Thermionic tungsten/scandate cathodes and method of making the same

US11075049B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11075049-B2
Application numberUS-201916601620-A
CountryUS
Kind codeB2
Filing dateOct 15, 2019
Priority dateApr 10, 2015
Publication dateJul 27, 2021
Grant dateJul 27, 2021

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A thermionic dispenser cathode having a refractory metal matrix with scandium and barium compounds in contact with the metal matrix and methods for forming the same. The invention utilizes atomic layer deposition (ALD) to form a nanoscale, uniform, conformal distribution of a scandium compound on tungsten surfaces and further utilizes in situ high pressure consolidation/impregnation to enhance impregnation of a BaO—CaO—Al2O3 based emissive mixture into the scandate-coated tungsten matrix or to sinter a tungsten/scandate/barium composite structure. The result is a tungsten-scandate thermionic cathode having improved emission.

First claim

Opening claim text (preview).

What is claimed is: 1. A process for making a thermionic dispenser cathode, the process including the steps of: providing a starting powder comprising particles of a refractory metal and/or metal alloy; placing the starting powder inside a furnace having a controlled atmosphere and heating the starting powder in the flow of hydrogen or hydrogen/inert gas mixture to reduce surface oxides to produce a cleaned starting powder; making a porous preformed compact from the cleaned starting powder; without exposing the cleaned starting powder to an external atmosphere, placing the porous preformed compact inside a particle atomic layer deposition (ALD) reactor and controllably depositing a conformal nanometer-scale film of a scandium compound on all available surfaces inside and outside of the porous preformed compact to produce a scandium compound-coated compact with a conformal nanometer-scale scandium film having a predetermined thickness uniformly deposited on all of the surfaces thereof; without exposing the scandium compound-coated compact to air, placing the scandium compound-coated compact in contact with an emissive mixture comprising a barium compound; and without exposing the scandium compound-coated compact in contact with the emissive mixture to air, subjecting the compact with the contacted emissive mixture to a predetermined pressure P and temperature T greater than a melting point of the emissive mixture so that the emissive mixture becomes a molten emissive mixture that infiltrates the scandium compound-coated compact to form a barium-impregnated scandium-coated compact; wherein the impregnated compact forms the cathode. 2. The process according to claim 1 , wherein the refractory metal and/or metal alloy is tungsten. 3. The process according to claim 1 , wherein the scandium compound is scandium oxide. 4. The process according to claim 1 , wherein the barium compound is barium-calcium-aluminate. 5. The process according to claim 1 , wherein the pressure P is between about 0.1 and 5 GPa. 6. The process according to claim 1 , wherein the temperature T is between 1,500° C. and 2,100° C. 7. A process for making a thermionic dispenser cathode, the process including the steps of: providing a sample of a porous refractory metal and/or metal alloy; placing the sample inside a furnace having a controlled atmosphere and heating the starting powder in the flow of hydrogen or hydrogen/inert gas mixture to reduce surface oxides to produce a cleaned sample; without exposing the cleaned sample to an external atmosphere, placing the cleaned sample inside an atomic layer deposition (ALD) reactor and controllably depositing a conformal nanometer-scale film of a scandium compound on all available surfaces inside and of the cleaned sample to produce a scandium compound-coated sample with a conformal nanometer-scale scandium film having a predetermined thickness uniformly deposited on all of the surfaces thereof; without exposing the scandium compound-coated sample to air, placing the scandium compound-coated sample in contact with an emissive mixture comprising a barium compound; and without exposing the scandium compound-coated sample with contacted emissive mixture to air, subjecting the scandium compound-coated sample with contacted emissive mixture to a predetermined pressure P and temperature T greater than a melting point of the emissive mixture so that the emissive mixture becomes a molten emissive mixture that infiltrates the scandium compound-coated sample to form a barium-impregnated scandium-coated sample; wherein the impregnated sample forms the cathode. 8. The process according to claim 7 , wherein the refractory metal and/or metal alloy is tungsten. 9. The process according to claim 7 , wherein the scandium compound is scandium oxide. 10. The process according to claim 7 , wherein the barium compound is barium-calcium-aluminate. 11. The process according to claim 7 , wherein the pressure P is between about 0.1 and 5 GPa. 12. The process according to claim 7 , wherein the temperature T is between 1,500° C. and 2,100° C. 13. A process for making a thermionic dispenser cathode, the process including the steps of: providing a starting powder comprising particles of a refractory metal and/or metal alloy; placing the starting powder inside a furnace having a controlled atmosphere and heating the starting powder in the flow of hydrogen or hydrogen/inert gas mixture to reduce surface oxides to produce a cleaned starting powder; making a porous preformed compact from the cleaned starting powder; without exposing the cleaned starting powder to an external atmosphere, placing the porous preformed compact inside a particle atomic layer deposition (ALD) reactor and controllably depositing a conformal nanometer-scale film of a scandium compound on all available surfaces inside and outside of the porous preformed compact to produce a scandium compound-coated compact with a conformal nanometer-scale scandium film having a predetermined thickness uniformly deposited on all of the surfaces inside and outside thereof; with the scandium compound-coated compact still in the ALD reactor and without exposing the compact to air, depositing a conformal layer of a barium compound on all available surfaces inside and outside of scandium compound-coated compact; and without exposing the scandium compound-coated compact with deposited barium layer to air, subjecting the scandium compound-coated compact with deposited barium layer to a predetermined pressure P and temperature T to sinter the compact to full density; wherein the sintered compact forms the cathode. 14. The process according to claim 13 , wherein the refractory metal and/or metal alloy is tungsten. 15. The process according to claim 13 , wherein the scandium compound is scandium oxide. 16. The process according to claim 13 , wherein the deposited barium layer is barium oxide. 17. The process according to claim 13 , wherein the pressure P is between about 0.1 and 5 GPa. 18. The process according to claim 13 , wherein the temperature T is between 800° C. and 2,100° C. 19. A process for making a thermionic dispenser cathode, the process including the steps of: providing a sample of a porous refractory metal and/or metal alloy; placing the sample inside a furnace having a controlled atmosphere and heating the starting powder in the flow of hydrogen or hydrogen/inert gas mixture to reduce surface oxides to produce a cleaned sample; without exposing the cleaned sample to an external atmosphere, placing the cleaned sample inside an atomic layer deposition (ALD) reactor and controllably depositing a conformal nanometer-scale film of a scandium compound on all available surfaces inside and outside of the cleaned sample to produce a scandium compound-coated sample with a conformal nanometer-scale scandium film having a predetermined thickness uniformly deposited on all of the surfaces thereof; with the scandium compound-coated sample still in the ALD reactor and without exposing the compact to air, depositing a conformal layer of the barium compound on all available surfaces inside and outside of scandium compound-coated sample; and with the scandium compound-coated sample with deposited barium layer still in the ALD reactor and without exposing the scandium compound-coated sample with deposited barium layer to air, subjecting the scandium compound-coated sample with deposited barium layer to a predetermined pressure P and temperature T to sinter the sample to full density; wherein the

Assignees

Inventors

Classifications

  • Metallic particles coated with a non-metal (coated with lubricating or binding agents or with organic material B22F1/10) · CPC title

  • Impregnating {(making ferrous alloys by impregnation C22C33/0242)} · CPC title

  • with other metal oxides as an emissive material · CPC title

  • H01J9/042Primary

    Manufacture, activation of the emissive part · CPC title

  • Aspects linked to processes or compositions used in powder metallurgy · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11075049B2 cover?
A thermionic dispenser cathode having a refractory metal matrix with scandium and barium compounds in contact with the metal matrix and methods for forming the same. The invention utilizes atomic layer deposition (ALD) to form a nanoscale, uniform, conformal distribution of a scandium compound on tungsten surfaces and further utilizes in situ high pressure consolidation/impregnation to enhance …
Who is the assignee on this patent?
Us Gov Sec Navy
What technology area does this patent fall under?
Primary CPC classification H01J9/042. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 27 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).