Sacrificial substrates for silicon-carbon composite materials

US11152604B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11152604-B2
Application numberUS-201916430288-A
CountryUS
Kind codeB2
Filing dateJun 3, 2019
Priority dateJun 3, 2019
Publication dateOct 19, 2021
Grant dateOct 19, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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Methods of forming a composite material film can include providing a layer comprising a carbon precursor and silicon particles on a sacrificial substrate. The methods can also include pyrolysing the carbon precursor to convert the precursor into one or more types of carbon phases to form the composite material film, whereby the sacrificial substrate has a char yield of about 10% or less.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a composite material film, the method comprising: providing a layer comprising a carbon precursor and silicon particles on a sacrificial substrate, wherein the layer comprises a mixture comprising a solvent; drying the mixture on the sacrificial substrate prior to pyrolysing, wherein the dried mixture comprises from about 10% to about 30% of the solvent; forming the dried mixture on the sacrificial substrate into a plurality of dried mixtures on sacrificial substrates, and stacking the plurality prior to pyrolyzing; and pyrolysing the carbon precursor to convert the precursor into one or more types of carbon phases to form the composite material film, whereby the sacrificial substrate has a char yield of about 10% or less. 2. The method of claim 1 , wherein the sacrificial substrate has a char yield of about 7% or less. 3. The method of claim 2 , wherein the sacrificial substrate has a char yield of about 5% or less. 4. The method of claim 3 , wherein the sacrificial substrate has a char yield of about 3% or less. 5. The method of claim 4 , wherein the sacrificial substrate has a char yield of about 1% or less. 6. The method of claim 5 , wherein the sacrificial substrate has a char yield of about 0%. 7. The method of claim 1 , wherein the sacrificial substrate comprises polymethylpentene (PMP), acetal copolymer, acrylonitrile butadiene styrene (ABS), paraffin wax, polyethylene oxide, polyethylene, polypropylene, poly(propylene carbonate), cellulose acetate, or a combination thereof. 8. The method of claim 7 , wherein the sacrificial substrate comprises polyethylene, polypropylene, poly(propylene carbonate), polymethylpentene, or a combination thereof. 9. The method of claim 1 , wherein the sacrificial substrate is insoluble in the solvent. 10. The method of claim 1 , wherein the solvent comprises N-Methylpyrrolidone (NMP). 11. The method of claim 1 , wherein the solvent comprises water. 12. The method of claim 11 , wherein the carbon precursor comprises a water soluble polymer. 13. The method of claim 1 , wherein the composite material film comprises the one or more types of carbon phases at greater than 0% to about 20% by weight. 14. The method of claim 1 , wherein the composite material film comprises the silicon particles at greater than about 50% to about 99% by weight. 15. The method of claim 1 , wherein the composite material film further comprises graphite particles. 16. The method of claim 1 , wherein the composite material film is substantially electrochemically active. 17. The method of claim 1 , wherein pyrolysing forms the composite material film as a self-supported structure. 18. The method according to claim 1 , comprising: providing a first electrode, wherein providing the first electrode comprises providing the composite material film formed by the method of claim 1 ; providing a second electrode; and providing an electrolyte. 19. The method of claim 18 , wherein providing the first electrode comprises providing the composite material film as a self-supported electrode. 20. The method of claim 18 , wherein providing the first electrode comprises providing the composite material film on a current collector. 21. The method of claim 18 , wherein the first electrode is an anode and the second electrode is a cathode. 22. The method of claim 18 , comprising: forming an electrochemical device; wherein forming the electrochemical device includes providing the first electrode, providing the second electrode, and providing the electrolyte; and wherein the electrochemical device is a battery.

Assignees

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Classifications

  • Energy storage using batteries · CPC title

  • Negative electrodes · CPC title

  • Li-accumulators · CPC title

  • Composites of electroconductive material and synthetic resins · CPC title

  • in the form of layers, e.g. coatings · CPC title

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What does patent US11152604B2 cover?
Methods of forming a composite material film can include providing a layer comprising a carbon precursor and silicon particles on a sacrificial substrate. The methods can also include pyrolysing the carbon precursor to convert the precursor into one or more types of carbon phases to form the composite material film, whereby the sacrificial substrate has a char yield of about 10% or less.
Who is the assignee on this patent?
Enevate Corp
What technology area does this patent fall under?
Primary CPC classification H01M4/134. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 19 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).