Cobalt, iron, boron, and/or nickel alloy-containing articles and methods for making same

Patent metadata

Field	Value
Publication number	US-11101118-B2
Application number	US-201916257872-A
Country	US
Kind code	B2
Filing date	Jan 25, 2019
Priority date	May 14, 2015
Publication date	Aug 24, 2021
Grant date	Aug 24, 2021

Abstract

Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X=B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.

First claim

The invention claimed is:

1. A sputtering target comprising:
an alloy of formula (CoFe) 1-x B x , wherein 0.2≤x≤0.4;
wherein the sputtering target has a column microstructure framed by borides and a magnetic pass through flux of at least 30% at a thickness of 3 mm; and
wherein the sputtering target is substantially free of cracks.

2. The sputtering target of claim 1 , wherein the sputtering target has a purity of greater than 99.99%.

3. The sputtering target of claim 1 , wherein the sputtering target has an oxygen content less than 40 ppm.

4. The sputtering target of claim 1 , wherein the sputtering target has a diameter of up to 250 mm.

5. The sputtering target of claim 1 , wherein the alloy further comprises C or Al.

6. A sputtering target having a column microstructure framed by CoFeB intermetallics, wherein the sputtering target comprises an alloy of formula (CoFe) 1-x B x , wherein 0.2≤x≤0.4, and wherein the sputtering target has a purity of greater than 99.99% and a low oxygen content of 40 ppm or less.

7. The sputtering target of claim 6 , wherein the sputtering target has a pass through flux of at least 30% at a thickness of 3 mm.

8. The sputtering target of claim 6 , wherein the sputtering target has a diameter of up to 250 mm.

9. The sputtering target of claim 6 , wherein the alloy further comprises C or Al.

Assignees

• Materion Corp

Inventors

• Yang Xingbo
• Stojakovic Dejan
• Komertz Matthew J
• Testanero Arthur V

Classifications

• B22D7/02

  Casting compound ingots of two or more different metals in the molten state, i.e. integrally cast · CPC title

• C23C14/3414 Primary

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• B22D27/045

  Directionally solidified castings · CPC title

• H01J37/3426 Primary

  Material · CPC title

• C22C19/07

  based on cobalt · CPC title