Cleaning water supply device

Patent metadata

Field	Value
Publication number	US-11069542-B2
Application number	US-201816603444-A
Country	US
Kind code	B2
Filing date	Mar 20, 2018
Priority date	Apr 14, 2017
Publication date	Jul 20, 2021
Grant date	Jul 20, 2021

Abstract

A cleaning water supply device includes an ultrapure water line through which ultrapure water flows by a fixed amount, a production unit that produces cleaning water by adding a solute to the ultrapure water line by a fixed amount, a storage tank for the cleaning water, cleaning machines to which the cleaning water is supplied from the storage tank, and a controller that controls the cleaning water production unit so that a water level in the storage tank is in a predetermined range.

First claim

The invention claimed is:

1. A cleaning water supply device, comprising:
a cleaning water production unit that produces cleaning water at a certain concentration by adding a pH adjuster and/or an oxidation-reduction potential adjuster to ultrapure water;
a storage tank that stores the cleaning water from the cleaning water production unit therein; and
a plurality of supply means for supplying the cleaning water in the storage tank to cleaning machines, each supply means including a branching piping directly connected to the storage tank, a pump attached to the branching piping, a pipe connecting the branching piping to one of the cleaning machines through the pump, and a return piping extending from the pipe to the storage tank to return part of the cleaning water to the storage tank.

2. The cleaning water supply device according to claim 1 , further comprising controlling means for controlling the cleaning water production unit so that a cleaning water level in the storage tank is in a predetermined range.

3. The cleaning water supply device according to claim 2 , further comprising switching means for guiding the cleaning water from the cleaning water production unit to a discharge line when a water quality of the cleaning water from the cleaning water production unit is out of a specified range.

4. The cleaning water supply device according to claim 3 , further comprising a removal unit for removing a solute from discharged water from the discharge line.

5. The cleaning water supply device according to claim 3 , wherein the controlling means causes the ultrapure water to flow to the cleaning water production unit at a low flow rate while the cleaning water production unit is suspended.

6. The cleaning water supply device according to claim 2 , wherein the controlling means sets two stages for a production flow rate of the cleaning water in the cleaning water production unit, switches the production flow rate from a high flow rate to a low flow rate when the water level in the storage tank becomes equal to or more than a first predetermined water level, and switches the production flow rate from the low flow rate to the high flow rate when the water level becomes equal to or less than a second predetermined water level.

7. The cleaning water supply device according to claim 1 , wherein the cleaning water production unit comprises a chemical solution tank containing the pH adjuster and/or the oxidation-reduction potential adjuster, to which an inert gas is supplied to provide the pH adjuster and/or the oxidation-reduction potential adjuster to the ultrapure water.

8. The cleaning water supply device according to claim 7 , further comprising a hydrogen peroxide removal device to remove hydrogen peroxide from the ultrapure water before providing the pH adjuster and/or the oxidation-reduction potential adjuster to the ultrapure water.

9. The cleaning water supply device according to claim 8 , further comprising a deaeration device after providing the pH adjuster and/or the oxidation-reduction potential adjuster to the ultrapure water to remove gas from the ultrapure water.

10. The cleaning water supply device according to claim 7 , further comprising an inert gas supplying piping attached to the storage tank for supplying an inert gas to purge oxygen in the storage tank, and a mechanism so that the inert gas is filled constantly in the storage tank.

Assignees

• Kurita Water Ind Ltd

Inventors

• Morita Hiroshi
• GAN Nobuko

Classifications

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H10P52/00

  Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• C02F1/008

  Control or steering systems not provided for elsewhere in subclass C02F · CPC title

• C02F2209/04

  Oxidation reduction potential [ORP] · CPC title