Resonator coil having an asymmetrical profile

Patent metadata

Field	Value
Publication number	US-11094504-B2
Application number	US-202016734746-A
Country	US
Kind code	B2
Filing date	Jan 6, 2020
Priority date	Jan 6, 2020
Publication date	Aug 17, 2021
Grant date	Aug 17, 2021

Abstract

Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

First claim

What is claimed is:

1. A resonator, comprising:
a housing; and
at least one coil disposed within the housing, the at least one coil comprising:
a first end coupled to an electrode, the electrode operable to accelerate ions;
a central section connected to the first end, the central section extending helically about a central axis, wherein an inner side of the central section has a flattened surface, and wherein an outer side of the central section has a curved profile; and
a second end connected to the central section, the second end coupled to the housing.

2. The resonator of claim 1 , wherein the at least one coil has a D-shaped profile.

3. The resonator of claim 1 , wherein the second end of the at least one coil is coupled to the housing by a plate.

4. The resonator of claim 1 , wherein the central section comprises:
a first axial end and a second axial end; and
a plurality of loops extending between the first and second axial ends, wherein a first loop of the plurality of loops includes a first flattened surface defining a first plane, wherein a second loop of the plurality of loops includes a second flattened surface defined a second plane, and wherein a first angle, with respect to the central axis, of the first plane is different than a second angle of the second plane.

5. The resonator of claim 4 , wherein the first angle is greater than the second angle.

6. The resonator of claim 4 , wherein the first loop is positioned at the first axial end, and wherein the second loop is positioned at the second axial end.

7. The resonator of claim 1 , wherein the at least one coil comprises a first coil and a second coil, wherein a first end of the first coil is coupled to a first electrode, wherein a first end of the second coil is coupled to a second electrode, and wherein the ion beam is operable to pass through the first and second electrodes.

8. The resonator of claim 7 , further comprising:
an exciter coil within the housing; and
an energy source connected with the exciter coil for providing radio frequency (RF) energy to the first and second coils.

9. The resonator of claim 7 , wherein the first and second coils comprise a planar component extending axially along a length thereof.

10. A resonator of an ion implanter, the resonator comprising:
a housing defining an internal cavity;
a first coil partially disposed within the internal cavity, the first coil comprising:
a first end coupled to a first electrode, the first electrode including a first opening for receiving an ion beam; and
a first central section connected with the first end, wherein the first central section includes a first plurality of loops extending helically about a central axis, wherein each of the first plurality of loops has a first flattened surface, and wherein an outer side of the first plurality of loops has a curved profile; and

a second coil adjacent the first coil, the second coil comprising:
a second end coupled to a second electrode, the second electrode including a second opening for receiving the ion beam from the first electrode; and
a second central section connected with the second end, wherein the second central section includes a second plurality of loops extending helically about the central axis, and wherein each of the second plurality of loops has a second flattened surface.

11. The resonator of claim 10 , wherein an outer side of the second plurality of loops has a curved profile.

12. The resonator of claim 10 , wherein the first and second coils are coupled together by a plate, and wherein the plate is grounded.

13. The resonator of claim 10 , wherein the first plurality of loops includes a first axial end opposite a second axial end, and wherein the second plurality of loops includes a third axial end opposite a fourth axial end.

14. The resonator of claim 13 , wherein one of the first flattened surfaces of the first plurality of loops defines a first plane, wherein another one of the first flattened surfaces of the first plurality of loops defines a second plane, and wherein a first angle, with respect to the central axis, of the first plane is different than a second angle of the second plane.

15. The resonator of claim 14 , wherein the first angle is greater than the second angle.

16. A resonator of an ion implanter, the resonator comprising:
a housing defining an internal cavity;
a first hollow coil partially disposed within the internal cavity, the first hollow coil comprising:
a first end extending outside the housing and coupled to a first electrode, the first electrode including a first opening for receiving an ion beam; and
a first central section connected with the first end, wherein the first central section includes a first plurality of loops extending helically about a central axis, wherein each of the first plurality of loops has a first flattened surface; and
a second hollow coil adjacent the first hollow coil within the internal cavity, the second hollow coil comprising:
a second end extending outside the housing and coupled to a second electrode, the second electrode including a second opening for receiving the ion beam from the first electrode; and
a second central section connected with the second end, wherein the second central section includes a second plurality of loops extending helically about the central axis, and wherein each of the second plurality of loops has a second flattened surface,
wherein the first plurality of loops includes a first axial end opposite a second axial end, wherein the second plurality of loops includes a third axial end opposite a fourth axial end, wherein one of the first flattened surfaces of the first plurality of loops defines a first plane, wherein another one of the first flattened surfaces of the first plurality of loops defines a second plane, and wherein a first angle, with respect to the central axis, of the first plane is different than a second angle of the second plane.

17. The resonator of claim 16 , wherein an outer side of the first plurality of loops and the second plurality of loops has a curved profile.

18. The resonator of claim 16 , wherein the first plurality of loops and the second plurality of loops are arranged end-to-end such that the second axial end of the first plurality of loops is directly adjacent the third axial end of the second plurality of loops.

19. The resonator of claim 16 , wherein the first and second hollow coils are winded in a same direction.

Assignees

• Applied Materials Inc

Inventors

• Biloiu Costel
• Honan Michael
• Vopat Robert B
• Blahnik David
• Carlson Charles T
• Sinclair Frank
• Murphy Paul

Classifications

• H01P7/005

  Helical resonators; Spiral resonators · CPC title

• H01J2237/0473

  accelerating · CPC title

• H01J37/3171

  for ion implantation · CPC title

• H01J37/3007 Primary

  Electron or ion-optical systems · CPC title

• H01J25/58

  having a number of resonators; having a composite resonator, e.g. a helix · CPC title