Multiple nutplate rotary abrasion tool

US11149778B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11149778-B2
Application numberUS-201715631017-A
CountryUS
Kind codeB2
Filing dateJun 23, 2017
Priority dateJun 23, 2017
Publication dateOct 19, 2021
Grant dateOct 19, 2021

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A system includes an abrasion assembly containing one or more abrasion pads configured to clean a faying surface of multiple nutplates, and a shaft attached to at least one of the abrasion pads and configured to rotate some or all of the abrasion pads during cleaning, wherein cleaning includes abrading the faying surfaces with the abrasion pads. The system also includes a base configured to attach to a pressure applicator, and a pressure applicator configured to attach to the base, hold the nutplates such that the faying surface of each nutplate is capable of contacting one of the abrasion pads, and apply pressure to the nutplates such that each of the nutplates contact one of the abrasion pads during the cleaning. Furthermore, the abrasion assembly is configured to rotate the abrasion pads within at least one of the base and the pressure applicator during cleaning.

First claim

Opening claim text (preview).

What is claimed is: 1. A system, comprising: an abrasion assembly, comprising: one or more abrasion pads configured to clean a faying surface of each of a plurality of nutplates; and a first shaft attached to at least one of the one or more abrasion pads and configured to rotate at least one of the one or more abrasion pads during cleaning of the nutplates, wherein cleaning the nutplates comprises abrading each of the faying surfaces with at least one of the one or more abrasion pads; a base comprising a first coupling component, the base configured to attach to a pressure applicator via the first coupling component; and the pressure applicator, the pressure applicator comprising: a second coupling component configured to at least partially surround the first coupling component of the base; and a nutplate holder comprising a plurality of rectilinear depressions, each rectilinear depression configured to seat a portion of one of the plurality of nutplates such that faying surfaces of the nutplates can be abraded by the one or more abrasion pads, wherein the pressure applicator is configured to: attach to and detach from the base via the second coupling component; and apply pressure to the plurality of nutplates such that each of the plurality of nutplates contact at least one of the one or more abrasion pads during the cleaning of the nutplates; wherein the one or more abrasion pads protrude at least partially through a surface of the first coupling component of the base; wherein the abrasion assembly is configured to rotate the one or more abrasion pads within at least one of the base and the pressure applicator during the cleaning of the nutplates; and wherein the one or more abrasion pads and the first shaft each comprise an opening configured to accept a protrusion attached to each of one or more of the nutplates during the cleaning of the nutplates. 2. The system of claim 1 , wherein the pressure applicator comprises one or more openings configured to accept a protrusion attached to each of one or more of the nutplates during the cleaning of the nutplates. 3. The system of claim 1 , wherein at least one of the one or more abrasion pads is detachable from the first shaft. 4. The system of claim 1 , wherein the pressure applicator further comprises a handle configured to apply pressure to the nutplate holderduring the cleaning of the nutplates. 5. The system of claim 1 , wherein the abrasion assembly further comprises one or more second shafts, wherein each of the one or more second shafts is: attached to at least one of the one or more abrasion pads; and configured to rotate the at least one of the one or more abrasion pads during the cleaning of the nutplates. 6. The system of claim 5 , where in the abrasion assembly further comprises one or more gears configured to, during the cleaning of the nutplates, transfer rotational motion from the first shaft to the one or more second shafts. 7. The system of claim 1 , wherein the first or second coupling component comprises one or more protrusions configured to reduce movement between the abrasion assembly and the pressure applicator. 8. A system, comprising: one or more abrasion pads configured to clean a faying surface of each of a plurality of nutplates; a base comprising a first coupling component, the base configured to: attach to a pressure applicator via the first coupling component; and hold the one or more abrasion pads within at least one of the base and the pressure applicator during the cleaning of the nutplates, wherein cleaning the nutplates comprises abrading each of the faying surfaces with at least one of the one or more abrasion pads; and the pressure applicator comprising: a second coupling component configured to at least partially surround the first coupling component of the base; and a nutplate holder comprising a plurality of rectilinear depressions, each rectilinear depression confi 2 ured to seat a portion of one of the plurality of nutplates such that faying surfaces of the nutplates can be abraded by the one or more abrasion pads, wherein the pressure applicator is configured to: attach to and detach from the base via the second coupling component; and apply pressure to the plurality of nutplates such that each of the plurality of nutplates contact at least one of the one or more abrasion pads during the cleaning of the nutplates; wherein the one or more abrasion pads protrude at least partially through a surface of the first coupling component of the base; and wherein the one or more abrasion pads and a shaft coupled to the one or more abrasion pads each comprise an opening configured to accept a protrusion attached to each of one or more of the nutplates during the cleaning of the nutplates.

Assignees

Inventors

Classifications

  • B24B23/02Primary

    with rotating grinding tools; Accessories therefor · CPC title

  • Steady rests · CPC title

  • for mass articles · CPC title

  • equipped with oscillating abrasive blocks, e.g. mounted on a rotating head · CPC title

  • Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition (of general applicability for machine tools B23Q11/00; in general F16P) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11149778B2 cover?
A system includes an abrasion assembly containing one or more abrasion pads configured to clean a faying surface of multiple nutplates, and a shaft attached to at least one of the abrasion pads and configured to rotate some or all of the abrasion pads during cleaning, wherein cleaning includes abrading the faying surfaces with the abrasion pads. The system also includes a base configured to att…
Who is the assignee on this patent?
Lockheed Corp
What technology area does this patent fall under?
Primary CPC classification B24B23/02. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Oct 19 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).