Manufacturing method for shear and normal force sensor

US11073434B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11073434-B2
Application numberUS-201916703114-A
CountryUS
Kind codeB2
Filing dateDec 4, 2019
Priority dateJul 25, 2019
Publication dateJul 27, 2021
Grant dateJul 27, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a method of manufacturing a shear and normal force sensor including fabricating raised and sunken polymers having a plurality of bent parts of bent shapes, forming an electrode pattern on one surface of a piezoelectric element, and embedding the piezoelectric element between the raised and sunken polymers, and a shear and normal force sensor including raised and sunken polymers having a plurality of bent parts of bent shapes, a piezoelectric element embedded between the raised and sunken polymers and having an electrode pattern on one surface, and a flexible printed circuit board (FPCB) embedded between the sunken polymer and the piezoelectric element and electrically connected to the electrode pattern.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a shear and normal force sensor, comprising: fabricating raised and sunken polymers having a plurality of bent parts of bent shapes; forming an electrode pattern on one surface of a piezoelectric element; and embedding the piezoelectric element between the raised and sunken polymers; wherein the fabricating includes fabricating a sunken polymer of the sunken polymers to have at least one recess shaped to fit a raised shape of a raised polymer of the raised polymers; the fabricating the raised polymers includes fabricating a substantially planar base portion and raised portions in a center region of the base portion, the fabricating the raised positions includes fabricating a first sloped portion extending from the base portion, a substantially planar top portion extending from an end of the first sloped portion, and a second sloped portion extending from an end of the top portion toward the base portion, and the fabricating the raised portions further includes fabricating a pair of the raised portions to be adjacent to each other and separated by a V-shaped recess. 2. The method of manufacturing a shear and normal force sensor according to claim 1 , further comprising: embedding a flexible printed circuit board (FPCB) between the sunken polymer of the sunken polymers and the piezoelectric element. 3. The method of manufacturing a shear and normal force sensor according to claim 1 , wherein a bent part of the plurality of bent parts has a trapezoidal shape. 4. The method of manufacturing a shear and normal force sensor according to claim 1 , wherein shapes of the raised and sunken polymers match each other. 5. The method of manufacturing a shear and normal force sensor according to claim 1 , wherein each of the raised and sunken polymers is made of polydimethylsiloxane (PDMS). 6. The method of manufacturing a shear and normal force sensor according to claim 1 , wherein the piezoelectric element is made of polyvinylidene fluoride (PVDF).

Assignees

Inventors

Classifications

  • using piezoelectric means · CPC title

  • G01L1/16Primary

    using properties of piezoelectric devices · CPC title

  • Force sensors associated with industrial machines or actuators (for the specific machine or actuator involved see relevant class, e.g. F01, F04, F16, B66, E21) · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

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What does patent US11073434B2 cover?
Provided are a method of manufacturing a shear and normal force sensor including fabricating raised and sunken polymers having a plurality of bent parts of bent shapes, forming an electrode pattern on one surface of a piezoelectric element, and embedding the piezoelectric element between the raised and sunken polymers, and a shear and normal force sensor including raised and sunken polymers hav…
Who is the assignee on this patent?
Korea Inst Sci & Tech
What technology area does this patent fall under?
Primary CPC classification G01L1/16. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 27 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).