Method for removing boron

Patent metadata

Field	Value
Publication number	US-11052348-B2
Application number	US-201715854375-A
Country	US
Kind code	B2
Filing date	Dec 26, 2017
Priority date	Dec 7, 2017
Publication date	Jul 6, 2021
Grant date	Jul 6, 2021

Abstract

A method for removing boron is provided, which includes (a) mixing a carbon source material and a silicon source material in a chamber to form a solid state mixture, (b) heating the solid state mixture to a temperature of 1000° C. to 1600° C., and adjusting the pressure of the chamber to 1 torr to 100 torr. The method also includes (c) conducting a gas mixture of a first carrier gas and water vapor into the chamber to remove boron from the solid state mixture, and (d) conducting a second carrier gas into the chamber.

First claim

What is claimed is:

1. A method for removing boron, comprising:
(a) mixing a carbon source material and a silicon source material in a chamber to form a solid state mixture;
(b) heating the solid state mixture to a temperature of 1000° C. to 1600° C., and adjusting pressure of the chamber to 1 torr to 100 torr;
(c) conducting a gas mixture of a first carrier gas and water vapor into the chamber to remove boron from the solid state mixture; and
(d) conducting a second carrier gas into the chamber.

2. The method as claimed in claim 1 , wherein the carbon source material comprises carbon black, graphite, graphene, carbon nanotube, or a combination thereof.

3. The method as claimed in claim 1 , wherein the silicon source material comprises silicon, silicon oxide, or a combination thereof.

4. The method as claimed in claim 1 , wherein the first carrier gas and the second carrier gas comprise argon, hydrogen, or a combination thereof.

5. The method as claimed in claim 1 , wherein the gas mixture in step (c) has a flow rate of 100 sccm to 1000 sccm.

6. The method as claimed in claim 1 , wherein the second carrier gas in step (d) has a flow rate of 100 sccm to 1000 sccm.

7. The method as claimed in claim 1 , further repeating a cycle of step (c) and (d) after step (d).

8. The method as claimed in claim 1 , further comprising step (e) heating the solid state mixture to a temperature of 1700° C. to 2200° C. and adjusting the pressure of the chamber to 380 torr to 760 torr after step (d) of the method for removing boron, thereby reacting the carbon source material and the silicon source material to form a silicon carbide.

Assignees

• Ind Tech Res Inst

Inventors

• Hsiao Ta-Ching
• Jeng Chu-Pi
• Huang Kuo-Lun
• Sung Mu-Hsi
• Chen Keng-Yang
• Tsai Li-Duan

Classifications

• C01B35/023 Primary

  Boron · CPC title

• B01D53/46 Primary

  Removing components of defined structure · CPC title

• C01B32/984

  Preparation from elemental silicon · CPC title

• B01D2257/10

  Single element gases other than halogens · CPC title

• C01B32/97

  Preparation from SiO or SiO2 · CPC title