises a first surface and a second surface opposite to each other; a plurality of grooves are provided at intervals on the first surface of each of the frame members and along an extending direction of the frame member, and each of the plurality of grooves is formed by the first surface recessing towards the second surface, and has a groove depth in a direction perpendicular to the first surface; and for the plurality of grooves in each of the frame members, the groove depth of the groove at a middle position of the frame member is smaller than the groove depths of the grooves at two ends of the frame member, wherein two ends of each of the plurality of supporting bars are respectively welded into grooves of a pair of oppositely arranged frame members in the four frame members of the mask frame, two ends of each of the plurality of covering bars are respectively welded into grooves of another pair of oppositely arranged frame members in the four frame members of the mask frame, and peripheral edges of the second mask are welded onto the first surface of the mask frame. 9. The mask assembly for evaporation according to claim 8 , wherein groove bottoms of grooves in each pair of oppositely arranged frame members in the mask frame are in a same plane, so that the plurality of the covering bars are in a same plane, and the plurality of supporting bars are in a same plane. 10. An evaporation apparatus, comprising the mask assembly for evaporation according to claim 8 . 11. The mask assembly for evaporation according to claim 8 , wherein the groove depths of the plurality of grooves in each frame member are gradually increased from the middle position of the frame member to the two ends of the frame member. 12. The mask assembly for evaporation according to claim 11 , wherein among the plurality of grooves in each frame member, a distance between any two adjacent grooves in the extending direction of the frame member is equal to a distance between any other two adjacent grooves in the extending direction of the frame member, and a difference between the groove depths of each two adjacent grooves is a predetermined value. 13. The mask assembly for evaporation according to claim 8 , wherein among the plurality of grooves in each frame member, a difference between the groove depths of each two adjacent grooves ranges from 1 microns to 10 microns. 14. The mask assembly for evaporation according to claim 8 , wherein the plurality, of grooves in each frame member is symmetrically distributed in the frame member with respect to an axis of symmetry, and the axis of symmetry passes through a center point between two ends of the frame member, and is perpendicular to the first surface. 15. The mask assembly for evaporation according to claim 8 , wherein among a pair of oppositely arranged frame members, a plurality of grooves in one of the frame members are provided in a one-to-one correspondence with a plurality of grooves in the other frame member, and the groove depth of each groove in one of the frame members is the same as the groove depth of another groove in the other frame member and corresponding to the each groove. 16. The mask assembly for evaporation according to claim 8 , wherein a difference between the groove depths of any two grooves is smaller than or equal to 100 microns. 17. A method for manufacturing the mask frame according to claim 1 , wherein the method comprises: obtaining a groove depth compensation value Δh for each of the plurality of grooves, wherein the groove depth compensation value Δh is used to compensate a sinking amount h of the mask at a position corresponding to each groove, to make a plurality of the covering bars in a same plane, and to make a plurality of supporting bars in a same plane; determining a groove depth value H of each groove according to the groove depth compensation value Δh; and providing the frame body, and setting the plurality of grooves in the frame body according to the groove depth value H. 18. The method according to claim 17 , wherein the obtaining the groove depth compensation value Δh for each of the plurality of grooves comprises: providing a sample of an evaporation mask, wherein the sample of the evaporation mask comprises an initial mask frame, an initial auxiliary mask and an initial fine mask (FMM), and the initial auxiliary mask comprises a plurality of initial supporting bars and a plurality of initial covering bars arranged in a crisscross manner; detecting the sinking amount h of each of the plurality of initial supporting bars and the plurality of initial covering bars in the sample of the evaporation mask; obtaining, according to the sinking amount h, the groove depth co

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11205752B2 cover?
A mask frame and a method for manufacturing the same, a mask assembly for evaporation and an evaporation apparatus are provided. The mask frame includes a frame body. The frame body includes a plurality of frame members, and the frame body comprises a first surface and a second surface opposite to each other. A plurality of grooves are provided at intervals on the first surface of each of the p…
Who is the assignee on this patent?
Ordos Yuansheng Optoelectronics Co Ltd, Boe Technology Group Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C14/12. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 21 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).