Calixarene compound and curable composition

Patent metadata

Field	Value
Publication number	US-11111225-B2
Application number	US-201716463037-A
Country	US
Kind code	B2
Filing date	Nov 16, 2017
Priority date	Dec 1, 2016
Publication date	Sep 7, 2021
Grant date	Sep 7, 2021

Abstract

A compound useful as a release agent, and a release agent, a curable composition, and a nanoimprint lithography resin material each containing the compound are provided. More specifically, a calixarene compound with a molecular structure represented by the following structural formula (1) and a composition containing the calixarene compound are provided.wherein R1 denotes a structural moiety with a perfluoroalkyl group, R2 denotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group, R3 denotes a hydrogen atom, an aliphatic hydrocarbon group that may have a substituent, or an aryl group that may have a substituent, n denotes an integer in the range of 2 to 10, and * denotes a bonding point with an aromatic ring.

First claim

The invention claimed is:

1. A release agent that is a calixarene compound with a molecular structure represented by the following structural formula (1-1) or (1-2):

wherein, in structural formula (1-1) and (1-2):
R 1 denotes a structural moiety represented by structural formula (2):
—R 4 —Y—R 4 —R F   (2)

wherein, in structural formula (2):
R 4 independently denotes a direct bond or an alkylene group having 1 to 6 carbon atoms,
R F denotes a perfluoroalkyl group, and
Y denotes a carbonyl group, an oxygen atom, or a sulfur atom;

R 2 denotes a structural moiety represented by:

wherein, in structural formula (3-1), (3-2), (3-4), (3-7), (4-1), (4-2), (4-3), (4-4), (4- 5), (4-6), or (4-7):
R 4 independently denotes an alkylene group having 1 to 6 carbon atoms,
R 5 independently denotes an alkyl group having 1 to 3 carbon atoms,
and R 6 denotes a hydrogen atom or a methyl group;

R 3 denotes a hydrogen atom, an aliphatic hydrocarbon group that may have a substituent, or an aryl group that may have a substituent; and
n denotes an integer in the range of 4 to 10.

2. The release agent that is the calixarene compound according to claim 1 , wherein R 2 denotes a structural moiety with a vinyl group, a vinyloxy group, an ethynyl group, an ethynyloxy group, a (meth)acryloyl group, or a (meth)acryloyloxy group.

3. A curable composition comprising: the release agent that is the calixarene compound according to claim 1 ; and a curable resin material.

4. A nanoimprint lithography resin material comprising the release agent that is the calixarene compound according to claim 1 .

5. A curable composition comprising: the release agent that is the calixarene compound according to claim 2 ; and a curable resin material.

6. A nanoimprint lithography resin material comprising the release agent that is the calixarene compound according to claim 2 .

Assignees

• Dainippon Ink & Chemicals

Inventors

• Yamamoto Shinya
• Miyamoto Masanori
• Imada Tomoyuki

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• H10P76/00

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• C07F7/04

  Esters of silicic acids · CPC title

• C07C43/23

  containing hydroxy or O-metal groups · CPC title

• C07C49/83

  polycyclic · CPC title