Scanning probe microscope for cleaning nanostructures

US11130159B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11130159-B2
Application numberUS-201916680733-A
CountryUS
Kind codeB2
Filing dateNov 12, 2019
Priority dateSep 13, 2016
Publication dateSep 28, 2021
Grant dateSep 28, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a scanning probe microscope. The scanning probe microscope can be configured to remove a polymeric material from a surface of a nanostructure. The scanning probe microscope includes a metal coated probe tip and a voltage source. The voltage source can be configured to apply a bias voltage between the probe tip and a sample. The bias voltage can be between 0.5 V and 2 V. The scanning probe microscope further includes a sample positioner configured to position the sample in relation to the probe tip and a system controller configured to control the scanning probe microscope.

First claim

Opening claim text (preview).

What is claimed is: 1. A scanning probe microscope comprising: a metal coated probe tip; a voltage source to apply a bias voltage between the probe tip and a sample, the bias voltage being between 0.5 V and 2 V; a sample positioner configured to position the sample in relation to the probe tip; and a system controller configured to control the voltage source and the sample positioner, the system controller further configured to apply an electrical field between the probe tip and the sample at a strength operable to break bonds connecting a polymeric material to a surface of the sample. 2. The scanning probe microscope according to claim 1 , wherein the probe tip has an apex tip area of more than 300 nm 2 and less than 10000 nm 2 . 3. The scanning probe microscope according to claim 2 , wherein the probe tip has an apex tip area between 1000 nm 2 and 7500 nm 2 . 4. The scanning probe microscope according to claim 1 , wherein the system controller applies a loading force between the probe tip and the sample between 0.5 nN and 10 nN. 5. The scanning probe microscope according to claim 1 , wherein the system controller controls the strength of the electrical field between the probe tip and the sample between 10 2 V/m and 10 6 V/m. 6. The scanning probe microscope according to claim 1 , further comprising a cantilever, the probe tip being on the cantilever. 7. The scanning probe microscope according to claim 1 , wherein the sample positioner moves in three directions orthogonal to each other. 8. The scanning probe microscope according to claim 1 , wherein the probe tip is coated with gold or platinum. 9. The scanning probe microscope according to claim 1 , wherein a distance between the probe tip and the sample is between 25 nm and 100 nm. 10. A scanning probe microscope comprising: a probe tip having an apex tip area of more than 300 nm 2 and less than 10000 nm 2 ; a voltage source to apply a bias voltage between the probe tip and a sample; a sample positioner configured to position the sample in relation to the probe tip; and a system controller configured to control the voltage source and the sample positioner, the system controller further configured to control a strength of an electrical field between the probe tip and the sample between 10 2 V/m and 10 6 V/m and to apply a loading force between the probe tip and the sample between 0.5 nN and 10 nN, the controlled electrical field operable to break bonds connecting a polymeric material to a surface of the sample. 11. The scanning probe microscope according to claim 10 , wherein the probe tip is coated with a conductive material. 12. The scanning probe microscope according to claim 10 , wherein a distance between the probe tip and the sample is between 25 nm and 100 nm. 13. The scanning probe microscope according to claim 10 , wherein the probe tip has an apex tip area between 1000 nm 2 and 7500 nm 2 . 14. The scanning probe microscope according to claim 10 , wherein the scanning probe microscope comprises an electrostatic force microscope. 15. The scanning probe microscope according to claim 10 , further comprising a cantilever, the probe tip being on the cantilever. 16. The scanning probe microscope according to claim 10 , wherein the sample positioner moves in three directions orthogonal to each other.

Assignees

Inventors

Classifications

  • Purification · CPC title

  • Purification · CPC title

  • with tip detail · CPC title

  • Positioner · CPC title

  • After-treatment, e.g. grinding, purification (transformation of hexagonal into cubic or wurtzitic boron nitride C04B35/5831) · CPC title

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What does patent US11130159B2 cover?
The present invention relates to a scanning probe microscope. The scanning probe microscope can be configured to remove a polymeric material from a surface of a nanostructure. The scanning probe microscope includes a metal coated probe tip and a voltage source. The voltage source can be configured to apply a bias voltage between the probe tip and a sample. The bias voltage can be between 0.5 V …
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification B82B3/0004. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 28 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).