Method of forming crystallized semiconductor layer, method of fabricating thin film transistor, thin film transistor, and display apparatus

Patent metadata

Field	Value
Publication number	US-11101368-B2
Application number	US-201916638924-A
Country	US
Kind code	B2
Filing date	Mar 5, 2019
Priority date	Mar 5, 2019
Publication date	Aug 24, 2021
Grant date	Aug 24, 2021

Abstract

A method of forming a crystallized semiconductor layer includes forming an insulating crystallization inducing layer on a base substrate; forming a semiconductor material layer on a side of the insulating crystallization inducing layer away from the base substrate by depositing a semiconductor material on the insulating crystallization inducing layer, the semiconductor material being deposited at a deposition temperature that induces crystallization of the semiconductor material; forming an alloy crystallization inducing layer including an alloy on a side of the semiconductor material layer away from the insulating crystallization inducing layer; and annealing the alloy crystallization inducing layer to further induce crystallization of the semiconductor material to form the crystallized semiconductor layer. Annealing the alloy crystallization inducing layer is performed to enrich a relatively more conductive element of the alloy to a side away from the base substrate, thereby forming an annealed crystallization inducing layer.

First claim

What is claimed is:

1. A method of forming a crystallized semiconductor layer, comprising:
forming an insulating crystallization inducing layer on a base substrate;
forming a semiconductor material layer on a side of the insulating crystallization inducing layer away from the base substrate by depositing a semiconductor material on the insulating crystallization inducing layer, the semiconductor material being deposited at a deposition temperature that induces crystallization of the semiconductor material;
forming an alloy crystallization inducing layer comprising an alloy on a side of the semiconductor material layer away from the insulating crystallization inducing layer; and
annealing the alloy crystallization inducing layer to further induce crystallization of the semiconductor material to form the crystallized semiconductor layer;
wherein annealing the alloy crystallization inducing layer is performed under a condition to enrich a relatively more conductive element of the alloy to a side away from the base substrate, and enrich a relatively less conductive element of the alloy to a side closer to the base substrate, thereby forming an annealed crystallization inducing layer.

2. The method of claim 1 , wherein the relatively more conductive element of the alloy of the annealed crystallization inducing layer has an increasing gradient distribution along a direction from the side closer to the base substrate to the side away from the base substrate; and
the relatively less conductive element of the alloy of the annealed crystallization inducing layer has a decreasing gradient distribution along the direction from the side closer to the base substrate to the side away from the base substrate.

3. The method of claim 1 , wherein the insulating crystallization inducing layer is formed using a highly textured insulating material.

4. The method of claim 3 , wherein a ratio of a lattice constant of the highly textured insulating material to a lattice constant of the crystallized semiconductor layer is in a range of 1.5:1 to 1:1.5.

5. The method of claim 1 , wherein the insulating crystallization inducing layer comprises a material selected from a group consisting of magnesium oxide, aluminum oxide, zirconium oxide, and hafnium oxide.

6. The method of claim 1 , wherein the alloy is a metal silicon alloy;
the relatively more conductive element of the alloy is a metal; and
the relatively less conductive element of the alloy is silicon.

7. The method of claim 6 , wherein the alloy comprises a material selected from a group consisting of gold silicon alloy, aluminum silicon alloy, tin silicon alloy, and copper silicon alloy.

8. The method of claim 6 , wherein the metal in the annealed crystallization inducing layer has an increasing gradient distribution along a direction from the side closer to the base substrate to the side away from the base substrate; and
silicon in the annealed crystallization inducing layer has a decreasing gradient distribution along the direction from the side closer to the base substrate to the side away from the base substrate.

9. The method of claim 1 , wherein the deposition temperature is in a range of 250 Celsius degrees to 400 Celsius degrees.

10. A method of fabricating a thin film transistor, comprising forming the crystallized semiconductor layer according to the method of claim 1 ;
patterning the annealed crystallization inducing layer and the crystallized semiconductor layer in a same patterning process using a single mask plate to form an active layer, the annealed crystallization inducing layer in a region outside a region corresponding to the active layer is substantially removed;
removing the annealed crystallization inducing layer in a region corresponding to a channel part of the active layer while at least partially maintaining the annealed crystallization inducing layer in regions corresponding to a source electrode contact part and a drain electrode contact part of the active layer, thereby forming an ohmic contact layer comprising a first ohmic contact pad on the source electrode contact part and a second ohmic contact pad on the drain electrode contact part; and
forming a source electrode on a side of the first ohmic contact pad away from the base substrate, and a drain electrode on a side of the second ohmic contact pad away from the base substrate.

11. The method of claim 10 , prior to forming the insulating crystallization inducing layer, further comprising forming a gate electrode on the base substrate;
wherein the insulating crystallization inducing layer is formed as a gate insulating layer insulating the gate electrode from the active layer.

12. A thin film transistor, comprising:
a base substrate;
an insulating crystallization inducing layer on the base substrate;
an active layer on a side of the insulating crystallization inducing layer away from the base substrate, the active layer having a channel part, a source electrode contact part, and a drain electrode contact part, the active layer comprising a crystallized semiconductor;
an ohmic contact layer comprising a first ohmic contact pad on a side of the source electrode contact part away from the insulating crystallization inducing layer and a second ohmic contact pad on a side of the drain electrode contact part away from the insulating crystallization inducing layer;
a source electrode on a side of the first ohmic contact pad away from the base substrate; and
a drain electrode on a side of the second ohmic contact pad away from the base substrate;
wherein the first ohmic contact pad comprises an alloy having a relatively more conductive element of the alloy enriched on a side of the first ohmic contact pad away from the base substrate and a relatively less conductive element of the alloy enriched on a side of the first ohmic contact pad closer to the base substrate; and
the second ohmic contact pad comprises an alloy having a relatively more conductive element of the alloy enriched on a side of the second ohmic contact pad away from the base substrate and a relatively less conductive element of the alloy enriched on a side of the second ohmic contact pad closer to the base substrate.

13. The thin film transistor of claim 12 , wherein the relatively more conductive element of the alloy of the first ohmic contact pad has an increasing gradient distribution along a direction from the side closer to the base substrate to the side away from the base substrate;
the relatively less conductive element of the alloy of the first ohmic contact pad has a decreasing gradient distribution along the direction from the side closer to the base substrate to the side away from the base substrate;
the relatively more conductive element of the alloy of the second ohmic contact pad has an increasing gradient distribution along the direction from the side closer to the base substrate to the side away from the base substrate; and
the relatively less conductive element of the alloy of the second ohmic contact pad has a decreasing gradient distribution along the direction from the side closer to the base substrate to the side away from the base substrate.

14. The thin film transistor of claim 12 , wherein the insulating crystallization inducing layer comprises a highly textured insulating material.

15. The thin film transistor of claim 14 , wherein a ratio of a lattice constant of the highly textured insulating material to a lattice constant of the crystallized semiconductor is in a range of 1.5:1 to 1:1.5.

16. The thin film transistor of claim 12 , wherein the insulating crystallization inducing

Assignees

• Beijing Boe Display Tech Co
• Boe Technology Group Co Ltd

Inventors

• Qu Lianjie
• Zhao Hebin
• Qi Yonglian
• Qiu Yun
• Wang Dan

Classifications

• H10P14/3806 Primary

  using crystallisation-enhancing elements · CPC title

• H10P14/3411 Primary

  Silicon, silicon germanium or germanium · CPC title

• H10P14/3238

  being insulating materials · CPC title

• H10D30/0321 Primary

  comprising silicon, e.g. amorphous silicon or polysilicon · CPC title

• H10D30/6755

  Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate · CPC title