Display Substrate and Manufacturing Method Therefor, and Display Device
US-2017194602-A1 · Jul 6, 2017 · US
US11088226B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11088226-B2 |
| Application number | US-201716066177-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 27, 2017 |
| Priority date | Jun 23, 2017 |
| Publication date | Aug 10, 2021 |
| Grant date | Aug 10, 2021 |
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The present application discloses a display substrate having a base substrate and a pixel definition layer for defining a plurality of subpixel regions on the base substrate. The pixel definition layer has a first side and a second side opposite to each other, the second side being on a side of the first side distal to the base substrate. The pixel definition layer has a first cross-section along a plane substantially parallel to the base substrate, the first cross-section being between the first side and the second side. An orthographic projection of the first cross-section on the base substrate substantially covers orthographic projections of the first side and the second side on the base substrate.
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What is claimed is: 1. A display substrate, comprising a base substrate and a pixel definition layer for defining a plurality of subpixel regions on the base substrate; wherein the pixel definition layer has a first side and a second side opposite to each other, the second side being on a side of the first side distal to the base substrate; the pixel definition layer has a first cross-section along a plane substantially parallel to the base substrate, the first cross-section being between the first side and the second side; and an orthographic projection of the first cross-section on the base substrate substantially covers orthographic projections of the first side and the second side on the base substrate; wherein the pixel definition layer comprises a first sub-layer and a second sub-layer on a side of the first sub-layer distal to the base substrate; the first sub-layer has a first side proximal to the base substrate and distal to the second sub-layer, a fifth side proximal to the second sub-layer and distal to the base substrate, and a third side connecting the first side and the fifth side; the second sub-layer has a sixth side and a second side opposite to each other and a fourth side connecting the sixth side and the second side, the second side being on a side of the sixth side distal to the first sub-layer; an orthographic projection of the fifth side on the base substrate substantially covers orthographic projection of the first side and the second side on the base substrate; and an orthographic projection of the sixth side on the base substrate substantially covers the orthographic projections of the first side and the second side on the base substrate wherein the pixel definition layer further comprises a light shielding sub-layer between the first sub-layer and the second sub-layer for blocking light; and the light shielding sub-layer has a light transmittance rate lower than a light transmittance rate of the first sub-layer and second sub-layer. 2. The display substrate of claim 1 , wherein a second cross-section of the pixel definition layer along a plane substantially perpendicular to the surface of the base substrate and substantially perpendicular to an extension direction of the pixel definition layer between two adjacent subpixel regions of the plurality of subpixel regions has a shape comprising a substantially trapezoid on a side of a substantially inverted trapezoid distal to the base substrate. 3. The display substrate of claim 1 , wherein a cross-section of the first sub-layer along a plane substantially perpendicular to the surface of the base substrate and substantially perpendicular to an extension direction of the pixel definition layer between two adjacent subpixel regions of the plurality of subpixel regions has a substantially inverted trapezoid shape; and a cross-section of the second sub-layer along the plane substantially perpendicular to the surface of the base substrate and substantially perpendicular to an extension direction of the pixel definition layer between two adjacent subpixel regions of the plurality of subpixel regions has a substantially trapezoid shape. 4. The display substrate of claim 1 , wherein an orthographic projection of the light shielding sub-layer on the base substrate substantially covers the orthographic projections of the first side and the second side on the base substrate. 5. The display substrate of claim 1 , wherein an orthographic projection of the light shielding sub-layer on the base substrate substantially overlaps with orthographic projections of the fifth side and the sixth side on the base substrate. 6. The display substrate of claim 1 , wherein a cross-section of the first sub-layer along a plane substantially perpendicular to the surface of the base substrate and substantially perpendicular to an extension direction of the pixel definition layer between two adjacent subpixel regions of the plurality of subpixel regions has a substantially inverted trapezoid shape; a cross-section of the second sub-layer along the plane substantially perpendicular to the surface of the base substrate and substantially perpendicular to an extension direction of the pixel definition layer between two adjacent subpixel regions of the plurality of subpixel regions has a substantially trapezoid shape; and a cross-section of the light shielding sub-layer along the plane extending substantially along the direction from the first side to the second side has a substantially rectangular shape. 7. The display substrate of claim 1 , wherein the light shielding sub-layer has a thickness less than a thickness of the first sub-layer and less than a thickness of the second sub-layer. 8. The display substrate of claim 1 , wherein the first sub-layer has a thickness in a range of approximately 0.5 μm to approximately 2.5 μm; the second sub-layer has a thickness in a range of approximately 0.5 μm to approximately 2.5 μm; and the light shielding sub-layer has a thickness approximately 1/10 to approximately ⅕ of the thickness of the first sub-layer. 9. The display substrate of claim 1 , wherein each of the first sub-layer, the light shielding sub-layer, and the second sub-layer comprises a photoresist material. 10. The display substrate of claim 1 , further comprising an organic layer in the plurality of subpixel regions; wherein the organic layer in each of the plurality of the subpixel regions has a thickness such that a side surface of the light shielding sub-layer is substantially covered by the organic layer. 11. The display substrate of claim 10 , further comprising a first electrode on a side of the organic layer proximal to the base substrate and a second electrode on a side of the organic layer distal to the base substrate; wherein the second electrode is in direct contact with the organic layer and the second sub-layer but not in direct contact with the light shielding sub-layer. 12. A display apparatus, comprising the display substrate of claim 1 . 13. A method of fabricating a display substrate, comprising forming a pixel definition layer for defining a plurality of subpixel regions on a base substrate; wherein the pixel definition layer is formed to have a first side and a second side opposite to each other, the second side being on a side of the first side distal to the base substrate; the pixel definition layer is formed to have has a first cross-section along a plane substantially parallel to a surface of the base substrate, the plane being between the first side and the second side; and the pixel definition layer is formed so that an orthographic projection of the first cross-section on the base substrate substantially covers orthographic projections of the first side and the second side on the base substrate; wherein forming the pixel definition layer comprises: forming a first photoresist material layer on the base substrate; forming a light shielding photoresist material layer on a side of the first photoresist material layer distal to the base substrate; forming a second photoresist material layer on a side of the light shielding photoresist material layer distal to the base substrate; and patterning the first photoresist material layer, the light shielding photoresist material layer, and the second photoresist material layer thereby forming the first sub-layer, the light shielding sub-layer, and the second sub-layer. 14. The method of claim 13 , wherein patterning the first photoresist material layer, the light shielding photoresist material layer, and the second photoresist material layer comprises: exposing the first photoresist material layer and the l
comprising light absorbing layers, e.g. black layers · CPC title
Changing the shape of the active layer in the devices, e.g. patterning · CPC title
Pixel-defining structures or layers, e.g. banks · CPC title
Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title
Electricity · mapped topic
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