Optical emission spectroscopy system, method of calibrating the same, and method of fabricating semiconductor device

Patent metadata

Field	Value
Publication number	US-11092495-B2
Application number	US-201916293026-A
Country	US
Kind code	B2
Filing date	Mar 5, 2019
Priority date	Aug 7, 2018
Publication date	Aug 17, 2021
Grant date	Aug 17, 2021

Abstract

An optical emission spectroscopy system may include a reference light source, an analyzer to receive and analyze light transmitted from the reference light source, and a calibrator to calibrate light emitted from the reference light source. The calibrator may change a calibration ratio in accordance with an incidence angle of the light.

First claim

What is claimed is:

1. An optical emission spectroscopy system, comprising:
a reference light source;
an analyzer to receive and analyze light transmitted from the reference light source; and
a calibrator to calibrate light emitted from the reference light source, the reference light source, the analyzer, and the calibrator being coaxial along a central axis, and the light transmitted from the reference light source being incident on the calibrator at different incidence angles with respect to the central axis,
wherein facing surfaces of the reference light source and the calibrator are parallel to each other, and
wherein the calibrator calibrates a light intensity of the light incident thereon in accordance with the different incidence angles.

2. The system as claimed in claim 1 , further comprising a process chamber to perform a plasma process, the reference light source and the calibrator being inside the process chamber.

3. The system as claimed in claim 2 , wherein the calibrator includes:
a first filter to transmit light to a light receiver of the calibrator at a first incidence angle of the different incidence angles; and
a second filter to transmit light to the light receiver of the calibrator at a second incidence angle of the different incidence angles,
wherein transmittance of the first filter is different from that of the second filter.

4. The system as claimed in claim 2 , wherein the calibrator includes:
a first opening that allows light incident at a first incidence angle of the different incidence angles to pass therethrough toward a light receiver of the calibrator; and
a second opening that allows light incident at a second incidence angle of the different incidence angles to pass therethrough toward the light receiver the calibrator,
wherein a size of the first opening is different from that of the second opening.

5. The system as claimed in claim 2 , wherein the calibrator includes:
a first liquid crystal that transmits light incident at a first incidence angle of the different incidence angles to a light receiver of the calibrator; and
a second liquid crystal that transmits light incident at a second incidence angle of the different incidence angles to the light receiver of the calibrator,
wherein transmittance of the first liquid crystal is different from that of the second liquid crystal.

6. The system as claimed in claim 2 , wherein the calibrator is between the reference light source and the analyzer.

7. The system as claimed in claim 2 , further comprising a sub-calibrator between the reference light source and the analyzer, the sub-calibrator being coaxial with the reference light source.

8. The system as claimed in claim 7 , wherein the sub-calibrator includes a shade.

9. The system as claimed in claim 7 , wherein the sub-calibrator includes a shutter.

10. The system as claimed in claim 7 , further comprising a controller to control the sub-calibrator to obtain calibration factors in accordance with the different incidence angles.

11. The system as claimed in claim 10 , wherein the analyzer uses the calibration factors to calibrate light incident on the analyzer in accordance with the different incidence angles.

12. The system as claimed in claim 10 , wherein the analyzer obtains a final calibration factor from the calibration factors.

13. The system as claimed in claim 7 , wherein the sub-calibrator is immediately adjacent to the reference light source, the sub-calibrator having a plate shape overlapping an entirety of the reference light source.

14. A method of calibrating an optical emission spectroscopy system, the method comprising:
emitting a light from a reference light source toward a calibrator, facing surfaces of the reference light source and the calibrator being parallel to each other;
calibrating the light emitted from the reference light source by the calibrator, the light emitted from the reference light source being incident on the calibrator at different incidence angles with respect to a central axis between the calibrator and the reference light source; and
analyzing the calibrated light,
wherein calibrating light emitted from the reference light source includes obtaining calibration factors in accordance with the different incidence angles.

15. The method as claimed in claim 14 , wherein calibrating the light emitted from the reference light source further includes calibrating the light incident on the calibrator based on the obtained calibration factors.

16. The method as claimed in claim 14 , wherein calibrating the light emitted from the reference light source further includes obtaining a final calibration factor from the calibration factors.

17. The method as claimed in claim 14 , wherein calibrating the light emitted from the reference light source includes calibrating a light intensity in accordance with the different incidence angles.

18. A method of fabricating a device, the method comprising:
calibrating an optical emission spectroscopy system;
performing an inspection process on a process chamber, using the optical emission spectroscopy system;
loading a substrate in the process chamber; and
performing a plasma process on the substrate,
wherein calibrating the optical emission spectroscopy system includes:
emitting a light from a reference light source toward a calibrator, facing surfaces of the reference light source and the calibrator being parallel to each other,
calibrating the light emitted from the reference light source by the calibrator, the light emitted from the reference light source being incident on the calibrator at different incidence angles with respect to a central axis between the calibrator and the reference light source,
analyzing the calibrated light, and
controlling an intensity of light in accordance with the different incidence angles.

19. The method as claimed in claim 18 , wherein calibrating the optical emission spectroscopy system further includes obtaining calibration factors in accordance with the different incidence angles.

20. The method as claimed in claim 18 , wherein the plasma process includes at least one of an etching process, a chemical vapor deposition process, an ashing process, or a cleaning process.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Mun Jeongil
• Lee Hyung Joo
• Sun Jongwoo

Classifications

• G01N21/73 Primary

  using plasma burners or torches · CPC title

• H01J37/32972 Primary

  Spectral analysis · CPC title

• G02B26/08 Primary

  for controlling the direction of light (in light guides G02B6/35) · CPC title

• G02B5/20

  Filters (polarising elements G02B5/30) · CPC title

• G01J3/0229

  using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters · CPC title