Method for producing liquid discharge head

US11123989B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11123989-B2
Application numberUS-201816177907-A
CountryUS
Kind codeB2
Filing dateNov 1, 2018
Priority dateNov 27, 2017
Publication dateSep 21, 2021
Grant dateSep 21, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

When the metal constituting a metal layer becoming a diffusion prevention layer is defined as a first metal and the metal constituting a connection terminal is defined as a second metal, in a potential-pH diagram for the first metal-H2O system, the first metal is present in a passivation area or an insensitive area at a potential of the difference between the standard electrode potentials of the first metal and the second metal in a pH range of 1 to 14.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for producing a liquid discharge head comprising a substrate provided with an energy generating element that generates energy to be used for discharging a liquid, an electrical wiring layer electrically connected to the energy generating element, a connection terminal disposed on the electrical wiring layer and performing electrical connection to the outside, and a diffusion prevention layer between the connection terminal and the electrical wiring layer; a channel forming member disposed on the substrate and including a resin forming a liquid flow path; and an intermediate layer disposed between the channel forming member and the substrate, the method comprising: disposing a metal layer to form the diffusion prevention layer on the substrate; disposing the connection terminal on the metal layer; etching the metal layer with an acid solution using the connection terminal as a mask to form the diffusion prevention layer; forming a layer that becomes the intermediate layer on the substrate provided with the connection terminal and the diffusion prevention layer, providing a pattern of a photoresist on the layer becoming the intermediate layer, etching the layer becoming the intermediate layer using the pattern as a mask to form an intermediate layer, and peeling the pattern with an alkaline solution; and forming the channel forming member on the intermediate layer, wherein when a metal constituting the metal layer becoming the diffusion prevention layer is defined as a first metal and a metal constituting the connection terminal is defined as a second metal, in a potential-pH diagram for a first metal-H 2 O system, the first metal is present in a passivation area or an insensitive area at a potential of a difference between a standard electrode potentials of the first metal and the second metal in a pH range of 1 to 14. 2. The method for producing the liquid discharge head according to claim 1 , wherein the first metal is any metal selected from Pd, Nb, Rh, Ta, and Pt. 3. The method for producing the liquid discharge head according to claim 1 , wherein the first metal is any metal selected from Pd, Nb, and Rh. 4. The method for producing the liquid discharge head according to claim 1 , wherein the second metal is Au. 5. The method for producing the liquid discharge head according to claim 1 , wherein the acid solution is fluonitric acid. 6. The method for producing the liquid discharge head according to claim 1 , wherein the intermediate layer is at least of polyetheramide or an epoxy resin.

Assignees

Inventors

Classifications

  • B41J2/1628Primary

    dry etching · CPC title

  • Electrical connections, e.g. details on electrodes, connecting the chip to the outside... · CPC title

  • thin film formation by sputtering · CPC title

  • sacrificial molding · CPC title

  • photolithography · CPC title

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What does patent US11123989B2 cover?
When the metal constituting a metal layer becoming a diffusion prevention layer is defined as a first metal and the metal constituting a connection terminal is defined as a second metal, in a potential-pH diagram for the first metal-H2O system, the first metal is present in a passivation area or an insensitive area at a potential of the difference between the standard electrode potentials of th…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification B41J2/1628. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 21 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).