High entropy alloy thin film coating and method for preparing the same

Patent metadata

Field	Value
Publication number	US-11098403-B2
Application number	US-201715426164-A
Country	US
Kind code	B2
Filing date	Feb 7, 2017
Priority date	Feb 7, 2017
Publication date	Aug 24, 2021
Grant date	Aug 24, 2021

Abstract

A method for preparing a high entropy alloy thin film coating includes preparing a melt alloy by arc melting raw materials including five or more elements, casting the melt alloy into a mold to form a target, placing the target inside a vacuum chamber of a magnetron sputtering system, and rotatably fixing a substrate inside the vacuum chamber, spaced apart from the target. A high entropy alloy thin film is deposited on the substrate by high vacuum radio frequency sputtering inside the vacuum chamber.

First claim

The invention claimed is:

1. A method for preparing a high entropy alloy thin film coating comprising the steps of:
preparing a melt alloy by arc melting Cobalt, Chromium, Iron, Nickel, and Aluminium provided in the atomic rations of 1:1:1:1:0.3;
casting the melt alloy into a mold to form a target;
placing the target inside a vacuum chamber of a magnetron sputtering system, the target being the only target placed inside the vacuum chamber;
rotatably fixing a substrate inside the vacuum chamber, spaced apart from the target; and
depositing a high entropy alloy thin film on the substrate by high vacuum radio frequency sputtering inside the vacuum chamber, wherein the high entropy alloy thin film has a face-centred cubic nanocrystalline structure.

2. The method according to claim 1 wherein the Cobalt Chromium, Iron, Nickel, and Aluminium have a high purity of >99.99%.

3. The method according to claim 1 wherein the mold is made of copper.

4. The method according to claim 1 wherein the target is machined to ensure it has a smooth surface and accurate dimensions.

5. The method according to claim 1 wherein the target is fixed to the vacuum chamber via a target holder.

6. The method according to claim 1 wherein the substrate is silicon.

7. The method according to claim 1 wherein the substrate is ultrasonically cleaned before putting it in the vacuum chamber.

8. The method according to claim 1 wherein the substrate is rinsed with acetone, ethanol and/or deionized water before putting it in the vacuum chamber.

9. The method according to claim 8 wherein the substrate is rinsed for around 15 minutes each with acetone, ethanol and/or deionized water.

10. The method according to claim 1 wherein argon is added into the vacuum chamber when the base pressure is less than 1 μPa.

11. The method according to claim 10 wherein the argon has a purity of at least 99.995%.

12. The method according to claim 10 wherein an ignition argon flow is set at around 20-22 cubic centimetres per minute.

13. The method according to claim 1 wherein the target is cleaned by argon ion bombardment for at least two minutes to remove any oxide or contaminants on the surface.

14. The method according to claim 1 wherein a radio frequency power supply is connected to at least one target holder inside the vacuum chamber.

15. The method according to claim 1 wherein the film is deposited on the substrate in an atmosphere of argon at room temperature.

16. The method according to claim 10 wherein an argon flow rate after ignition is around 12 cubic centimetres per minute.

17. The method according to claim 16 wherein a specific working distance between the substrate and the target is around 80 mm.

18. The method according to claim 1 wherein the rotation speed of the substrate is set at around 2 revolutions per minute to ensure homogeneous deposition.

19. The method according to claim 1 wherein power is set at around 500W for every deposition.

20. The method according to claim 1 wherein a film of around 500-1500 μm thickness is deposited for each hour.

21. A method for preparing a high entropy alloy thin film coating comprising the steps of:
preparing a melt alloy by arc melting Cobalt, Chromium, Iron, Nickel and Aluminium, each having a purity of >99.99%, in the atomic ratios of 1:1:1:1:0.3;
casting the melt alloy into a copper mold to form a target;
fixing the target to a target holder inside a vacuum chamber of a magnetron sputtering system, the target being the only target placed inside the vacuum chamber;
preparing a silicon substrate by ultrasonic cleaning, and rinsed with acetone, ethanol and deionized water for 15 minutes each;
rotatably fixing the substrate inside the vacuum chamber, spaced apart from the target;
reducing the pressure inside the vacuum chamber to less than 1 μPa;
flowing argon into the vacuum chamber;
cleaning the target by argon ion bombardment for at least two minutes; and
depositing a high entropy alloy thin film on the substrate by high vacuum radio frequency sputtering inside the vacuum chamber, wherein the high entropy alloy thin film has a face-centred cubic nanocrystalline structure.

Assignees

• Univ City Hong Kong

Inventors

• Lu Yang
• Liao Weibing

Classifications

• B22D25/00

  Special casting characterised by the nature of the product (B22D15/02, B22D17/16, B22D19/00 take precedence; casting stereotype plates B41D3/00) · CPC title

• C23C14/165

  by cathodic sputtering · CPC title

• C23C14/505

  for rotation of the substrates · CPC title

• C23C14/3414 Primary

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• C22C30/00

  Alloys containing less than 50% by weight of each constituent · CPC title