Detecting loss of alignment of optical imaging modules
US-11025898-B2 · Jun 1, 2021 · US
US11178392B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11178392-B2 |
| Application number | US-201916537580-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 11, 2019 |
| Priority date | Sep 12, 2018 |
| Publication date | Nov 16, 2021 |
| Grant date | Nov 16, 2021 |
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An opto-electronic device includes a semiconductor substrate having a planar surface. An emitter is formed on the substrate and configured to emit a beam of light away from the planar surface. A reflective layer is formed on the planar surface adjacent to the emitter. A transparent layer is formed over the planar surface and has a curved outer surface including a first segment positioned vertically over the emitter and configured to internally reflect the emitted beam of light toward the reflective layer, and a second segment positioned and configured to collimate and transmit the beam reflected from the reflective layer.
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The invention claimed is: 1. An opto-electronic device, comprising: a semiconductor substrate having a planar surface; an emitter formed on the substrate and configured to emit a beam of light away from the planar surface; a reflective layer formed on the planar surface adjacent to the emitter; and a transparent layer formed over the planar surface and having a curved outer surface including a first segment positioned vertically over the emitter and configured to internally reflect the emitted beam of light toward the reflective layer, and a second segment positioned and configured to collimate and transmit the beam reflected from the reflective layer. 2. The opto-electronic device according to claim 1 , wherein the emitter comprises a vertical-cavity surface-emitting laser (VCSEL). 3. The opto-electronic device according to claim 1 , wherein the reflective layer comprises a metal. 4. The opto-electronic device according to claim 3 , wherein the metal comprises gold. 5. The opto-electronic device according to claim 1 , wherein the reflective layer comprises at least one dielectric layer. 6. The opto-electronic device according to claim 1 , wherein the transparent layer comprises gallium-arsenide (GaAs). 7. The opto-electronic device according to claim 1 , wherein the first segment comprises a planar surface. 8. The opto-electronic device according to claim 1 , wherein the first segment comprises a curved surface. 9. The opto-electronic device according to claim 1 , wherein the first segment is configured to internally reflect the emitted beam of light toward the reflective layer at least twice. 10. The opto-electronic device according to claim 1 , and comprising a reflective coating is deposited on the first segment. 11. The opto-electronic device according to claim 1 , wherein the first segment is configured to internally reflect the emitted beam of light toward the reflective layer by total internal reflection (TIR). 12. The opto-electronic device according to claim 1 , wherein the first segment is configured to reflect the emitted beam of light so that the reflected beam impinges on the second segment along a first axis, and wherein the second segment is configured to collimate and transmit the beam along a second axis, which is not parallel to the first axis. 13. The opto-electronic device according to claim 1 , wherein the second segment comprises a spherical surface. 14. The opto-electronic device according to claim 1 , wherein the second segment comprises a Fresnel-lens. 15. The opto-electronic device according to claim 1 , wherein the second segment comprises a diffractive optical element (DOE). 16. A method for fabricating an opto-electronic device, comprising: forming an emitter on a semiconductor substrate having a planar surface; depositing a reflective layer on the planar surface adjacent to the emitter; and forming over the planar surface a transparent layer having a curved outer surface including a first segment positioned vertically over the emitter and configured to internally reflect the emitted beam of light toward the reflective layer, and a second segment positioned and configured to collimate and transmit the beam reflected from the reflective layer. 17. The method according to claim 16 , and comprising depositing a reflective coating over the first segment of the transparent layer. 18. The method according to claim 16 , wherein forming the transparent layer comprises etching the transparent later to define the curved outer surface using a confined etchant layer technique. 19. The method according to claim 18 , wherein etching the transparent layer comprises molding a polymer to replicate a shape of the curved outer surface, and using the confined etchant layer technique to transfer the shape to the transparent layer. 20. The method according to claim 16 , wherein the transparent layer comprises gallium-arsenide (GaAs).
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