Material

US11198643B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11198643-B2
Application numberUS-201916270735-A
CountryUS
Kind codeB2
Filing dateFeb 8, 2019
Priority dateFeb 8, 2012
Publication dateDec 14, 2021
Grant dateDec 14, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.

First claim

Opening claim text (preview).

The invention claimed is: 1. A substrate comprising an ion-implanted layer wherein said ion implanted layer extends into the substrate substantially from a surface of the substrate to a penetration depth of at least 50 nm, wherein the ion-implanted layer has a substantially uniform distribution of the implanted ions substantially from the surface of the substrate, wherein the ion implanted layer has an implanted ion density of at least 10 21 ions cm −3 , wherein the ion implanted layer comprises two or more zones, and wherein two or more of the zones overlap, the overlapping zones comprising different ions. 2. A substrate according to claim 1 where the penetration depth of the implanted ions is at least 200 nm or at least 500 nm. 3. A substrate according to claim 1 wherein the ion implanted layer has an implanted ion density of at least 10 23 ions cm −3 . 4. A substrate according to claim 1 wherein the substrate is a glass selected from silica, silicate, phosphate, tellurite, tellurite derivatives, germanate, bismuthate, borates, acetates, halides, chalcogenides and solgel route glasses. 5. A substrate according to claim 1 wherein the substrate is an optical polymer. 6. A substrate according to claim 5 wherein the optical polymer is selected from Poly(methyl methacrylate), polyvinyl alcohol, polyether ether ketone, polyethylene terephthalate, polyimide, polypropylene, and polytetrafluoroethylene. 7. A substrate according to claim 1 wherein the ion is a cation. 8. A substrate according to claim 7 wherein the cation is selected from the group Nd(3+), Yb(3+), Er(3+), Tm(3+), Pr(3+), Ho(3+), Sm(3+), Eu(3+), Tb(3+), Ce(3+) and La (3+). 9. A substrate according to claim 1 wherein the substrate is a waveguide. 10. A substrate according to claim 1 wherein the substrate is a waveguide of a biosensor or the substrate is provided in a photonic chip of a biosensor. 11. A method for the non-invasive measurement of a metabolite in an animal which comprises: (i) applying a biosensor on or near said animal, said biosensor comprising said substrate of claim 10 ; (ii) irradiating said substrate or waveguide with a light source such that a portion of the light escapes into the animal; (iii) measuring the photoluminescence lifetime of the escaped light; wherein the recovery lifetime is correlated with the level of the metabolite.

Assignees

Inventors

Classifications

  • containing silica · CPC title

  • Surface property or characteristic of web, sheet or block · CPC title

  • by explosion; by evaporation and subsequent ionisation of the vapours {, e.g. ion-plating}(C23C14/34 - C23C14/48 take precedence) · CPC title

  • using optical sensors, e.g. spectral photometrical oximeters · CPC title

  • Silicon · CPC title

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Frequently asked questions

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What does patent US11198643B2 cover?
The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon …
Who is the assignee on this patent?
Univ Leeds Innovations Ltd
What technology area does this patent fall under?
Primary CPC classification C03C23/0055. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 14 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).