Rare earth thin film magnet and method for producing same

US11072842B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11072842-B2
Application numberUS-201716080036-A
CountryUS
Kind codeB2
Filing dateMar 29, 2017
Priority dateApr 15, 2016
Publication dateJul 27, 2021
Grant dateJul 27, 2021

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

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Provided is a rare earth thin film magnet having Nd, Fe and B as essential components, which is characterized in that a Nd—Fe—B base film is formed on a Si substrate having an oxide film formed on a surface thereof and has a composition in which the Nd content is higher than that of a stoichiometric composition and that a film (nano composite film) is formed on the base film and has a texture in which an α-Fe phase and Nd2Fe14B are alternately arranged and three-dimensionally dispersed. The rare earth thin film magnet provided is less susceptible to the occurrence of film separation and substrate breakage and exhibits favorable magnetic properties.

First claim

Opening claim text (preview).

The invention claimed is: 1. A rare earth thin film magnet having Nd, Fe and B as essential components comprising: a Nd—Fe—B base film on a Si substrate having an oxide film formed on a surface thereof; the Nd—Fe—B base film has a composition in which a Nd content is higher than that of a stoichiometric composition of Nd 2 —Fe 14 —B; nano composite film having a film thickness of 10 μm or more and 42 μm or less on the base film, and the nano composite film has a texture in which an α-Fe phase and Nd 2 Fe 14 B are alternately arranged and three-dimensionally dispersed. 2. The rare earth thin film magnet according to claim 1 , wherein a film thickness of the base film is 0.5 μm or more. 3. The rare earth thin film magnet according to claim 2 , wherein a film thickness ratio of the base film relative to the nano composite film is 1/10 or less. 4. The rare earth thin film magnet according to claim 3 , wherein the oxide film on the surface of the Si substrate is a thermal oxide film. 5. The rare earth thin film magnet according to claim 4 , wherein the rare earth thin film magnet has a residual magnetization of 0.70 T or more. 6. The rare earth thin film magnet according to claim 5 , wherein the rare earth thin film magnet has a coercive force of 480 kA/m or more. 7. The rare earth thin film magnet according to claim 6 , wherein the rare earth thin film magnet has a maximum energy product (BH) max of 70 kJ/m 3 or more. 8. The rare earth thin film magnet according to claim 1 , wherein a film thickness ratio of the base film relative to the nano composite film is 1/10 or less. 9. The rare earth thin film magnet according to claim 1 , wherein the oxide film on the surface of the Si substrate is a thermal oxide film. 10. The rare earth thin film magnet according to claim 1 , wherein the rare earth thin film magnet has a residual magnetization of 0.70 T or more. 11. The rare earth thin film magnet according to claim 1 , wherein the rare earth thin film magnet has a coercive force of 480 kA/m or more. 12. The rare earth thin film magnet according to claim 1 , wherein the rare earth thin film magnet has a maximum energy product (BH) max of 70 kJ/m 3 or more. 13. A method of producing a rare earth thin film magnet, the method comprising: forming an oxide film on a Si substrate; forming a Nd—Fe—B base film having a composition in which a Nd content is higher than that of a stoichiometric composition of Nd 2 —Fe 14 —B on the Si substrate, as a first layer via pulsed laser deposition; forming a nano composite film having a film thickness of 10 μm or more and 42 μm or less and having a texture in which an α-Fe phase and Nd 2 Fe 14 B are alternately arranged and three-dimensionally dispersed on the first layer, as a second layer via pulsed laser deposition; and thereafter performing heat treatment thereto. 14. The method of producing a rare earth thin film magnet according to claim 13 , wherein deposition is performed using a target made from Nd X Fe 14 B (where X is a number that satisfies 2.1 to 2.7). 15. The method of producing a rare earth thin film magnet according to claim 14 , wherein a laser intensity density satisfies 1 J/cm 2 or more and less than 10 J/cm 2 in forming the base film as the first layer and satisfies 10 J/cm 2 or more and 1000 J/cm 2 or less in forming the nano composite film having a texture in which an α-Fe phase and Nd 2 Fe 14 B are alternately arranged as the second layer. 16. The method of producing a rare earth thin film magnet according to claim 15 , wherein the heat treatment is performed at 500° C. or higher and 800° C. or less. 17. The method of producing a rare earth thin film magnet according to claim 13 , wherein the heat treatment is performed at 500° C. or higher and 800° C. or less.

Assignees

Inventors

Classifications

  • by wave energy or particle radiation (C23C14/32 - C23C14/48 take precedence) · CPC title

  • After-treatment · CPC title

  • only coatings of inorganic non-metallic material · CPC title

  • C22C38/005Primary

    containing rare earths, i.e. Sc, Y, Lanthanides · CPC title

  • Thermal treatment · CPC title

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What does patent US11072842B2 cover?
Provided is a rare earth thin film magnet having Nd, Fe and B as essential components, which is characterized in that a Nd—Fe—B base film is formed on a Si substrate having an oxide film formed on a surface thereof and has a composition in which the Nd content is higher than that of a stoichiometric composition and that a film (nano composite film) is formed on the base film and has a texture i…
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification C22C38/005. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 27 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).