Lithographic printing plate precursor, method of preparing lithographic printing plate, and lithographic printing method
US-2019232703-A1 · Aug 1, 2019 · US
Lithographic printing plate precursors and method of use
US11117412B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11117412-B2 |
| Application number | US-201916589240-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 1, 2019 |
| Priority date | Oct 1, 2019 |
| Publication date | Sep 14, 2021 |
| Grant date | Sep 14, 2021 |
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Abstract
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Lithographic printing plate precursors are prepared with a unique aluminum-containing substrate and one or more radiation-sensitive imageable layers. The aluminum-containing substrate is prepared by three separate and sequential anodizing processes to provide an inner aluminum oxide layer having an average dry thickness (T i ) of 500-1,500 nm and a multiplicity of inner pores having an average inner pore diameter (D i ) larger than 0 and <15 nm. A formed middle aluminum oxide layer has a dry thickness (T m ) of 60-300 nm and a multiplicity of middle pores of average middle pore diameter (D m ) of 15-60 nm, arranged over the inner aluminum oxide layer. A formed outer aluminum oxide layer comprises a multiplicity of outer pores having an average outer pore diameter (D o ) of 5-35 nm and an average dry thickness (T o ) of 30-150 nm, arranged over the middle aluminum oxide layer. D m is larger than D o that is larger than D i .
First claim
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The invention claimed is: 1. An aluminum-containing substrate comprising: an aluminum-containing plate having a grained and etched surface; an inner aluminum oxide layer over the grained and etched surface, the inner aluminum oxide layer having an average dry thickness (T i ) of at least 500 nm and up to and including 1,500 nm; and comprising a multiplicity of inner pores having an average inner pore diameter (D i ) of more than 0 nm but less than 15 nm; a middle aluminum oxid…
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- What does patent US11117412B2 cover?
- Lithographic printing plate precursors are prepared with a unique aluminum-containing substrate and one or more radiation-sensitive imageable layers. The aluminum-containing substrate is prepared by three separate and sequential anodizing processes to provide an inner aluminum oxide layer having an average dry thickness (T i ) of 500-1,500 nm and a multiplicity of inner pores having an average …
- Who is the assignee on this patent?
- Eastman Kodak Co
- What technology area does this patent fall under?
- Primary CPC classification B41N3/034. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Sep 14 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).