Method for mixing gas-free liquid oxidant with process liquid

US11084744B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11084744-B2
Application numberUS-201815938870-A
CountryUS
Kind codeB2
Filing dateMar 28, 2018
Priority dateMar 28, 2018
Publication dateAug 10, 2021
Grant dateAug 10, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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Disclosed are systems and methods for mixing a gas-free liquid oxidant with a process liquid to form a homogeneous and gas-free mixture with minimized degassing. The mixing system comprises an injection device, integrating with a pipe through which a process liquid flows, configured and adapted to inject a gas-free liquid oxidant into the process liquid, and a mixer, fluidly connected to the pipe and the injection device, configured and adapted to mix the process liquid and the gas-free liquid oxidant therein to form a homogeneous and gas-free mixture of the process liquid and the gas-free liquid oxidant with minimal degassing. The method comprises the steps of a). injecting the gas-free liquid oxidant into the process liquid, and b). mixing the gas-free liquid oxidant and the process liquid to form the homogeneous and gas-free mixture. The gas-free liquid oxidant is ozone strong water.

First claim

Opening claim text (preview).

What is claimed is: 1. A mixing system, the mixing system comprising: an injection device, integrating with a pipe through which a process liquid flows, configured and adapted to rapidly dilute a gas-free liquid oxidant in the process liquid by injecting the gas-free liquid oxidant into the process liquid through injection nozzles, wherein the gas-free liquid oxidant is a pressurized gas-free high concentrated or saturated or close to saturated ozone dissolved water, which under atmospheric conditions is supersaturated, wherein a concentration of ozone dissolved in liquid in the gas-free liquid oxidant is up to 300 mg/L, wherein the gas-free liquid oxidant has an elevated pressure being higher than a pressure of the process liquid; a feed-forward or a closed-loop control, configured and adapted to control a mixing ratio between the process liquid and the gas-free liquid oxidant by adjusting flow rates of the process liquid and the gas-free liquid oxidant, respectively, so that the elevated pressure of the gas-free liquid oxidant is maintained until the gas-free liquid oxidant is injected into a main flow of the process liquid, resulting in a rapid dilution of the gas-free liquid oxidant in the process liquid upon injection, thereby avoiding degassing; and a mixer, fluidly connected to the pipe and the injection device, configured and adapted to mix the process liquid and the diluted gas-free liquid oxidant therein to form a homogeneous and gas-free mixture, wherein the homogeneous and gas-free mixture has a pressure close to or the same as the pressure of the process liquid. 2. The mixing system of claim 1 , wherein the injection device includes a plurality of conduits, each extend radially through openings in the pipe and are bent along a flow direction of the process liquid in the pipe to provide an extending terminal section. 3. The mixing system of claim 2 , wherein the extending terminal sections of the plurality of conduits each are connected to an injection nozzle. 4. The mixing system of claim 3 , wherein the extending terminal sections of the plurality of conduits include a center extending terminal section placed along the axis of the pipe symmetrically surrounded by the rest of the extending terminal sections. 5. The mixing system of claim 2 , wherein the number of the plurality of conduits ranges from 1 to 20. 6. The mixing system of claim 2 , wherein the number of the plurality of conduits is 5. 7. The mixing system of claim 1 , wherein the gas-free liquid oxidant is ozone strong water. 8. The mixing system of claim 1 , wherein the process liquid is fresh water, tap water, process water, effluent water, municipal and industrial wastewater, wastewater already treated by the secondary treatment process.

Assignees

Inventors

Classifications

  • by introducing gases into liquid media, e.g. for producing aerated liquids · CPC title

  • Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means · CPC title

  • used simultaneously · CPC title

  • by injecting a mixture of liquid and gas · CPC title

  • Mixing systems, i.e. flow charts or diagrams · CPC title

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What does patent US11084744B2 cover?
Disclosed are systems and methods for mixing a gas-free liquid oxidant with a process liquid to form a homogeneous and gas-free mixture with minimized degassing. The mixing system comprises an injection device, integrating with a pipe through which a process liquid flows, configured and adapted to inject a gas-free liquid oxidant into the process liquid, and a mixer, fluidly connected to the pi…
Who is the assignee on this patent?
Air Liquide, Air Liquide American
What technology area does this patent fall under?
Primary CPC classification C02F1/78. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 10 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).