In-situ generation of glass-like materials inside subterranean formation

US11124689B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11124689-B2
Application numberUS-201916657541-A
CountryUS
Kind codeB2
Filing dateOct 18, 2019
Priority dateJun 19, 2017
Publication dateSep 21, 2021
Grant dateSep 21, 2021

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Systems and methods for forming a permanent plug in a subterranean formation include providing a solution of colloidal silica and pumping the colloidal silica into a bore of a subterranean well so that the colloidal silica penetrates pores of the subterranean formation. The colloidal silica within the pores of the subterranean formation is dehydrated to form a glass-like material within the pores of the subterranean formation.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for forming a permanent plug in a subterranean formation, the method including: providing a solution of colloidal silica; pumping the colloidal silica into a bore of a subterranean well so that the colloidal silica penetrates pores of the subterranean formation; forming a gel with the colloidal silica within the pores of the subterranean formation by heating the colloidal silica at a gel formation temperature over a gel formation period; and after the gel formation period, heating the gel to a dehydration temperature within pores of the subterranean formation over a ten hour period to form a glass-like material within the pores of the subterranean formation, where the dehydration temperature is greater than the gel formation temperature; where heating the gel to a dehydration temperature includes lowering a microwave system into the bore of the subterranean well and operating the microwave system to generate heat. 2. The method of claim 1 , further comprising before pumping the colloidal silica into the bore of the subterranean well, mixing an activator with the colloidal silica so that the colloidal silica forms a gel within the pores of the subterranean formation. 3. The method of claim 1 , further including locating a microwave enabler within the subterranean well and heating the microwave enabler with the microwave system. 4. A system for forming a permanent plug in a subterranean formation, the system including: a solution of colloidal silica; a distribution system operable to pump the solution of colloidal silica into a bore of a subterranean well so that the colloidal silica penetrates pores of the subterranean formation; a gelation system operable to form a gel with the colloidal silica within the pores of the subterranean formation at a gel formation temperature over a gel formation period; and a dehydration system operable to heat the gel to a dehydration temperature within the pores of the subterranean formation after the gel formation period at a dehydration temperature over a ten hour period to form a glass-like material of dehydrated colloidal silica within the pores of the subterranean formation, where the dehydration temperature is greater than the gel formation temperature; where the dehydration system includes a microwave system operable to lower into the bore of the subterranean well to generate heat. 5. The system of claim 4 , further including a microwave enabler operable to be located within the subterranean well and heated with the microwave system. 6. A method for forming a permanent plug in a subterranean formation, the method including: providing a solution of colloidal silica, the solution of colloidal silica including a stabilized mixture of silica particles suspended in a liquid; pumping the colloidal silica into a bore of a subterranean well so that the colloidal silica penetrates pores of the subterranean formation; providing for gelling-up of the solution of colloidal silica to provide a gel of colloidal silica within pores of the subterranean formation by heating the colloidal silica at a gel formation temperature over a gel formation period to form a gel; and after the gel formation period, heating the gel to a dehydration temperature within the pores of the subterranean formation to form a glass-like material of dehydrated colloidal silica within the pores of the subterranean formation by lowering a microwave enabler into the bore of the subterranean well, positioning the microwave enabler proximate to the dehydrated colloidal silica, and heating the microwave enabler with a microwave system, the microwave enabler being a ceramic, and where the dehydration temperature is greater than the gel formation temperature. 7. The method of claim 6 , wherein the silica particles range in size from 1 to 20 nm. 8. The method of claim 6 , wherein the dehydrated colloidal silica permanently plugs the pores of the subterranean formation. 9. The method of claim 6 , wherein providing the gelling-up of the solution of colloidal silica includes mixing the solution of colloidal silica with an activator.

Assignees

Inventors

Classifications

  • Plastering the borehole wall; Injecting into the formation · CPC title

  • C09K8/426Primary

    for plugging · CPC title

  • C09K8/46Primary

    containing inorganic binders, e.g. Portland cement · CPC title

  • containing alkyl, ammonium or metal silicates; containing silica sols {(reaction mixtures resulting in mineral polymers C04B28/006; polymeric reaction products of alkali metal silicates with isocyanates C08G18/3895)} · CPC title

  • Nanoparticle-containing well treatment fluids · CPC title

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What does patent US11124689B2 cover?
Systems and methods for forming a permanent plug in a subterranean formation include providing a solution of colloidal silica and pumping the colloidal silica into a bore of a subterranean well so that the colloidal silica penetrates pores of the subterranean formation. The colloidal silica within the pores of the subterranean formation is dehydrated to form a glass-like material within the por…
Who is the assignee on this patent?
Saudi Arabian Oil Co
What technology area does this patent fall under?
Primary CPC classification C09K8/426. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 21 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).