Mask, display substrate and display device

Patent metadata

Field	Value
Publication number	US-11054737-B2
Application number	US-201816106155-A
Country	US
Kind code	B2
Filing date	Aug 21, 2018
Priority date	Jan 17, 2018
Publication date	Jul 6, 2021
Grant date	Jul 6, 2021

Abstract

Disclosed are a mask, a display substrate and a display device. The mask comprises a substrate, a first exposure structure, a second exposure structure located at one side of the substrate and disposed opposite to each other, the first exposure structure comprises a first light transmission film layer and a first light shielding film layer, an orthographic projection of the first light shielding film layer falls within an orthographic projection of the first light transmission film layer on the substrate; the second exposure structure comprises a second light transmission film layer and a second light shielding film layer, an orthographic projection of the second light shielding film layer falls within an orthographic projection of the second light transmission film layer on the substrate; a side edge of the first exposure structure has a first zigzag structure, and a side edge of the second exposure structure has a second zigzag structure.

First claim

What is claimed is:

1. A mask, comprises a substrate, and a first exposure structure and a second exposure structure located at one side of the substrate and disposed opposite to each other, wherein:
the first exposure structure comprises a first light transmission film layer and a first light shielding film layer, where an orthographic projection of the first light shielding film layer on the substrate falls within an orthographic projection of the first light transmission film layer on the substrate;
the second exposure structure comprises a second light transmission film layer and a second light shielding film layer, where an orthographic projection of the second light shielding film layer on the substrate falls within an orthographic projection of the second light transmission film layer on the substrate;
a side edge of the first exposure structure close to the second exposure structure has a first zigzag structure, and a side edge of the second exposure structure close to the first exposure structure has a second zigzag structure;
wherein the first zigzag structure is only formed in the first light transmission film layer, and the second zigzag structure is only formed in the second light transmission film layer.

2. The mask of claim 1 , wherein
the first light transmission film layer is located between the first light shielding film layer and the substrate, or the first light shielding film layer is located between the first light transmission film layer and the substrate;
the second light transmission film layer is located between the second light shielding film layer and the substrate, or the second light shielding film layer is located between the second light transmission film layer and the substrate.

3. The mask of claim 1 , wherein an orthographic projection line of a side edge of the first light shielding film layer close to the second exposure structure on the substrate overlaps with an orthographic projection line of a dedendum line of the first zigzag structure on the substrate, and an orthographic projection line of a side edge of the second light shielding film layer close to the first exposure structure on the substrate overlaps with an orthographic projection line of a dedendum line of the second zigzag structure on the substrate.

4. The mask of claim 1 , wherein an orthographic projection line of a side edge of the first light shielding film layer close to the second exposure structure on the substrate is spaced from an orthographic projection line of a dedendum line of the first zigzag structure on the substrate, and an orthographic projection line of a side edge of the second light shielding film layer close to the first exposure structure on the substrate is spaced from an orthographic projection line of a dedendum line of the second zigzag structure on the substrate.

5. The mask of claim 1 , wherein a light transmissivity of the first light transmission film layer is 3%˜7%, and a light transmissivity of the second light transmission film layer is 3%˜7%.

6. The mask of claim 1 , wherein
the first light transmission film layer comprises opaque base materials and nonopaque doped particles, where the opaque base materials comprise at least two of molybdenum, silicon or chrome, and the nonopaque doped particles comprise acrylic doped particles, polycarbonate-like material doped particles or polystyrene-like material doped particles;
the second light transmission film layer comprises opaque base materials and nonopaque doped particles, where the opaque base materials comprise at least two of molybdenum, silicon or chrome, and the nonopaque doped particles comprise acrylic doped particles, polycarbonate-like material doped particles or polystyrene-like material doped particles;
the first light shielding film layer is a chrome film layer, molybdenum film layer or tungsten film layer;
the second light shielding film layer is a chrome film layer, molybdenum film layer or tungsten film layer.

7. The mask of claim 1 , wherein the first zigzag structure comprises a plurality of first zigzag units, where a tooth-edge angle of each of the first zigzag units is a sharp angle; or a tooth-edge angle of each of the first zigzag units has a circular chamfer;
the second zigzag structure comprises a plurality of second zigzag units, where a tooth-edge angle of each of the second zigzag units is a sharp angle; or a tooth-edge angle of each of the second zigzag units has a circular chamfer.

8. The mask of claim 7 , wherein the tooth-edge angle of each of the first zigzag units is 30°˜60°; and the tooth-edge angle of each of the second zigzag units is 30°˜60°.

9. The mask of claim 1 , wherein a spacing between an addendum line of the first zigzag structure and an addendum line of the second zigzag structure is 1.8 mm˜2.2 mm.

Assignees

• Boe Technology Group Co Ltd
• Beijing Boe Display Tech Co

Inventors

• Zhang Xiaoxiang
• Guo Huibin
• Song Yongzhi
• Liu Mingxuan
• Xu Wenqing
• Li Xiaolong
• Wu Zumou

Classifications

• G03F1/38

  Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof · CPC title

• G02F1/1303 Primary

  Apparatus specially adapted to the manufacture of LCDs · CPC title

• G03F1/26 Primary

  Phase shift masks [PSM]; PSM blanks; Preparation thereof · CPC title

• G03F1/58

  having two or more different absorber layers, e.g. stacked multilayer absorbers · CPC title

• G03F1/44 Primary

  Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales · CPC title