Charged particle detector including a light-emitting section having lamination structure, charged particle beam device, and mass spectrometer

US11062892B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11062892-B2
Application numberUS-201716070790-A
CountryUS
Kind codeB2
Filing dateJan 25, 2017
Priority dateJan 29, 2016
Publication dateJul 13, 2021
Grant dateJul 13, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The objective of the present invention is to provide a charged particle detector and a charged particle beam device with which it is possible to acquire a high luminous output while rapidly eliminating charged particles that are incident to a scintillator. In order to achieve said objective the present invention proposes: a charged particle detector provided with a light-emitting unit including a laminated structure obtained by laminating a GaInN-containing layer and a GaN layer, and provided with a conductive layer that is in contact with the GaInN-containing layer on the charged particle incidence surface side of the laminated structure; and a charged particle beam device.

First claim

Opening claim text (preview).

The invention claimed is: 1. A charged particle detector including a light-emitting section having a lamination structure in which a GaInN-containing layer and a GaN layer are laminated, the charged particle detector comprising: an electrically conductive layer that is in direct contact with the GaInN-containing layer and that is provided on a charged particle incident face side of the lamination structure, wherein a composition of the GaInN-containing layer is Ga 1-y In y N(0<y<1), wherein a relationship between a thickness “a” of the GaInN-containing layer and a thickness “b” of the GaN layer is 10≥b/a≥6. 2. The charged particle detector according to claim 1 , wherein the light-emitting section has a thickness ranging from one-fifth to three-fifths of a penetration distance of a charged particle beam. 3. The charged particle detector according to claim 1 , wherein a number of a plurality of the GaInN-containing layers is in a range from 5 to 25. 4. The charged particle detector according to claim 1 , wherein the light-emitting section is formed on a substrate, and protruding structures formed continuously and having a pitch of 10 to 2000 nm and a height of 10 to 20000 nm are formed either between the substrate and the light-emitting section or on the substrate. 5. A charged particle beam device including a detector that detects charged particles obtained on the basis of irradiation with a charged particle beam emitted from a charged particle source, wherein the detector includes a light-emitting section having a lamination structure in which a GaInN-containing layer and a GaN layer are laminated, and includes an electrically conductive layer that is in direct contact with the GaInN-containing layer and that is provided on a charged particle incident face side of the lamination structure, wherein a composition of the GaInN-containing layer is Ga 1-y In y N(0<y<1), and a relationship between a thickness “a” of the GaInN-containing layer and a thickness “b” of the GaN layer is 10≥b/a≥6. 6. A mass spectrometer including a detector that detects ions subjected to mass separation, wherein comprising: a mass spectrometer including a detector that detects ions subjected to mass separation, wherein the detector includes a light-emitting section having a lamination structure in which a GaInN-containing layer and a GaN layer are laminated, and includes an electrically conductive layer that is in direct contact with the GaInN-containing layer and that is provided on a charged particle incident face side of the lamination structure, wherein a composition of the GaInN-containing layer is Ga 1-y In y N(0<y<1)), and a relationship between a thickness “a” of the GaInN-containing layer and a thickness “b” of the GaN layer is 10≥b/a≥6. 7. The charged particle detector according to claim 1 , wherein a thickness “a” of the GaInN-containing layer is 2-4 nm. 8. The charged particle detector according to claim 1 , wherein the lamination structure forms a quantum well structure in which a GaInN-containing layer and a GaN layer are laminated. 9. The charged particle beam device according to claim 5 , wherein the lamination structure forms a quantum well structure in which a GaInN-containing layer and a GaN layer are laminated. 10. The A mass spectrometer according to claim 6 , wherein the lamination structure forms a quantum well structure in which a GaInN-containing layer and a GaN layer are laminated.

Assignees

Inventors

Classifications

  • H01J37/244Primary

    Detectors; Associated components or circuits therefor · CPC title

  • with semiconductor detectors · CPC title

  • Scanning microscopes · CPC title

  • with scintillation detectors · CPC title

  • Scintillation detectors · CPC title

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What does patent US11062892B2 cover?
The objective of the present invention is to provide a charged particle detector and a charged particle beam device with which it is possible to acquire a high luminous output while rapidly eliminating charged particles that are incident to a scintillator. In order to achieve said objective the present invention proposes: a charged particle detector provided with a light-emitting unit including…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/244. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 13 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).