Polishing pad with window and manufacturing methods thereof

US11072050B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11072050-B2
Application numberUS-201816050442-A
CountryUS
Kind codeB2
Filing dateJul 31, 2018
Priority dateAug 4, 2017
Publication dateJul 27, 2021
Grant dateJul 27, 2021

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  5. First independent claim

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Abstract

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Embodiments of the present disclosure provide for polishing pads that include at least one endpoint detection (EPD) window disposed through the polishing pad material, and methods of forming thereof. In one embodiment a method of forming a polishing pad includes forming a first layer of the polishing pad by dispensing a first precursor composition and a window precursor composition, the first layer comprising at least portions of each of a first polishing pad element and a window feature, and partially curing the dispensed first precursor composition and the dispensed window precursor composition disposed within the first layer.

First claim

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The invention claimed is: 1. A method of forming a polishing pad, comprising: forming a first layer of the polishing pad by dispensing a first precursor composition and a window precursor composition, the first layer comprising at least portions of each of a first polishing pad element and a window feature; and partially curing the dispensed first precursor composition and the dispensed window precursor composition to form an at least partially cured first layer. 2. The method of claim 1 , further comprising: forming a second layer on the at least partially cured first layer by dispensing the window precursor composition and a second precursor composition, wherein the second layer comprises at least portions of each of the window feature and one or more second polishing pad elements; and partially curing the dispensed window precursor composition and the dispensed second precursor composition disposed within the second layer. 3. The method of claim 2 , wherein forming the second layer comprises forming a plurality of second sub-layers, each of the plurality of second sub-layers formed by dispensing droplets of the window precursor composition and droplets of the second precursor composition, wherein the droplets of the window precursor composition and the droplets of the second precursor composition form chemical bonds at the interfaces thereof during partially curing of each of the plurality of second layers. 4. The method of claim 2 , wherein forming the second layer on the at least partially cured first layer further comprises dispensing the first precursor composition, wherein the second layer further comprises at least portions of one or more first polishing pad elements; and partially curing the dispensed first precursor composition disposed within the second layer. 5. The method of claim 4 , further comprising: forming a third layer on the at least partially cured second layer by dispensing the window precursor composition and the second precursor composition, wherein the third layer comprises at least portions of each of the window feature and one or more second polishing pad elements; and partially curing the dispensed window precursor composition and the dispensed second precursor composition disposed within the second layer. 6. The method of claim 5 , wherein forming the third layer comprises forming a plurality of third sub-layers, each of the plurality of third sub-layers formed by dispensing droplets of the window precursor composition and droplets of the second precursor composition, wherein the droplets of the window precursor composition and the droplets of the second precursor composition form chemical bonds at the interfaces thereof during the partial curing of each of the plurality of third sub-layers. 7. The method of claim 1 , wherein the forming the first layer comprises forming a plurality of first sub-layers, each of the plurality of first sub-layers formed by dispensing droplets of the first precursor composition and droplets of the window precursor composition, and wherein droplets of the first precursor composition and droplets of the window precursor composition form chemical bonds at the interfaces therebetween during partial curing of each the plurality of first sub-layers. 8. The method of claim 7 , wherein the window precursor composition comprises a first component selected from the group consisting of an acrylate based monomer, a methacrylate based monomer, an acrylate based oligomer, a methacrylate based oligomer, or combinations thereof. 9. The method of claim 8 , wherein the window precursor composition further comprises a second component selected from the group consisting of 2,2-dimethoxy-2-phenylacetophenone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 1-hydroxycyclohexyl-phenyl ketone, oligomeric alpha hydroxy ketones, and combinations thereof. 10. The method of claim 7 , wherein the window precursor composition comprises a first component selected from the group consisting of isobornyl acrylate, isobornyl methacrylate, dicyclopentanyl acrylate, dicyclopentanyl methacrylate, tetrahydrofurfuryl acrylate, lauryl acrylate, 2-(((butylamino) carbonyl) oxy) ethyl acrylate, SR420, CN131, dipropylene glycol diacrylate, 1,6-hexanediol acrylate, glycidyl acrylate, multi-functional groups of polyether acrylates, multi-functional groups of polyester acrylates, multi-functional groups urethane acrylates, multi-functional groups epoxy acrylates, and combinations thereof. 11. The method of claim 10 , wherein the window precursor composition further comprises nanoparticles selected from the group consisting of titanium oxides, zirconium oxides, zirconium sulfate, zirconium acrylates, hafnium acrylates, and combinations thereof. 12. The method of claim 11 , wherein the first polishing element, the window feature, and the one or more second polishing elements form a continuous polymer phase. 13. The method of claim 1 , wherein partially curing the dispensed first precursor composition and the dispensed window precursor composition is performed in an oxygen-free or oxygen-limited atmosphere. 14. A method of forming a polishing pad, comprising: forming a first layer of the polishing pad by dispensing a first precursor composition wherein the first layer comprises at least a portion a sub-polishing element having a first opening disposed therethrough; partially curing the dispensed first precursor composition to form an at least partially cured first layer; forming a second layer on the at least partially cured first layer by dispensing a second precursor composition, wherein the second layer comprises one or more polishing elements and the first opening is further disposed through the second layer; partially curing the dispensed second precursor composition within the second layer; and forming a window feature in the first opening by dispensing a window precursor composition thereinto and curing the window precursor composition. 15. The method of claim 14 , further comprising positioning a UV optically transparent polymer sheet on the window precursor composition before curing thereof. 16. The method of claim 14 , wherein curing the window precursor composition comprises heating thereof to a temperature between about 70° C. and about 100° C. 17. The method of claim 14 , wherein curing the window precursor composition comprises exposing the window precursor composition to UV radiation. 18. The method of claim 14 , wherein curing the window precursor composition comprises exposing the window precursor composition to broadband UV radiation for between about 30 sec and about 300 sec. 19. The method of claim 14 , wherein forming the window feature further comprises: securing an adhesive layer to a platen-mounting surface of the first layer, wherein the first opening is disposed in registration with a second opening formed through the adhesive layer; positioning a delamination insert in the second opening, wherein the delamination insert seals the second opening to prevent the dispensed window precursor composition from flowing out therefrom. 20. A method of forming a polishing pad, comprising: forming a first layer of the polishing pad by dispensing a first precursor composition from a first dispense head and a window precursor composition from a second dispense head, the first layer comprising at least portions of each of a first polishing pad element and a window feature; and partially curing the dispensed first precursor composition and the dispensed window precursor compos

Assignees

Inventors

Classifications

  • characterised by the shape of the lapping pad surface, e.g. grooved · CPC title

  • B24B37/245Primary

    Pads with fixed abrasives · CPC title

  • characterised by the composition or properties of the pad materials · CPC title

  • B24B37/205Primary

    provided with a window for inspecting the surface of the work being lapped · CPC title

  • B24B37/013Primary

    Devices or means for detecting lapping completion · CPC title

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What does patent US11072050B2 cover?
Embodiments of the present disclosure provide for polishing pads that include at least one endpoint detection (EPD) window disposed through the polishing pad material, and methods of forming thereof. In one embodiment a method of forming a polishing pad includes forming a first layer of the polishing pad by dispensing a first precursor composition and a window precursor composition, the first l…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification B24B37/245. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 27 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).