Method for producing fullerene derivative
US-2017253567-A1 · Sep 7, 2017 · US
Method for producing fullerene derivative
US11136298B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11136298-B2 |
| Application number | US-201916680570-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 12, 2019 |
| Priority date | Sep 8, 2014 |
| Publication date | Oct 5, 2021 |
| Grant date | Oct 5, 2021 |
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- Title
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Abstract
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This method for producing a fullerene derivative is a method for producing a fullerene derivative having a partial structure shown by formula (1) by reacting a predetermined halogenated compound and two carbon atoms adjacent to each other for forming a fullerene skeleton in a mixed solvent of an aromatic solvent and an aprotic polar solvent having a C═O or S═O bond in the presence of at least one metal selected from the group comprising manganese, iron, and zinc;(in formula (1), C* are each carbon atoms adjacent to each other for forming a fullerene skeleton, A is a linking group having 1-4 carbon atoms for forming a ring structure with two C*, in which a portion thereof may be a substituted or condensed group).
First claim
Opening claim text (preview).
What is claimed is: 1. A halogenated compound being a 5,5-dibromo-5-phenylvaleric acid methyl ester.
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Classifications
condensed with rings other than six-membered or with ring systems containing such rings · CPC title
not condensed and containing further heterocyclic rings, e.g. timolol · CPC title
of hydrocarbons and halogenated hydrocarbons · CPC title
with a bridged ring system · CPC title
by condensation between a hydrocarbon and a non-hydrocarbon · CPC title
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- What does patent US11136298B2 cover?
- This method for producing a fullerene derivative is a method for producing a fullerene derivative having a partial structure shown by formula (1) by reacting a predetermined halogenated compound and two carbon atoms adjacent to each other for forming a fullerene skeleton in a mixed solvent of an aromatic solvent and an aprotic polar solvent having a C═O or S═O bond in the presence of at least o…
- Who is the assignee on this patent?
- Showa Denko Kk, Mitsubishi Corp
- What technology area does this patent fall under?
- Primary CPC classification C07D241/38. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Oct 05 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).