Cyclic amine for selectively removing hydrogen sulphide

US11130094B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11130094-B2
Application numberUS-201916594526-A
CountryUS
Kind codeB2
Filing dateOct 7, 2019
Priority dateSep 29, 2015
Publication dateSep 28, 2021
Grant dateSep 28, 2021

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Abstract

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The use of an amine of the formula (I) in which the R 1 to R 5 radicals are each as defined in the description, and an absorbent and a process for removing acidic gases from a fluid stream, especially for selectively removing hydrogen sulfide over carbon dioxide. The invention also relates to particular amines suitable for selective removal of hydrogen sulfide. Absorbents based on amines of the formula (I) have high selectivity, high loading capacity and good regeneration capacity.

First claim

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The invention claimed is: 1. A process for selectively removing hydrogen sulfide from a fluid stream comprising carbon dioxide and hydrogen sulfide, the process comprising contacting the fluid stream with an absorbent comprising an amine of formula (I): wherein R 1 , R 2 , R 3 and R 4 are independently selected from C 1 -C 5 -alkyl and C 2 -C 5 -hydroxyalkyl; R 5 is NR 6 R 7 ; and R 6 is selected from hydrogen, C 1 -C 5 -alkyl and C 2 -C 5 -hydroxyalkyl and R 7 is selected from C 1 -C 5 -alkyl and C 2 -C 5 -hydroxyalkyl, with the proviso that, when R 6 is hydrogen, R 7 is C 3 -C 5 -alkyl bonded to the nitrogen atom via a secondary or tertiary carbon atom; to obtain a treated fluid stream and a laden absorbent, wherein the following expression is satisfied: (mol(H 2 S)/(mol(CO 2 ) in the liquid phase/(mol(H 2 S)/(mol(CO 2 )) in the gas phase≥1. 2. The process according to claim 1 , in which R 1 , R 2 , R 3 and R 4 are methyl. 3. The process according to claim 1 , wherein the absorbent is an aqueous solution. 4. The process according to claim 1 , wherein the absorbent comprises at least one organic solvent. 5. The process according to claim 1 , wherein the absorbent comprises an acid having a pK A of less than 6. 6. The process according to claim 1 , wherein the absorbent comprises a tertiary amine or highly sterically hindered amine. 7. The process according to claim 1 , wherein a residual carbon dioxide content in the treated fluid stream is at least 0.5% by volume. 8. The process according to claim 1 , wherein the laden absorbent is regenerated by at least one selected from the group consisting of heating, decompressing and stripping with an inert fluid. 9. The process according to claim 1 , wherein R 7 is C 2 -C 5 -hydroxyalkyl. 10. The process according to claim 1 , wherein R 5 is NR 6 R 7 ; R 6 is selected from hydrogen and C 1 -C 5 -alkyl and R 7 is C 1 -C 5 -alkyl, with the proviso that, when R 6 is hydrogen, R 7 is C 3 -C 5 -alkyl bonded to the nitrogen atom via a secondary or tertiary carbon atom. 11. The process according to claim 10 , wherein the amine of formula (I) is selected from the group consisting of: 4-(N,N-dimethylamino)-2,2,6,6-tetramethylpiperidine, 4-(N,N-diethylamino)-2,2,6,6-tetramethylpiperidine, 4-isopropylamino-2,2,6,6-tetramethylpiperidine, and 4-(tert-butylamino)-2,2,6,6-tetramethylpiperidine.

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What does patent US11130094B2 cover?
The use of an amine of the formula (I) in which the R 1 to R 5 radicals are each as defined in the description, and an absorbent and a process for removing acidic gases from a fluid stream, especially for selectively removing hydrogen sulfide over carbon dioxide. The invention also relates to particular amines suitable for selective removal of hydrogen sulfide. Abso…
Who is the assignee on this patent?
Basf Se
What technology area does this patent fall under?
Primary CPC classification B01D53/1493. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 28 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).