Conversion of boron nitride into n-type and p-type doped cubic boron nitride and structures
US-2017037540-A1 · Feb 9, 2017 · US
US11189774B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11189774-B2 |
| Application number | US-201816614686-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 31, 2018 |
| Priority date | May 31, 2017 |
| Publication date | Nov 30, 2021 |
| Grant date | Nov 30, 2021 |
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Certain embodiments involve processes or systems for creating various high-temperature superconductive structures or materials. For example, a method can involve depositing a first layer of boron and a second layer of un-doped amorphous carbon on a substrate. The un-doped amorphous carbon is ferromagnetic. The first layer of boron and the second layer of un-doped amorphous carbon are melted by a laser pulse to form a melted boron-doped amorphous carbon. The melted boron-doped amorphous carbon is quenched to create a quenched boron-doped amorphous carbon that is diamagnetic and superconducting. The quenched melted boron-doped amorphous carbon includes a mixture of sp3 bonded carbon atoms and sp2 bonded carbon atoms and a superconducting transition temperature of the quenched boron-doped amorphous carbon is much higher than diamond and increases based on a boron concentration. Undoped Q-carbon is ferromagnetic with Curie temperature above 500K.
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What is claimed is: 1. A method comprising: depositing a first layer of boron and a second layer of un-doped amorphous carbon on a substrate, wherein the un-doped amorphous carbon is diamagnetic; melting the first layer of boron and the second layer of un-doped amorphous carbon by a laser pulse to form a melted boron-doped amorphous carbon; and quenching the melted boron-doped amorphous carbon to create a quenched boron-doped amorphous carbon that is diamagnetic and superconducting, wherein the quenched melted boron-doped amorphous carbon comprises a mixture of sp3 bonded carbon atoms and sp2 bonded carbon atoms and a superconducting transition temperature (T c ) of the quenched boron-doped amorphous carbon increases based on a boron concentration and is higher than a superconducting transition temperature of diamond. 2. The method of claim 1 , wherein depositing the first layer of boron and the second layer of un-doped amorphous carbon on the substrate comprises: depositing the first layer of boron or the second layer of un-doped amorphous carbon on the substrate to a thickness between approximately 100 nanometers (nm) and 500 nm at a temperature between approximately 30 degrees Celsius and 300 degrees Celsius and between approximately 1.0E minus 6 torr operating pressure. 3. The method of claim 1 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is at least 35 K and the quenched boron-doped amorphous carbon has an upper critical field of approximately 5.4 T at 0 K. 4. The method of claim 1 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is between 35.5 K and 36.5 K. 5. The method of claim 1 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is between 37 K and 55 K. 6. The method of claim 1 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is at least 55 K. 7. The method of claim 1 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is up to 37 K and the quenched boron-doped amorphous carbon comprises approximately seventeen atomic percent boron atoms. 8. The method of claim 1 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is up to 55 K and the quenched boron-doped amorphous carbon comprises approximately twenty five atomic percent boron atoms. 9. The method of claim 1 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is above 100K and the quenched boron-doped amorphous carbon comprises approximately fifty atomic percent boron atoms. 10. The method of claim 1 , wherein the quenched un-doped amorphous carbon shows ambient temperature ferromagnetism with a Curie temperature above 500 K. 11. The method of claim 1 , wherein the substrate comprises sapphire. 12. A product formed by the method of claim 1 . 13. A method comprising: depositing a first layer of boron and a second layer of un-doped amorphous carbon on a substrate by: depositing the first layer of boron or the second layer of un-doped amorphous carbon on the substrate to a thickness between approximately 100 nanometers (nm) and 500 nm; melting the first layer of boron and the second layer of un-doped amorphous carbon by a laser pulse to form a melted boron-doped amorphous carbon; and quenching the melted boron-doped amorphous carbon to create a quenched boron-doped amorphous carbon that is diamagnetic and superconducting, wherein the quenched melted boron-doped amorphous carbon comprises a mixture of sp3 bonded carbon atoms and sp2 bonded carbon atoms and wherein a superconducting transition temperature (T c ) of the quenched boron-doped amorphous carbon increases based on a boron concentration and is higher than a superconducting transition temperature of diamond. 14. The method of claim 13 , wherein depositing the first layer of boron and the second layer of amorphous carbon on the substrate further comprises: depositing the first layer of boron or the second layer of un-doped amorphous carbon on the substrate at a temperature between approximately 30 degrees Celsius and 300 degrees Celsius and between approximately 1.0E minus 6 torr operating pressure. 15. The method of claim 13 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is at least 35 K and the quenched boron-doped amorphous carbon has an upper critical field of approximately 5.4 T at 0 K. 16. The method of claim 13 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is between 35.5 K and 36.5 K. 17. The method of claim 13 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is between 37 K and 55 K. 18. The method of claim 13 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is at least 55 K. 19. The method of claim 13 , wherein the superconducting transition temperature of the quenched boron-doped amorphous carbon is: i) up to 37 K when the quenched boron-doped amorphous carbon comprises approximately seventeen atomic percent boron atoms; ii) up to 55 K when the quenched boron-doped amorphous carbon comprises approximately twenty five atomic percent boron atoms; or iii) above 100K when the quenched boron-doped amorphous carbon comprises approximately fifty atomic percent boron atoms. 20. The method of claim 13 , wherein the quenched un-doped amorphous carbon shows ambient temperature ferromagnetism with a Curie temperature above 500 K.
After-treatment · CPC title
Deposition of carbon only · CPC title
Electricity · mapped topic
Electricity · mapped topic
Superconducting active materials · CPC title
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