Gas barrier film and method for producing gas barrier film

Patent metadata

Field	Value
Publication number	US-11203180-B2
Application number	US-201916658372-A
Country	US
Kind code	B2
Filing date	Oct 21, 2019
Priority date	May 19, 2017
Publication date	Dec 21, 2021
Grant date	Dec 21, 2021

Abstract

A gas barrier film has, in sequence, a support, an inorganic layer disposed on one surface side of the support, an adhesive layer disposed on a surface of the inorganic layer, and a resin layer disposed on a surface of the adhesive layer in which the adhesive layer has a thickness of 15 μm or less, and the adhesion strength between the inorganic layer and the adhesive layer is 21 N/25 mm or more and 60 N/25 mm or less. A method for producing a gas barrier film includes an inorganic layer deposition step and a bonding step in a vacuum.

First claim

What is claimed is:

1. A gas barrier film comprising, in sequence:
a support;
an inorganic layer disposed on one surface side of the support;
an adhesive layer disposed on a surface of the inorganic layer; and
a resin layer disposed on a surface of the adhesive layer,
wherein the adhesive layer and the inorganic layer chemically bond to each other,
the adhesive layer has a thickness d 1 of 15 μm or less, and
an adhesion strength between the inorganic layer and the adhesive layer is 21 N/25 mm or more and 60 N/25 mm or less.

2. The gas barrier film according to claim 1 , wherein a refractive index n 2 of the resin layer and a refractive index n 3 of the support satisfy a relationship of n 2 <n 3 .

3. The gas barrier film according to claim 1 , wherein a thickness d 2 of the resin layer and the thickness d 1 of the adhesive layer satisfy a relationship of d 1 <d 2 .

4. The gas barrier film according to claim 1 , wherein a thickness d 3 of the support and the thickness d 1 of the adhesive layer satisfy a relationship of d 1 <d 3 .

5. The gas barrier film according to claim 1 , wherein the gas barrier film has a haze of 3% or less.

6. The gas barrier film according to claim 1 , wherein the refractive index n 2 of the resin layer is 1.38 or more and 1.65 or less.

7. The gas barrier film according to claim 1 , wherein the resin layer contains a fluorocarbon resin.

8. The gas barrier film according to claim 1 ,
wherein the adhesive layer includes at least one of acrylic, silicone, or urethane, and
a refractive index n 1 of the adhesive layer is 1.38 or more and 1.65 or less.

9. The gas barrier film according to claim 3 ,
wherein the adhesive layer includes at least one of acrylic, silicone, or urethane, and
a refractive index n 1 of the adhesive layer is 1.38 or more and 1.65 or less.

10. The gas barrier film according to claim 6 ,
wherein the adhesive layer includes at least one of acrylic, silicone, or urethane, and
a refractive index ni of the adhesive layer is 1.38 or more and 1.65 or less.

11. The gas barrier film according to claim 7 ,
wherein the adhesive layer includes at least one of acrylic, silicone, or urethane, and
a refractive index n 1 of the adhesive layer is 1.38 or more and 1.65 or less.

12. The gas barrier film according to claim 1 , further comprising an underlayer between the support and the inorganic layer.

13. The gas barrier film according to claim 1 , wherein at least one of the adhesive layer, the resin layer, or the support contains an ultraviolet absorber.

14. The gas barrier film according to claim 1 , further comprising an underlayer between the support, and the inorganic layer
wherein at least one of the adhesive layer, the resin layer, or the support contains an ultraviolet absorber,
the resin layer contains a fluorocarbon resin,
the adhesive layer includes at least one of acrylic, silicone, or urethane,
a refractive index n 1 of the adhesive layer is 1.38 or more and 1.65 or less,
the refractive index n 2 of the resin layer is 1.38 or more and 1.65 or less,
a refractive index n 2 of the resin layer and a refractive index n 3 of the support satisfy a relationship of n 2 <n 3 ,
a thickness d 2 of the resin layer and the thickness d 1 of the adhesive layer satisfy a relationship of d 1 <d 2 ,
a thickness d 3 of the support and the thickness d 1 of the adhesive layer satisfy a relationship of d 1 <d 3 , and
the gas barrier film has a haze of 3% or less.

15. A method for producing the gas barrier film of claim 1 , comprising, in a vacuum:
an inorganic layer deposition step of depositing an inorganic layer on one surface side of a support by plasma chemical vapor deposition (CND); and
immediately after the inorganic layer deposition step, a bonding step of bonding a laminate film having an adhesive layer and a resin layer onto the inorganic layer such that the adhesive layer and the inorganic layer face each other.

16. The method for producing a gas barrier film according to claim 15 , wherein the inorganic layer deposition step and the bonding step are performed in a vacuum while a second support is transported in a longitudinal direction.

17. The method for producing a gas barrier film according to claim 15 , further comprising:
an underlayer formation step of forming an underlayer on the support,
wherein in the inorganic layer deposition step, an inorganic layer is deposited on a surface of the underlayer by plasma CVD.

18. The method for producing a gas barrier film according to claim 15 ,
wherein the laminate film further has a release film disposed on a surface thereof on the adhesive layer side, and
in the bonding step, the laminate film is bonded onto the inorganic layer with the release film being separated.

Assignees

• Fujifilm Corp

Inventors

• Iwase Eijiro

Classifications

• H10K59/87

  Passivation; Containers; Encapsulations · CPC title

• B32B7/023 Primary

  Optical properties · CPC title

• B32B37/12 Primary

  characterised by using adhesives · CPC title

• B32B27/365

  comprising polycarbonates · CPC title

• C08J2327/18

  Homopolymers or copolymers of tetrafluoroethylene · CPC title