Film of quantum dot, method for patterning the same and quantum dot light emitting device using the same

US11056650B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11056650-B2
Application numberUS-201916377885-A
CountryUS
Kind codeB2
Filing dateApr 8, 2019
Priority dateApr 9, 2018
Publication dateJul 6, 2021
Grant dateJul 6, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure provides a quantum dot thin film that is formed by cross-linking ligands of quantum dots with a photo cross-linker containing two or more azide groups. According to still another aspect of the present disclosure, a method for forming a quantum dot pattern includes: forming a quantum dot layer on a substrate by coating the substrate with a solution including quantum dots and a photo cross-linker containing two or more azide groups; placing a mask having a pattern on the quantum dot layer and performing UV exposure on the quantum dot layer; and forming a quantum dot pattern by removing a non-exposed region of the quantum dot layer.

First claim

Opening claim text (preview).

We claim: 1. A quantum dot thin film, comprising: quantum dots, wherein the quantum dots are linked by cross-linking ligands surrounding the quantum dots with a photo cross-linker containing two or more azide groups, and, wherein a distance between the quantum dots is increased by the ligands and the photo cross linker. 2. The quantum dot thin film of claim 1 , wherein the quantum dot thin film is patterned with a first quantum dot pattern, a second quantum dot pattern, and a third quantum dot pattern. 3. A quantum dot light emitting device, comprising: a first electrode; a second electrode spaced from the first electrode; and the quantum dot thin film according to claim 1 which is located between the first electrode and the second electrode. 4. A substrate on which a quantum dot pattern is formed, comprising: a quantum dot thin film patterned with a first quantum dot pattern, a second quantum dot pattern, and a third quantum dot pattern on the substrate, wherein the quantum dot thin film includes quantum dots, wherein the quantum dots are surrounded by ligands, wherein the ligands surrounding the quantum dots are cross-linked by a photo cross-linker containing two or more azide groups, and, wherein a distance between the quantum dots is increased by the ligands and the photo cross linker. 5. The substrate of claim 4 , wherein the first to third quantum dot patterns include first to third quantum dots having different sizes. 6. The substrate of claim 5 , wherein the first to third quantum dots emit light of red (R), green (G), and blue (B) colors, respectively. 7. The substrate of claim 5 , wherein the first to third quantum dot patterns are formed in parallel on the same layer on the substrate. 8. The substrate of claim 5 , wherein the first to third quantum dot patterns are laminated vertically on the substrate. 9. The substrate of claim 5 , wherein the first and second quantum dot patterns are formed in parallel on the same layer on the substrate and the third quantum dot pattern is formed on the first and second quantum dot patterns.

Assignees

Inventors

Classifications

  • Thermal treatment, e.g. annealing in the presence of a solvent vapour · CPC title

  • by photolithographic etching · CPC title

  • H10K50/11Primary

    characterised by the electroluminescent [EL] layers · CPC title

  • within the light-emitting regions, e.g. having quantum confinement structures · CPC title

  • Manufacture or treatment · CPC title

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What does patent US11056650B2 cover?
The present disclosure provides a quantum dot thin film that is formed by cross-linking ligands of quantum dots with a photo cross-linker containing two or more azide groups. According to still another aspect of the present disclosure, a method for forming a quantum dot pattern includes: forming a quantum dot layer on a substrate by coating the substrate with a solution including quantum dots a…
Who is the assignee on this patent?
Foundation Soongsil Univ Industry Cooperation, Univ Sogang Res & Business Development Found
What technology area does this patent fall under?
Primary CPC classification H10K50/11. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 06 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).