Film forming composition and film forming method using the same

Patent metadata

Field	Value
Publication number	US-11161982-B2
Application number	US-201816500176-A
Country	US
Kind code	B2
Filing date	Apr 3, 2018
Priority date	Apr 4, 2017
Publication date	Nov 2, 2021
Grant date	Nov 2, 2021

Abstract

[Problem] To provide a film forming composition and a film forming method capable of forming a film excellent in gas barrier properties. [Means for Solution] A film forming composition comprising a polysilazane, an organic solvent and an additive having a specific structure, and a film forming method comprising applying the composition on a substrate and exposing the composition to light. This specific additive is represented by a specific general formula among those having a nonconjugated cyclic structure composed of atoms selected from the group consisting of carbon, nitrogen and oxygen in the structure.

First claim

The invention claimed is:

1. A film forming composition comprising:
a polysilazane,
an organic solvent, and
at least one type of additive is the general formula (A):

wherein
L A1 is a C 1-7 alkylene or a C 1-7 heteroalkylene,
L A2 s are each independently a C 1-7 alkylene, and
R A s are each independently hydrogen or a C 1-3 alkyl.

2. The composition according to claim 1 , wherein said L A1 is a C 2-4 alkylene.

3. The composition according to claim 1 , wherein said L A2 s are each independently —CR A ′ 2 —, where R A ′s are each independently hydrogen or a C 1-3 alkyl.

4. The composition according to claim 1 , wherein said R A s are all hydrogen.

5. The composition according to claim 1 , wherein said polysilazane comprises a structural unit of the following general formula (1):

wherein
R 1 s are groups each independently selected from the group consisting of hydrogen, alkyl, alkenyl, cycloalkyl, aryl, alkoxy, amino and silyl, where at least one of R 1 is hydrogen and other R 1 is unsubstituted or substituted by one or more groups selected from the group consisting of halogen, alkyl, alkoxy, amino, silyl and alkylsilyl.

6. The composition according to claim 1 , wherein R's are groups each independently selected from the group consisting of hydrogen, alkyl, alkenyl, aryl, alkylsilyl and alkoxysilylalkyl.

7. The composition according to claim 1 , containing 0.002 to 0.5 mmol of said additive, based on 1 g of said polysilazane.

8. The composition according to claim 1 , further comprising an additional component represented by the following general formula (2):

wherein,
R 21 s are groups each independently selected from the group consisting of hydrogen, alkyl, alkenyl, cycloalkyl, aryl, alkoxy, amino and alkylsilyl, where R 21 is unsubstituted or substituted by one or more groups selected from the group consisting of halogen, alkyl, alkoxy, amino, silyl and alkylsilyl when R 21 is other than hydrogen, and the total number of all amino and alkoxy in the formula is 5% or less based on the total number of all R 21 in the formula, R 22 s are each independently a C 1-8 hydrocarbon group, or —R 23 —N—R 24 2 wherein R 23 is a C 1-5 hydrocarbon group and R 24 s are each independently hydrogen or a C 1-3 hydrocarbon group, and m is a number indicating polymerization degree.

9. The composition according to claim 1 , further comprising an additional component represented by the following general formula (3):

wherein,
the groups R 3 are each independently a monovalent group selected from the group consisting of a hydrogen atom, halogen atom, hydrocarbyl group, hydroxyl group, hydroxyhydrocarbyl group, acyl group, acyloxy group, amine group, aminohydrocarbyl group, hydrocarbyloxy group, silylhydrocarbyl group, imino-containing hydrocarbyl group; or R 3 is a single bond that forms a cyclic structure with another silicon atom,
L 3 is a single bond, an alicyclic hydrocarbon, an aromatic hydrocarbon, a heterocyclic ring, or a saturated or unsaturated hydrocarbon chain where the chain may be interrupted by one of an oxygen atom, an imide group, an imino group, a carbonyl group, or a carboxyl group, and
m is a number of zero or more, indicating polymerization degree.

10. The composition according to claim 1 , wherein said organic solvent comprises one or more kind of solvent which is aromatic hydrocarbon, saturated hydrocarbon compound, alicyclic hydrocarbon compound or alkyl ether.

11. A film forming method, comprising:
(1) coating step of applying the composition according to claim 1 on a substrate to form a composition layer, and
(2) exposure step of exposing said composition layer to light.

12. The method according to claim 11 , wherein said substrate is a plastic film.

13. The method according to claim 11 , wherein the thickness of said composition layer is 10 to 900 nm.

14. The method according to claim 11 , wherein the wavelength of the light is 161 to 248 nm.

15. The method according claim 11 , wherein said exposure step is carried out under inert gas atmosphere.

16. A film produced by the method according to claim 11 .

17. An electronic device, a medical device, a packaging container or a wrapping paper, which comprise the film according to claim 16 .

Assignees

• Merck Patent Gmbh

Inventors

• Ozaki Yuki
• Noya Go
• Kobayashi Masakazu

Classifications

• C08J7/04

  Coating · CPC title

• C08L2203/20

  use in electrical or conductive gadgets · CPC title

• C09D183/16

  in which all the silicon atoms are connected by linkages other than oxygen atoms · CPC title

• C08L2205/02

  containing two or more polymers of the same C08L -group · CPC title

• C08L2203/16

  used for films · CPC title