Radiative cooling substrate and manufacturing method of the same

Patent metadata

Field	Value
Publication number	US-11078593-B2
Application number	US-201916282747-A
Country	US
Kind code	B2
Filing date	Feb 22, 2019
Priority date	Oct 31, 2018
Publication date	Aug 3, 2021
Grant date	Aug 3, 2021

Abstract

A radiative cooling substrate and a manufacturing method of the radiative cooling substrate are provided. The radiative cooling substrate includes a metallic substrate and a chitosan layer disposed on the metallic substrate with a thickness of 0.5 μm to 10 μm. The chitosan layer emits radiation within a waveband between 8 μm and 13 μm.

First claim

What is claimed is:

1. A manufacturing method of a radiative cooling substrate, comprising:
forming a metallic substrate by depositing an adhesive layer with a second thickness on a silicon substrate and depositing a metal layer on the adhesive layer in an evaporation process, wherein the adhesive layer comprises chromium or titanium, and the second thickness is 10 nm to 50 nm;
preparing a chitosan solution, the chitosan solution comprising chitosan and a solvent, wherein the solvent comprises water, C1-C4 alcohols, and an acid, and a pH-value of the chitosan solution is less than seven;
providing the metallic substrate into an electrophoresis cell loaded with the chitosan solution;
applying a voltage to the metallic substrate for a predetermined time period;
depositing a chitosan layer comprising the chitosan with a first thickness on the metallic substrate in an electrophoretic process; and
obtaining the radiative cooling substrate;
wherein the first thickness is a value from 0.5 μm to 10 μm.

2. The method of claim 1 , wherein a ratio of a weight of the chitosan and a volume of the solvent is 0.01 g: 1000 mL to 20 g: 1000 mL.

3. The method of claim 1 , wherein the C1-C4 alcohols comprise ethyl alcohol, and a volume ratio of the water and the ethyl alcohol is less than 2:8.

4. The method of claim 1 , wherein the acid comprises acetic acid or hydrochloric acid.

5. The method of claim 1 , wherein the voltage is less than 30 V.

6. The method of claim 1 , wherein the predetermined time period is less than five minutes.

Assignees

• Univ Nat Tsing Hua

Inventors

• Chen Yu-Bin
• Han Hung-Sheng

Classifications

• C25D13/12

  characterised by the article coated · CPC title

• C25D13/06 Primary

  with polymers {(not used, see C09D5/44)} · CPC title

• C25D13/20

  Pretreatment · CPC title

• F28F13/18

  by applying coatings, e.g. radiation-absorbing, radiation-reflecting; by surface treatment, e.g. polishing · CPC title

• C25D13/22

  Servicing or operating {apparatus or multistep processes} · CPC title