Flexible and stretchable graphene film and preparing method of the same
US-2015273737-A1 · Oct 1, 2015 · US
Graphene structure and method for manufacturing graphene having wrinkle pattern
US11198612B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11198612-B2 |
| Application number | US-201816214908-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 10, 2018 |
| Priority date | Jun 10, 2016 |
| Publication date | Dec 14, 2021 |
| Grant date | Dec 14, 2021 |
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Abstract
Official abstract text for this publication.
A method for manufacturing graphene having a wrinkle pattern is provided. The method includes forming a wrinkle providing layer having a first thermal expansion coefficient on one surface of a graphene layer, forming a substrate having a second thermal expansion coefficient on one surface of the wrinkle providing layer, and performing a heat treatment to form wrinkles on the wrinkle providing layer by a difference between the first and second thermal expansion coefficients, thereby forming wrinkle patterns on the graphene layer.
First claim
Opening claim text (preview).
What is claimed is: 1. A graphene structure comprising: a substrate having a first side and a second side longer than the first side; a wrinkle providing layer formed on the substrate and having wrinkles in a direction parallel to the first side; and a graphene layer formed on the wrinkle providing layer and having wrinkle patterns in a direction parallel to the first side so as to correspond to the wrinkles, wherein the substrate includes protrusion regions in contact with the wrinkle providing layer and concave regions non-contacting with the wrinkle providing layer on a surface interfaced with the wrinkle providing layer, and the wrinkle patterns are formed on the concave regions. 2. The graphene structure of claim 1 , wherein the wrinkle providing layer has a first thermal expansion coefficient, and the substrate has a second thermal expansion coefficient greater than the first thermal expansion coefficient. 3. The graphene structure of claim 1 , wherein the substrate is formed of a material softer than the wrinkle providing layer. 4. The graphene structure of claim 1 , wherein the wrinkle providing layer is formed of at least one of SiO 2 , PMMA, or PVP. 5. The graphene structure of claim 1 , wherein the substrate is a flexible substrate.
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Classifications
Silica; Hydrates thereof, e.g. lepidoic silicic acid · CPC title
Other morphology not specified above · CPC title
Graphene · CPC title
Homopolymers or copolymers of N-vinyl-pyrrolidones · CPC title
Manufacture or treatment of nanostructures · CPC title
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- What does patent US11198612B2 cover?
- A method for manufacturing graphene having a wrinkle pattern is provided. The method includes forming a wrinkle providing layer having a first thermal expansion coefficient on one surface of a graphene layer, forming a substrate having a second thermal expansion coefficient on one surface of the wrinkle providing layer, and performing a heat treatment to form wrinkles on the wrinkle providing l…
- Who is the assignee on this patent?
- Iucf Hyu
- What technology area does this patent fall under?
- Primary CPC classification C01B32/194. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Dec 14 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).