Spot array substrate, method for producing same, and nucleic acid polymer analysis method and device

US11130985B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11130985-B2
Application numberUS-201515529122-A
CountryUS
Kind codeB2
Filing dateOct 7, 2015
Priority dateNov 27, 2014
Publication dateSep 28, 2021
Grant dateSep 28, 2021

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A spot array substrate comprising: a resin substrate having a surface including an uneven pattern that includes a plurality of grooves that form rhombic patterns, and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern; and a plurality of surface-modified beads loaded into the bead sitting positions of the resin substrate, wherein a thermal expansion coefficient of a material of the resin substrate is in a range from 10 −5 to 10 −4 /° C., wherein the plurality of bead sitting positions are intersections of the plurality of grooves disposed in the resin substrate, wherein an epoxy group is disposed as a film only on inner surfaces of the respective plurality of grooves of the resin substrate, wherein the respective surface-modified beads loaded in the bead sitting positions are physically clamped by inner surfaces of the grooves of the bead sitting positions, which are physically contracted, and wherein the surface-modified beads are at least one of functional group surface-modified beads and oligo DNA surface-modified beads. 2. The spot array substrate according to claim 1 , wherein the grooves have a smaller width than the dimensions of the bead sitting positions. 3. The spot array substrate according to claim 1 , wherein the respective surface-modified beads are immobilized at the respective bead sitting positions of the resin substrate by chemical bonding. 4. The spot array substrate according to claim 1 , wherein the bulk material of the surface-modified beads is a material including silicon oxide or a material including a magnetic body. 5. The spot array substrate according to claim 1 , wherein the surface-modified beads are functional group surface-modified beads. 6. The spot array substrate according to claim 1 , wherein the surface-modified beads are oligo DNA surface-modified beads. 7. The spot array substrate according to claim 1 , wherein the resin substrate contains a cycloolefin polymer or a cycloolefin copolymer as a component. 8. The spot array substrate according to claim 1 , wherein the surface density of the bead sitting positions is 6.6×10 6 /cm 2 to 180×10 6 /cm 2 . 9. The spot array substrate according to claim 1 , wherein a size of the respective surface-modified beads is equal to a size of the respective intersections of the grooves.

Assignees

Inventors

Classifications

  • Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays (synthesis methods per se C40B50/00) · CPC title

  • Two-dimensional arrays · CPC title

  • in a slurry · CPC title

  • by physical means, e.g. trenches, raised areas · CPC title

  • Nucleotides · CPC title

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What does patent US11130985B2 cover?
In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto t…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification B01J19/0046. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 28 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).