Decorative HIPIMS hard material layers

US11060181B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11060181-B2
Application numberUS-201414901313-A
CountryUS
Kind codeB2
Filing dateJun 26, 2014
Priority dateJun 26, 2013
Publication dateJul 13, 2021
Grant dateJul 13, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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A method for coating substrates with a decorative layer of hard material which is guided into a vacuum coating chamber. The decorative layer of hard material is deposited by a reactive HIPIMS-process, and the energy content in the power pulses is controlled in such a manner that the deposited layer of hard material has a homogeneous colour, a high degree of smoothness and a high strength.

First claim

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What is claimed is: 1. A method for coating at least parts of a surface of a substrate or for manufacturing substrates with a part of the surface provided with a decorative hard material layer in a coating chamber, whereby a reactive HIPIMS-process is applied for manufacturing a hard-material layer, which makes use of reactive gases, an inert gas and of at least one target comprising titanium which reacts during operating the reactive HIPIMS-process with the reactive gases in such a manner, that, thereby, a predetermined layer color is produced, wherein the reactive HIPIMS-process is operated by applying: power pulse-sequences with an energy content of at least 0.2 Joule/cm 2 with respect to a surface of the at least one target wherein each power pulse-sequence comprises a burst of pulses with a first time between each pulse, and each power-pulse sequence is separated from each other by a second time, wherein the second time is greater than the first time, and adjusting power density per power pulse-sequence by adjusting a power of the burst of pulses of the power pulse-sequence, wherein the power of each pulse of the power pulse-sequence is held constant at a maximum value for a first predetermined period of time and is reduced to a reference value and held constant at the reference value for a second predetermined period of time before increasing to form another pulse, wherein the adjusting power density per power pulse-sequence includes adjusting a duration of at least two of the pulses of the power pulse-sequence, while maximum values of the at least two of the pulses are held substantially equal; and wherein for conducting the reactive HIPIMS-process applied for manufacturing the hard-material layer, the inert gas includes Ar, the reactive gases include N 2 and C 2 H 2 and are used for producing TiCN-layers, wherein a flow rate of Ar is 150 to 210 sccm, a flow rate of N 2 is 20 to 50 seem and a flow rate of C 2 H 2 is greater than 0 to less than or equal to 30 sccm, wherein the power pulse-sequences cause the coating to achieve a homogeneous color appearance. 2. The method of claim 1 wherein the energy content in the power pulse-sequences, with respect to the surface of the at least one target, is at least 1 Joule/cm 2 per power pulse-sequence. 3. The method of claim 1 wherein the power density is at least 100 W/cm 2 . 4. The method of claim 3 wherein the power density is at least 500 W/cm 2 . 5. The method of claim 4 wherein the power density is at least 1000 W/cm 2 . 6. The method according to claim 1 , wherein a temperature of the substrate is below 200° C. for coating temperature-sensitive substrates. 7. The method of claim 1 , wherein a concentration of nitrogen in the coating chamber is controlled by regulating the flow rate of N2, so of a nitrogen gas flow and the nitrogen gas flow is regulated so, that the homogenous color appearance accords with a color according to Gold 2N18 or 1N14 or 3N18. 8. Hard-material layer, manufactured by making use of a method according claim 1 , characterized by the fact, that the hard-material layer has a hardness of at least 30 GPa. 9. The method of claim 1 , wherein a height of the coating chamber is 400 mm or more. 10. The method of claim 1 , wherein the adjusting power density per power pulse-sequence causes an immediately subsequent cycle of a power pulse-sequence to have a different power density from an immediately preceding cycle of a power-pulse sequence, respectively. 11. The method of claim 1 , wherein the reference value is zero. 12. A method for coating at least parts of a surface of a substrate or for manufacturing substrates with a part of the surface provided with a decorative hard-material layer in a coating chamber, whereby a reactive HIPIMS-process is applied for manufacturing a hard-material layer, which makes use of reactive gases, an inert gas and of at least one target comprising titanium which reacts during operating the reactive HIPIMS-process with the reactive gases in such a manner, that, thereby, a predetermined layer color is produced, wherein the reactive HIPIMS-process is operated by applying: power pulse-sequences with an energy content of at least 0.2 Joule/cm 2 with respect to a surface of the at least one target wherein each power pulse-sequence comprises a burst of pulses with a first time between each pulse, and each power-pulse sequence is separated from each other by a second time, wherein the second time is greater than the first time, and adjusting power density per power pulse-sequence by adjusting a power of the burst of pulses of the power pulse-sequence, wherein the power of a first pulse of the power pulse-sequence is held constant at a first maximum value for a first predetermined period of time and is reduced to a reference value and held constant at the reference value for a second predetermined period of time before increasing to a second maximum value of a second pulse, wherein the adjusting power density per power pulse-sequence includes adjusting the second maximum value to be greater than the first maximum value, while a duration of the second maximum value is substantially equal to a duration of the first maximum value; and wherein for conducting the reactive HIPIMS-process applied for manufacturing the hard-material layer, the inert gas includes Ar, the reactive gases include N 2 and C 2 H 2 and are used for producing TiCN-layers, wherein a flow rate of Ar is 150 to 210 sccm, a flow rate of N 2 is 20 to 50 seem and a flow rate of C 2 H 2 is greater than 0 to less than or equal to 30 sccm, wherein the power pulse-sequences cause the coating to achieve a homogeneous color appearance. 13. The method of claim 12 wherein the energy content in the power pulse-sequences, with respect to the surface of the at least one target, is at least 1 Joule/cm 2 per power pulse-sequence. 14. The method of claim 12 wherein the power density is at least 100 W/cm 2 . 15. The method of claim 14 wherein the power density is at least 500 W/cm 2 . 16. The method of claim 15 wherein the power density is at least 1000 W/cm 2 . 17. The method according to claim 12 , wherein a temperature of the substrate is below 200° C. for coating temperature-sensitive substrates. 18. The method of claim 12 , wherein a concentration of nitrogen in the coating chamber is controlled by regulating the flow rate of N2, so, that the homogenous color appearance accords with a color according to Gold 2N18 or 1N14 or 3N18. 19. Hard-material layer, manufactured by making use of a method according claim 12 , characterized by the fact, that the hard-material layer has a hardness of at least 30 GPa. 20. The method of claim 12 , wherein a height of the coating chamber is 400 mm or more. 21. The method of claim 12 , wherein the adjusting power density per power pulse-sequence causes an immediately subsequent cycle of a power pulse-sequence to have a different power density from an immediately preceding cycle of a power-pulse sequence, respectively. 22. The method of claim 12 , wherein the reference value is zero.

Assignees

Inventors

Classifications

  • Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements · CPC title

  • Material · CPC title

  • Nitrides (C23C14/0617 takes precedence) · CPC title

  • characterized by the colour of the layer · CPC title

  • Pulsed operation, e.g. HIPIMS · CPC title

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What does patent US11060181B2 cover?
A method for coating substrates with a decorative layer of hard material which is guided into a vacuum coating chamber. The decorative layer of hard material is deposited by a reactive HIPIMS-process, and the energy content in the power pulses is controlled in such a manner that the deposited layer of hard material has a homogeneous colour, a high degree of smoothness and a high strength.
Who is the assignee on this patent?
Oerlikon Surface Solutions Ag Trubbach, Oerlikon Surface Solutions Ag Pfaffikon
What technology area does this patent fall under?
Primary CPC classification C23C14/0036. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 13 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).