Semiconductor device and manufacturing method thereof
US-2019131425-A1 · May 2, 2019 · US
US11150495B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11150495-B2 |
| Application number | US-201916421778-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 24, 2019 |
| Priority date | May 31, 2018 |
| Publication date | Oct 19, 2021 |
| Grant date | Oct 19, 2021 |
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A technique is described to deterministically tune the emission frequency of individual semiconductor photon sources, for example quantum dots. A focused laser is directed at a film of material that changes form when heated (for example, a phase change material that undergoes change between crystal and amorphous forms) overlaid on a photonic membrane that includes the photon sources. The laser causes a localized change in form in the film, resulting in a change in emission frequency of a photon source.
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What is claimed is: 1. A method of tuning quantum emitters, comprising: providing a photonic membrane diode comprising a plurality of solid-state quantum emitters; depositing a film comprising HfO 2 on the photonic membrane diode, wherein the film undergoes a change in form upon heating; and focusing a spot of laser light on the film with power sufficient to induce the change in form in the film, wherein the change in form causes a strain in the photonic membrane diode and thereby a change in emission frequency of at least one of the plurality solid-state quantum emitters that persists without need for continuing application of the laser light, and wherein the change in form comprises crystallization of the HfO 2 . 2. The method of claim 1 , wherein the solid-state quantum emitters are selected from the group consisting of quantum dots, diamond, silicon carbide, and transition metal dichalcogenides. 3. The method of claim 2 , wherein the solid-state quantum emitters are quantum dots. 4. The method of claim 1 , wherein the change in form causes a change in emission frequency of only a single solid-state quantum emitter. 5. The method of claim 1 , further comprising a step of measuring the change in emission frequency and repeating the measuring and focusing steps as needed in order to tune the plurality of solid-state quantum emitters to have essentially a single emission frequency. 6. A method of tuning quantum emitters, comprising: providing a photonic membrane diode comprising a plurality of solid-state quantum emitters and a film comprising HfO 2 overlaid on the photonic membrane diode, wherein the film undergoes a change in form upon heating; focusing a spot of laser light on the film with power sufficient to induce the change in form in the film, wherein the change in form causes a strain in the photonic membrane diode and thereby a change in emission frequency of at least one of the plurality solid-state quantum emitters that persists without need for continuing application of the laser light, and wherein the change in form comprises crystallization of the HfO 2 . 7. The method of claim 6 , wherein the solid-state quantum emitters are selected from the group consisting of quantum dots, diamond, silicon carbide, and transition metal dichalcogenides. 8. The method of claim 7 , wherein the solid-state quantum emitters are quantum dots. 9. The method of claim 6 , wherein the change in form causes a change in emission frequency of only a single solid-state quantum emitter, and further comprising a step of measuring the change in emission frequency and repeating the measuring and focusing steps as needed in order to tune the plurality of solid-state quantum emitters to have essentially a single emission frequency.
Coatings, e.g. passivation layers or antireflective coatings · CPC title
Materials of the light-emitting regions · CPC title
characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous · CPC title
Manufacture or treatment · CPC title
within the light-emitting regions, e.g. having quantum confinement structures · CPC title
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