Target and process for producing a target

Patent metadata

Field	Value
Publication number	US-11101116-B2
Application number	US-201515324810-A
Country	US
Kind code	B2
Filing date	Jun 30, 2015
Priority date	Jul 8, 2014
Publication date	Aug 24, 2021
Grant date	Aug 24, 2021

Abstract

A target includes a target plate and a stabilizing layer which is joined to the rear side of the target plate. The stabilizing layer was produced by high-kinetic-energy spraying of stabilizing material onto the target plate. A process for producing a target is also provided.

First claim

The invention claimed is:

1. A target, comprising:
a target plate made of a target material configured for physical vapor deposition, said target plate having a rear side;
a stabilizing layer joined to said rear side of said target plate, said stabilizing layer being formed of a material different from said target material, said stabilizing layer being formed to support said target material on said rear side of said target plate and said stabilizing layer having characteristics of having been applied to said target plate by high-kinetic-energy spraying of stabilizing material; and
a composition of said stabilizing material being configured to change during the spraying so that a continuous material gradient is obtained in said stabilizing layer and said composition being configured to increase a strength and a stiffness of said stabilizing layer.

2. The target according to claim 1 , wherein said target plate is made of a material selected from the group consisting of aluminum-based materials, chromium-based materials, titanium-based materials and ceramics.

3. The target according to claim 1 , wherein said stabilizing layer is made of one or more materials selected from the group consisting of copper, copper alloys including brass and bronzes, aluminum, aluminum alloys, titanium, titanium alloys and steel.

4. The target according to claim 1 , wherein a ratio of a thickness of said stabilizing layer to a thickness of said target plate is in a range of from 1/1 to 1/5.

5. The target according to claim 1 , wherein a ratio of a thickness of said stabilizing layer to a thickness of said target plate is in a range of from 1/2 to 1/4.

6. The target according to claim 1 , wherein said rear side of said target plate has at least one depression formed therein.

7. A process for producing a target, the process comprising the following steps:
providing a target plate made of a target material configured for physical vapor deposition, said target plate having a rear side;
providing a stabilizing material that is different from the target material and spraying the stabilizing material onto the target plate by using a high-kinetic-energy spraying process producing a stabilizing layer on the rear side of the target plate, said stabilizing layer being formed to support said target material on said rear side of said target plate; and
altering the composition of the stabilizing material during spraying onto the target plate so as to give a continuous material gradient in respect of the composition of the stabilizing layer, and altering the composition in such a way that a strength and a stiffness of said stabilizing layer thus produced is increased.

8. The process according to claim 7 , which further comprises applying a diffusion-promoting layer to aid bonding.

Assignees

• Plansee Se
• Plansee Composite Mat Gmbh

Inventors

• Gradinger Rudolf
• Kathrein Martin
• Kolozsvari Szilard
• Polcik Peter

Classifications

• C23C14/3414 Primary

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• H01J37/3417 Primary

  Arrangements · CPC title

• C23C14/34 Primary

  Sputtering · CPC title

• H01J37/3426

  Material · CPC title

• C23C14/3435

  Applying energy to the substrate during sputtering · CPC title