Method for stretching vapor deposition mask, method for producing frame-equipped vapor deposition mask, method for producing organic semiconductor element, and stretching apparatus
US-2017092862-A1 · Mar 30, 2017 · US
Vapor deposition mask
US11066742B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11066742-B2 |
| Application number | US-201716471590-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 28, 2017 |
| Priority date | Sep 28, 2017 |
| Publication date | Jul 20, 2021 |
| Grant date | Jul 20, 2021 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A first region of a valid portion formed on a mask sheet has a shape corresponding to a shape of each of active regions and provided for each active region of a vapor target substrate. A second region of the valid portion is located outside of the first region, and includes a plurality of vapor deposition holes (H) covered with a hauling sheet.
First claim
Opening claim text (preview).
The invention claimed is: 1. A vapor deposition mask configured to be used to vapor-deposit a vapor-deposition layer on each of pixels of a vapor target substrate provided with a plurality of active regions on which the pixels contributing to displaying are arranged, the vapor deposition mask comprising: a mask sheet provided with a valid portion extending across the plurality of active regions and including a plurality of vapor deposition holes formed to be arranged; and a plurality of hauling sheets configured to support the mask sheet, wherein the valid portion includes a first region and a second region, the first region has a shape corresponding to a shape of each of the plurality of active regions, and is provided for each of the plurality of active regions, the second region defines a shape of the first region, and overlaps with the plurality of hauling sheets to cause a portion of the plurality of vapor deposition holes to be covered, and a region of the valid portion between hauling sheets located at both ends has a constant width, the mask sheet includes a region having a width gradually increasing outward in a region outside of the region of the valid portion having a constant width, and the region having the width gradually increasing outward overlaps with the plurality of hauling sheets. 2. The vapor deposition mask according to claim 1 , wherein the plurality of hauling sheets extend in a direction perpendicular to an extending direction of the valid portion. 3. The vapor deposition mask according to claim 1 , wherein the plurality of hauling sheets are in contact with a second surface of the mask sheet located on an opposite side to a first surface facing the vapor target substrate. 4. The vapor deposition mask according to claim 1 , wherein a pitch at which a plurality of vapor deposition holes present in the second region are arranged is an integral multiple of a pitch at which a plurality of vapor deposition holes present in the first region are arranged. 5. The vapor deposition mask according to claim 1 , wherein a width between the first regions is an integral multiple of a pitch of the plurality of vapor deposition holes. 6. The vapor deposition mask according to claim 1 , further comprising: at least one cover sheet which fills a gap between the mask sheet and an additional mask sheet adjacent to the mask sheet.
Assignees
Inventors
Classifications
- C23C16/042Primary
using masks · CPC title
- C23C14/042Primary
using masks · CPC title
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources · CPC title
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US11066742B2 cover?
- A first region of a valid portion formed on a mask sheet has a shape corresponding to a shape of each of active regions and provided for each active region of a vapor target substrate. A second region of the valid portion is located outside of the first region, and includes a plurality of vapor deposition holes (H) covered with a hauling sheet.
- Who is the assignee on this patent?
- Sharp Kk
- What technology area does this patent fall under?
- Primary CPC classification C23C16/042. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jul 20 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).