Method for reducing temperature spread in reformer

Patent metadata

Field	Value
Publication number	US-11117110-B2
Application number	US-201716075732-A
Country	US
Kind code	B2
Filing date	Feb 3, 2017
Priority date	Feb 4, 2016
Publication date	Sep 14, 2021
Grant date	Sep 14, 2021

Abstract

The invention is directed to a method for heating a process gas in a top or bottom fired reformer, a method for improving the temperature spread over a top or bottom fired reformer, and to a top or bottom fired reformer wherein these methods can applied. This can be achieved by the lane flow rate of at least one outer tube lane being different from the lane flow rate of at least one inner tube lane.

First claim

The invention claimed is:

1. Method for heating a process gas in a top or bottom fired reformer comprising one or more burners, two outer lanes of reformer tubes, and one or more inner lanes of reformer tubes, each reformer tube comprising an inlet, the method comprising flowing process gas through the reformer tubes of the inner and outer lanes,
wherein each lane has a lane flow rate, which is defined as the total amount of process gas that flows through the reformer tubes of said lane per unit time,
wherein the lane flow rate of at least one outer lane is different from the lane flow rate of at least one inner lane and controlled in operando in dependence of a monitored temperature spread over an output of the two outer lanes of reformer tubes and the one or more inner lanes of reformer tubes, by having set the lane flow rate of said outer tube lane upstream of the reformer tube inlets in a gas header that is positioned outside a firebox of the reformer and that is arranged for providing said at least one outer lane with process gas, or upstream thereof, and
wherein a flow regulator is provided
at an inlet of the gas header of the at least one outer lane; or
at a tube inlet of a tube that provides process gas to the gas header of the at least one outer lane.

2. Method according to claim 1 , wherein said gas header for providing the reformer tubes in said lane with process gas, the gas header has
at least one inlet for process gas to enter the gas header; and
multiple outlets for process gas to exit the gas header and be fed to the reformer tubes of the at least one outer lane;
wherein each reformer tube of said at least one outer lane is fluidly connected to at least one of the outlets of the gas header, and
wherein the gas header is provided with a process gas at a flow rate such that the at least one outer lane has a different lane flow rate from the at least one inner lane.

3. Method according to claim 1 , wherein the outer lane is provided with a lane flow rate that is different from the lane flow rate of the at least one inner lane by setting the flow rate at which the gas header of said outer lane is provided with process gas.

4. Method according to claim 3 , wherein a flow regulator is used to provide the lane flow rate of the at least one outer lane different from the lane flow rate of the at least one inner lane, wherein the flow regulator partially blocks or obstructs the flow of process gas provided to the gas header of the at least one outer lane.

5. Method according to claim 4 , wherein the flow regulator is an insert, a valve, a plate, an orifice plate, a restriction orifice or a venturi nozzle.

6. Method according to claim 1 , wherein the lane flow rate is or has been set by providing a flow regulator upstream of the reformer tubes.

7. Method according claim 1 , wherein each lane of reformer tubes comprises a gas header for providing the reformer tubes in the lane with process gas, each gas header having
at least one inlet for process gas to enter the gas header and
multiple outlets for process gas to exit the gas header and be fed to the reformer tubes,
wherein each reformer tube of a certain lane is fluidly connected to one of the multiple outlets of the gas header of that same lane, and
wherein the reformer further comprises a gas distributor for distributing process gas over the gas headers, wherein the gas distributor comprises
at least one inlet for process gas to enter the gas distributor,
multiple outlets for process gas to exit the gas distributor and be fed to the gas headers,
wherein each gas header inlet is fluidly connected to one of the multiple outlets of the gas distributor,
wherein the lane flow rate of the at least one outer lane is different from the lane flow rate of the at least one inner lane by creating a pressure drop between the gas header of the at least one outer lane and the gas distributor, wherein the pressure drop is preferably created by a flow regulator.

8. Method according to claim 1 , wherein one or both outer lanes have a lane flow rate that is different from any one inner lane.

9. Method according to claim 1 ,
wherein one or both outer lanes have a lane flow rate that is 90-99%, for example 95-98%, of the lane flow rate of the inner lane with the highest lane flow rate; or
wherein one or both outer lanes have a lane flow rate that is 101-110%, for example 102-105%, of the lane flow rate of the inner lane with the lowest lane flow rate.

10. Method according to claim 1 ,
wherein one or both outer lanes have a lane flow rate that is 90-99%, for example 95-98%, of the lane flow rate of any of the inner lanes; or
wherein one or both outer lanes have a lane flow rate that is 101-110%, for example 102-105%, of the lane flow rate of any of the inner lanes.

11. Method according to claim 1 , wherein the difference in lane flow rate between the two outer lanes is less than 0.5%, preferably less than 0.1%, based on the outer lane with the lowest lane flow rate.

12. Method according to claim 1 , wherein said one or more inner lanes comprise two first inner lanes and one or more further inner lanes, wherein each first inner lane is adjacent to one outer lane and to one further inner lane, and
wherein one or both first inner lanes have a lane flow rate that is both different from the lane flow rate of the outer lane adjacent to it and from the lane flow rate of the further inner lane adjacent to it.

13. Method according to claim 1 , wherein the burners located adjacent to a side wall of the reformer chamber may have one or more injection properties different from the burners that are not located adjacent to a wall of the reformer chamber,
wherein the one or more injection properties are selected from the group consisting of the angle of the oxidant injector, the angle of the fuel injector, the flow rate at which the oxidant leaves the oxidant injector, the flow rate at which the fuel leaves the fuel injector, the amount of oxidant injectors, the location of the oxidant injectors, the amount of fuel injectors and the location of the fuel injectors.

14. Method according to claim 1 , wherein said at least one outer lane comprises a gas header for providing the reformer tubes in said lane with process gas, wherein the difference in lane flow rate is achieved by setting or having set the flow rate at which the gas header of said certain tube lane provides the reformer tubes in said lane with process gas.

15. Method according to claim 1 , wherein a flow regulator is set—and if necessary—to adjust the flow rate at which process gas is provided to the gas header of a certain tube lane dependent on the temperature of the process gas leaving said certain tube lane.

16. Method according to claim 1 , comprising controlling a temperature distribution over the reformer, said controlling comprising comparing a difference in temperature between the process gas leaving the different reformer tube lanes and adjusting—if necessary—said lane flow rate of at least one outer lane.

Assignees

• Technip France

Inventors

• Van Uffelen Roland
• Walspurger Stephane

Classifications

• C01B2203/1619

  Measuring the temperature · CPC title

• B01J8/062 Primary

  being installed in a furnace · CPC title

• C01B2203/169

  Controlling the feed · CPC title

• C01B2203/141

  At least two reforming, decomposition or partial oxidation steps in parallel · CPC title

• C01B2203/0227

  containing a catalytic reforming step · CPC title