Polymer, organic layer composition, and method of forming patterns

Patent metadata

Field	Value
Publication number	US-11203662-B2
Application number	US-201716339451-A
Country	US
Kind code	B2
Filing date	Jul 21, 2017
Priority date	Nov 10, 2016
Publication date	Dec 21, 2021
Grant date	Dec 21, 2021

Abstract

Disclosed are a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, an organic layer composition including the polymer, and a method of forming patterns using the organic layer composition.The Chemical Formulae 1 and 2 are the same as defined in the specification.

First claim

What is claimed is:

1. A polymer comprising
a structural unit represented by Chemical Formula 1, and
a structural unit represented by Chemical Formula 2:

wherein, in Chemical Formulae 1 and 2,
A 1 is a moiety represented by Chemical Formula X,
A 2 is one of substituted or unsubstituted moieties of Group 1-1,
B 1 and B 2 are independently a substituted or unsubstituted C6 to C30 aromatic ring, and * is a linking point:

wherein, in Chemical Formula X,
Ar is a substituted or unsubstituted hexagonal ring, or a C7 to C14 fused ring thereof,
R a is hydrogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkynyl group, or a substituted or unsubstituted C6 to C30 aryl group,
Z a is a substituted or unsubstituted indole, and
m is 0 or 1,

2. The polymer of claim 1 , wherein in Chemical Formulae 1 and 2, B 1 and B 2 are independently one of substituted or unsubstituted moieties of Group 1:

3. The polymer of claim 1 , wherein in Chemical Formula 1, A 1 is one of moieties of Group 2:

wherein, in Group 2,
R 1 and R 2 are independently hydrogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, or a combination thereof:
provided that in Group 2, hydrogen of each moiety is independently replaced or unreplaced by a hydroxy group, a halogen, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, or a combination thereof.

4. The polymer of claim 1 , wherein A 2 is substituted with at least one hydroxy group.

5. The polymer of claim 1 , wherein in Chemical Formulae 1 and 2, B 1 and B 2 are a substituted or unsubstituted C6 to C30 aromatic ring and have the same structure.

6. The polymer of claim 1 , wherein a weight average molecular weight is 1,000 to 200,000.

7. An organic layer composition, comprising
a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and
a solvent:

wherein, in Chemical Formulae 1 and 2,
A 1 is a moiety represented by Chemical Formula X,
A 2 is one of substituted or unsubstituted moieties of Group 1-1,
B 1 and B 2 are independently a substituted or unsubstituted C6 to C30 aromatic ring, and
* is a linking point:

wherein, in Chemical Formula X,
Ar is a substituted or unsubstituted hexagonal ring, or a C7 to C14 fused ring thereof,
R a is hydrogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkynyl group, or a substituted or unsubstituted C6 to C30 aryl group,
Z a is a substituted or unsubstituted indole, and
m is 0 or 1,

8. The organic layer composition of claim 7 , wherein in Chemical Formula 1, A 1 is one of moieties of Group 2:

wherein, in Group 2,
R 1 and R 2 are independently hydrogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, or a combination thereof:
provided that in Group 2, hydrogen of each moiety is independently replaced or unreplaced by a hydroxy group, a halogen, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, or a combination thereof.

9. The organic layer composition of claim 7 , wherein A 2 is substituted with at least one hydroxy group.

10. The organic layer composition of claim 7 , wherein in Chemical Formulae 1 and 2, B 1 and B 2 are a substituted or unsubstituted C6 to C30 aromatic ring and have the same structure.

11. The organic layer composition of claim 7 , wherein weight average molecular weight of the polymer is 1,000 to 200,000.

12. The organic layer composition of claim 7 , wherein the polymer is included in an amount of 0.1 wt % to 30 wt % based on the total amount of the organic layer composition.

13. A method of forming patterns, comprising
providing a material layer on a substrate,
applying the organic layer composition of claim 7 on the material layer,
heat-treating the organic layer composition to form a hardmask layer,
forming a silicon-containing thin layer on the hardmask layer,
forming a photoresist layer on the silicon-containing thin layer,
exposing and developing the photoresist layer to form a photoresist pattern,
selectively removing the silicon-containing thin layer and the hardmask layer using the photoresist pattern to expose a part of the material layer, and
etching an exposed part of the material layer.

14. The method of claim 13 , wherein organic layer composition is applied using a spin-on coating method.

15. The method of claim 13 , wherein the method further includes forming a bottom antireflective coating (BARC) before forming the photoresist layer.

Assignees

• Samsung Sdi Co Ltd

Inventors

• Jung Hyeonil
• Kim Sunghwan
• Kim Seunghyun
• Park Yushin
• Lim Jaebum

Classifications

• H10P50/692

  characterised by their composition, e.g. multilayer masks or materials · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• H10P50/71

  using masks for conductive or resistive materials · CPC title

• H10P76/2043

  using an anti-reflective coating · CPC title

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title