Mask, device and method for exposure

Patent metadata

Field	Value
Publication number	US-11086228-B2
Application number	US-201816101609-A
Country	US
Kind code	B2
Filing date	Aug 13, 2018
Priority date	Dec 11, 2017
Publication date	Aug 10, 2021
Grant date	Aug 10, 2021

Abstract

A mask, a device and method for exposure are provided. The mask of the present disclosure includes: a first transparent region configured to allow light of a first wavelength to pass therethrough and filter out light of a second wavelength; and a second transparent region configured to allow the light of the second wavelength to pass therethrough, wherein the light of the second wavelength is light for exposure.

First claim

What is claimed is:

1. A mask for exposure, comprising:
a shading region, configured to allow no light to pass therethrough;
a first region, configured to allow light of a first wavelength to pass therethrough and filter out light of a second wavelength; and
a second region, configured to allow the light of the second wavelength to pass therethrough, wherein the light of the second wavelength is light for exposure, wherein
the first region comprises an alignment region configured to align the mask with a substrate and a measurement region configured to measure a distance between the substrate and the mask, each of only two intersecting edges among four edges of the mask being provided therein with both of the measurement region and the alignment region spaced apart from each other,
the mask comprises a base layer configured to allow light to pass therethrough,
light filter film layers are disposed on the base layer at which the alignment region and the measurement region are located, and
each of the light filter film layer in the alignment region and the light filter film layer in the measurement region is configured to allow the light of the first wavelength to pass therethrough and filter out the light of the second wavelength,
each of the measurement region and the alignment region has a rectangular shape, and a length of the rectangular measurement region is greater than a length of the rectangular alignment region,
the second region comprises a plurality of second transparent regions arranged in an array,
the first wavelength is greater than 800 nm, and the second wavelength is smaller than 400 nm,
the light filter film layer comprises a wideband light-splitting film, and
a shading film is disposed at the shading region.

2. The mask of claim 1 , wherein
the first wavelength is 820 nm.

3. An exposure device, comprising the mask of claim 1 .

4. A method for exposure, comprising:
disposing the mask of claim 1 between a substrate and a light source;
performing a first process on the substrate by using the light of the first wavelength; and
exposing the substrate by using the light of the second wavelength,
wherein the first wavelength is different from the second wavelength.

5. The method of claim 4 , wherein
the substrate comprises a plurality of exposure regions spaced from each other at an interval and a spacer region between adjacent exposure regions;
the mask is configured to expose each of the plurality of exposure regions of the substrate sequentially; and
the second region of the mask corresponds to one of the plurality of exposure regions of the substrate, and the first region of the mask corresponds to the spacer region of the substrate.

6. The method of claim 5 , wherein an alignment marker is provided on the spacer region of the substrate, and the alignment marker corresponds to the alignment region in the first region.

7. The method of claim 4 , wherein the first process comprises aligning or measuring.

8. A method for forming a color filter film, comprising:
disposing the mask of claim 1 between a substrate and a light source;
performing a first process on the substrate by using the light of the first wavelength; and
exposing the substrate by using the light of the second wavelength,
wherein the first wavelength is different from the second wavelength, and the light of the second wavelength is used for exposing a material of the color filter film.

9. The method of claim 8 , wherein
the substrate comprises a plurality of exposure regions spaced from each other at an interval and a spacer region between adjacent exposure regions;
the mask is configured to expose each of the plurality of exposure regions of the substrate sequentially; and
the second region of the mask corresponds to one of the plurality of exposure regions of the substrate, and the first region of the mask corresponds to the spacer region of the substrate.

10. The method of claim 9 , wherein an alignment marker is provided on the spacer region on the substrate, and the alignment marker corresponds to the alignment region in the first region.

11. The method of claim 8 , wherein the first process comprises aligning or measuring.

Assignees

• Boe Technology Group Co Ltd
• Ordos Yuansheng Optoelectronics Co Ltd

Inventors

• Yan Chunlong
• Zhen Long
• Li Qiang
• Wang Delong
• Li Zecheng

Classifications

• G03F7/0007 Primary

  Filters, e.g. additive colour filters; Components for display devices · CPC title

• G03F1/44

  Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales · CPC title

• G02B5/201

  in the form of arrays · CPC title

• G03F1/42

  Alignment or registration features, e.g. alignment marks on the mask substrates · CPC title

• G03F7/70308 Primary

  Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title