Antibacterial medical implant surface

US11116877B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11116877-B2
Application numberUS-201815927428-A
CountryUS
Kind codeB2
Filing dateMar 21, 2018
Priority dateMar 21, 2017
Publication dateSep 14, 2021
Grant dateSep 14, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Aspects include methods of fabricating antibacterial surfaces for medical implant devices including patterning a photoresist layer on a silicon substrate and etching the silicon to generate a plurality of nanopillars. Aspects also include removing the photoresist layer from the structure and coating the plurality of nanopillars with a biocompatible film. Aspects also include a system for preventing bacterial infection associated with medical implants including a thin silicon film including a plurality of nanopillars.

First claim

Opening claim text (preview).

What is claimed is: 1. A system for preventing bacterial infection associated with medical implant procedures, comprising: a silicon film comprising a controlled pattern of a plurality of nanopillars that have been etched into a silicon base, the plurality of nanopillars spaced apart at regular intervals comprising a pitch of 400 to 450 nm, the plurality of nanopillars formed by: patterning a photoresist to expose a surface of the silicon base; depositing a metal layer on a top surface of the photoresist and on the exposed surface of the silicon base; removing the photoresist to lift off portions of the metal layer on the top surface of the photoresist; and recessing portions of the silicon base under remaining portions of the metal layer using a metal-assisted chemical etch, wherein the metal-assisted chemical etch is locally restricted to an interface between the remaining portions of the metal layer and the exposed surface of the silicon base; wherein each of the plurality of nanopillars has a top pillar diameter within a range from about 1 nanometer to about 200 nanometers; and wherein each of the plurality of nanopillars has a same height. 2. The system according to claim 1 , further comprising a biocompatible film. 3. The system according to claim 2 , wherein the biocompatible film coats a surface of the plurality of nanopillars. 4. The system according to claim 2 , wherein the biocompatible film comprises titanium. 5. The system according to claim 2 , wherein the biocompatible film forms a conformal coating on the plurality of nanopillars. 6. The system according to claim 2 , wherein the biocompatible film comprises a conductive metal. 7. The system according to claim 6 , wherein the conductive metal film comprises platinum, silver, aluminum, nickel, titanium, or alloys thereof. 8. The system according to claim 2 , wherein the biocompatible film comprises aluminum oxide, hydroxyapatite, silicon dioxide, titanium carbide, titanium nitride, titanium dioxide, zirconium dioxide, calcium phosphate, chromium nitride, collagen, chitosan, cellulose or cellulose derivatives, poly-/-lactic acid (PLLA), poly(ε-caprolactone) (PCL), poly(lactide-co-glycolide) (PLGA), poly(ether imide) (PEI), poly(1,3-trimethylene carbonate) (PTMC), poly(styrene sulfonate) (PSS), or combinations thereof. 9. The system according to claim 2 , wherein the biocompatible film comprises nitrides, oxides, metallic oxides, metallic hydroxides, nanoporous inorganic coatings, natural polymers, synthetic polymers, or a combinations thereof. 10. The system according to claim 2 , wherein the biocompatible film comprises titanium nitride. 11. The system according to claim 1 , wherein the silicon base has a thickness of less than or equal to about 100 micrometers. 12. The system according to claim 1 , wherein the silicon film has a thickness of about 1 micron to about 100 microns. 13. The system according to claim 1 , wherein the silicon film is flexible. 14. The system according to claim 1 , wherein the silicon film is adhered to a surface of a medical implant device. 15. The system according to claim 14 , wherein the medical implant device allows human cell adherence or growth. 16. The system according to claim 1 , wherein the silicon film has a thickness of less than 50 micrometers.

Assignees

Inventors

Classifications

  • Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties · CPC title

  • Manufacture or treatment of substrate-free structures, i.e. not connected to any support · CPC title

  • of static structures · CPC title

  • Other specific inorganic materials not covered by A61L27/303 - A61L27/32 · CPC title

  • A61L31/16Primary

    Biologically active materials, e.g. therapeutic substances {(A61L31/047 takes precedence)} · CPC title

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What does patent US11116877B2 cover?
Aspects include methods of fabricating antibacterial surfaces for medical implant devices including patterning a photoresist layer on a silicon substrate and etching the silicon to generate a plurality of nanopillars. Aspects also include removing the photoresist layer from the structure and coating the plurality of nanopillars with a biocompatible film. Aspects also include a system for preven…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification B81C1/00206. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 14 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).