Nanoneedles for intracellular applications

Patent metadata

Field	Value
Publication number	US-11078453-B2
Application number	US-201716066724-A
Country	US
Kind code	B2
Filing date	Jan 3, 2017
Priority date	Jan 4, 2016
Publication date	Aug 3, 2021
Grant date	Aug 3, 2021

Abstract

Nanoneedles and nanoneedle arrays and methods of making nanoneedles are provided. The methods can include multilayer fabrication methods using a negative photoresist and/or a positive photoresist. The nanoneedle arrays include one or more nanoneedles attached to a surface of a substrate. The nanoneedle can have both a proximal opening and a distal opening, and an inner passageway connecting the proximal opening and the distal opening. The nanoneedle can have a functional coating. The nanoneedle can include iron, cobalt, nickel, gold, and oxides and alloys thereof. The nanoneedle arrays can be used for the administration and/or the extraction of agents from individual cells. In one or more aspects, the nanoneedles can be magnetic nanoneedles. An oscillating magnetic field applied to a magnetic nanoneedle can induce one or both of heating and vibration of the magnetic nanoneedle. The heating and/or vibration can cause a magnetic nanoneedle to penetrate the wall of a cell.

First claim

We claim:

1. A method of fabricating a nanoneedle array, the method comprising the steps of:
depositing a thin-film of a conductive metal layer onto an upper surface of a substrate;
patterning a negative photoresist layer onto the conductive metal layer;
electroplating a material onto the conductive metal layer using the patterned negative photoresist layer to form the nanoneedle having an inner passageway;
etching of the conductive metal layer to expose part of the upper surface of the substrate; and
etching partially the bottom surface of the substrate to form a proximal opening to the inner passageway,
wherein a first portion of the nanoneedle, proximal to the substrate, includes the conductive metal layer, and a second portion of the nanoneedle, distal from the substrate, includes the electroplated material.

2. The method of claim 1 , further comprising patterning a second photoresist layer onto the bottom surface of the substrate prior to the etching of the bottom surface of the substrate;
wherein the etching of the bottom surface of the substrate forms a channel from the patterned second photoresist layer.

3. The method of claim 1 , further comprising:
depositing a thin protective layer on the substrate, around the nanoneedle.

4. The method of claim 1 , wherein the substrate comprises a silicon substrate or a glass substrate.

5. The method of claim 1 , wherein the nanoneedle comprises a material selected from the group consisting of iron, cobalt, nickel, gold, and oxides and alloys thereof.

6. The method of claim 1 , wherein the nanoneedle has a width of about 100 nm to 1000 nm.

7. The method of claim 1 , wherein the nanoneedle has an aspect ratio of about 3 to 10.

8. The method of claim 1 , wherein the nanoneedle array is a magnetic nanoneedle array.

Assignees

• Univ King Abdullah Sci & Tech

Inventors

• Kosel Jürgen
• Kavaldzhiev Mincho Nikolaev
• Perez Jose Efrain

Classifications

• A61B10/0045 Primary

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• B81C1/00111

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