Measurement system, program, and measurement system control method

Patent metadata

Field	Value
Publication number	US-11125704-B2
Application number	US-201917058662-A
Country	US
Kind code	B2
Filing date	Jun 19, 2019
Priority date	Sep 28, 2018
Publication date	Sep 21, 2021
Grant date	Sep 21, 2021

Abstract

A measurement system obtains its own measurement result through use of a different system's measurement result obtained by a different measurement system. The measurement system includes: an output data acquisition unit, a designated position acquisition unit configured to acquire a designated position, which is a position indicating an address at which the different system's measurement result is represented in the output data, by a user's designation, a different system's measurement result acquisition unit, a measurement result acquisition unit, and a position data storage unit configured to store position data indicating the designated position. The different system's measurement result acquisition unit acquires, when the position data is already stored in the position data storage unit in a case where the output data acquisition unit acquires different output data obtained by the different measurement system, the different system's measurement result included at the designated position indicated by the position data.

First claim

The invention claimed is:

1. A measurement system, which is configured to obtain an own measurement result of the measurement system through use of a different system's measurement result obtained by a different measurement system, the measurement system comprising a computer configured to:
acquire output data including the different system's measurement result, which has been obtained by the different measurement system;
acquire a designated position, which is a position indicating an address at which the different system's measurement result is represented in the output data, by a user's designation;
acquire the different system's measurement result at the designated position, which is included in the acquired output data;
acquire the own measurement result through use of the acquired different system's measurement result; and
store position data indicating the designated position,
wherein the computer is configured to acquire, when the position data is already stored in a case where the computer acquires different output data obtained by the different measurement system, the different system's measurement result included at the designated position indicated by the position data.

2. The measurement system according to claim 1 , further comprising a display configured to display the different system's measurement result included in the output data,
wherein the computer is configured to acquire, as the position data, a position designated by the user, at which the different system's measurement result is presented, within the displayed different system's measurement result.

3. The measurement system according to claim 1 , further comprising a warning unit configured to issue a warning to the user in a case where the output data acquired when the position data is stored and the different output data have different formats.

4. The measurement system according to claim 1 , wherein the measurement system is an X-ray fluorescence spectrometer configured to analyze a sample based on fluorescent X-rays generated by irradiating a surface of the sample with primary X-rays.

5. The measurement system according to claim 4 ,
wherein the sample is a substrate having a surface on which a thin film is formed, and
wherein the different system's measurement result is a film thickness or a density of the thin film or a concentration of an element contained in the thin film, which has been measured by the different measurement system.

6. The measurement system according to claim 5 ,
wherein the output data includes a measurement position on the substrate, at which the film thickness has been measured, in association with the film thickness of the thin film, and
wherein the measurement system being the X-ray fluorescence spectrometer is configured to irradiate the measurement position with the primary X-rays to analyze, based on the generated fluorescent X-rays, the concentration of the element contained in the thin film or the density of the thin film.

7. A program to be executed by a computer used on a measurement system, which is configured to obtain an own measurement result of the measurement system through use of a different system's measurement result obtained by a different measurement system, the program causing the computer to execute:
an output data acquisition step of acquiring output data including the different system's measurement result, which has been obtained by the different measurement system;
a designated position acquisition step of acquiring a designated position, which is a position indicating an address at which the different system's measurement result is represented in the output data, by a user's designation;
a first different system's measurement result acquisition step of acquiring the different system's measurement result at the designated position, which is included in the output data acquired in the output data acquisition step, in order to acquire the own measurement result;
a position data storing step of storing position data indicating the designated position in a position data storage unit; and
a second different system's measurement result acquisition step of acquiring, when the position data is already stored in the position data storage unit in a case where different output data obtained by the different measurement system is acquired in the output data acquisition step, the different system's measurement result included at the designated position indicated by the position data.

8. A control method for a measurement system, which is configured to obtain an own measurement result of the measurement system through use of a different system's measurement result obtained by a different measurement system, the control method comprising:
an output data acquisition step of acquiring output data including the different system's measurement result, which has been obtained by the different measurement system;
a designated position acquisition step of acquiring a designated position, which is a position indicating an address at which the different system's measurement result is represented in the output data, by a user's designation;
a first different system's measurement result acquisition step of acquiring the different system's measurement result at the designated position, which is included in the output data acquired in the output data acquisition step;
a measurement result acquisition step of acquiring the own measurement result through use of the acquired different system's measurement result;
a position data storing step of storing position data indicating the designated position in a position data storage unit; and
a second different system's measurement result acquisition step of acquiring, when the position data is already stored in the position data storage unit in a case where different output data obtained by the different measurement system is acquired in the output data acquisition step, the different system's measurement result included at the designated position indicated by the position data.

Assignees

• Rigaku Denki Co Ltd

Inventors

• Aoki Yu
• Inoue Tatsuya
• Fujimura Seiji
• Kita Hiroaki

Classifications

• G01N23/223 Primary

  by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence · CPC title

• G01N23/2206

  Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement · CPC title

• G01N2223/076

  X-ray fluorescence · CPC title

• G01N21/9501

  Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title

• G01J4/04

  Polarimeters using electric detection means (G01J4/02 takes precedence) · CPC title