Photosensitive resin composition and photosensitive resin printing plate precursor containing the same

US11137683B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11137683-B2
Application numberUS-201716470042-A
CountryUS
Kind codeB2
Filing dateDec 20, 2017
Priority dateDec 26, 2016
Publication dateOct 5, 2021
Grant dateOct 5, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A photosensitive resin composition and a photosensitive resin printing plate precursor which allow development that uses a solution containing a lower alcohol and which are excellent in abrasion resistance and excellent in the ink wiping characteristics of a plate surface exhibited when the plate surface is squeegeed with a blade of a pad printer are provided. The photosensitive resin composition is characterized by containing (A) an inorganic fine particle whose average particle diameter is greater than or equal to 0.5 μm and less than or equal to 4 μm and whose sphericity is greater than or equal to 0.9, (B) a polyamide having in its molecular main chain an aliphatic ring and/or a skeleton represented by general formula (1), (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiating agent.

First claim

Opening claim text (preview).

The invention claimed is: 1. A photosensitive resin composition characterized by containing comprising: (A) inorganic fine particles having an average particle diameter that is greater than or equal to 0.5 μm and less than or equal to 4 μm and having a sphericity that is greater than or equal to 0.9, (B) a polyamide having in a molecular main chain an aliphatic ring and/or having a skeleton represented by formula (1) below, (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiating agent 2. A resin composition for use for an intaglio printing plate precursor or a pad printing plate precursor, which comprises: (A) inorganic fine particles having an average particle diameter that is greater than or equal to 0.5 μm and less than or equal to 4 μm and having a sphericity that is greater than or equal to 0.9, and (B) a polyamide that has in a molecular main chain an aliphatic ring and/or that has a skeleton represented by formula (1) 3. A resin composition for use for an intaglio printing plate precursor or a pad printing plate precursor, which comprises: (A) inorganic fine particles having an average particle diameter that is greater than or equal to 0.5 μm and less than or equal to 4 μm and having a sphericity that is greater than or equal to 0.9, and (B) a polyamide that has a methylene chain having a carbon number that is 8 or greater. 4. A photosensitive resin composition comprising: (A) inorganic fine particles having an average particle diameter that is greater than or equal to 0.5 μm and less than or equal to 4 μm and having a sphericity that is greater than or equal to 0.9, (B) a polyamide having a methylene chain that has a carbon number of 8 is 8 or greater, (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiating agent. 5. A photosensitive resin composition according to claim 1 , wherein the (B) polyamide has a methylene chain whose that has a carbon number of 8 is 8 or greater. 6. The photosensitive resin composition according to claim 1 , wherein the (C) compound having an ethylenic double bond also has an hydroxyl group in the molecule. 7. The photosensitive resin composition according to claim 1 , wherein the (B) polyamide has a 4,4′-diaminodicyclohexylmethane adipate skeleton residue. 8. The photosensitive resin composition according to claim 1 , wherein the (A) inorganic fine particles have a specific surface area that is less than or equal to 10 m 2 /g. 9. The photosensitive resin composition according to claim 1 , wherein the (A) inorganic fine particles have a maximum particle diameter that is less than or equal to 20 μm. 10. The photosensitive resin composition according to claim 1 , wherein the (A) inorganic fine particles are amorphous silica and/or alumina. 11. The photosensitive resin composition according to claim 1 , wherein pH of extraction water of the (A) inorganic fine particles has a pH of 5.5 to 8.5. 12. A photosensitive resin printing plate precursor for use in intaglio printing or pad printing, which is made by sequentially stacking an adhesion layer, a photosensitive resin layer made of the photosensitive resin composition according to claim 1 , and a protection layer at least on a supporter.

Assignees

Inventors

Classifications

  • Silica · CPC title

  • G03F7/0047Primary

    characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing · CPC title

  • Additives being defined by their surface area · CPC title

  • Additives being defined by their diameter · CPC title

  • of metals · CPC title

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What does patent US11137683B2 cover?
A photosensitive resin composition and a photosensitive resin printing plate precursor which allow development that uses a solution containing a lower alcohol and which are excellent in abrasion resistance and excellent in the ink wiping characteristics of a plate surface exhibited when the plate surface is squeegeed with a blade of a pad printer are provided. The photosensitive resin compositi…
Who is the assignee on this patent?
Toray Industries
What technology area does this patent fall under?
Primary CPC classification G03F7/0047. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 05 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).