Laser apparatus and EUV light generation system

US11043784B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11043784-B2
Application numberUS-201916595782-A
CountryUS
Kind codeB2
Filing dateOct 8, 2019
Priority dateMay 31, 2017
Publication dateJun 22, 2021
Grant dateJun 22, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.

First claim

Opening claim text (preview).

What is claimed is: 1. A laser apparatus comprising: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring, wherein the gas includes purge gas, and the envelope body includes an intake unit provided to each envelope block and configured to introduce the purge gas to inside of the envelope body, and a discharge unit provided to each envelope block and configured to discharge the purge gas from inside of the envelope body. 2. The laser apparatus according to claim 1 , wherein the control unit determines that anomaly is occurring at an envelope block including a first temperature sensor having measured the first temperature to be equal to or higher than a predetermined threshold in the envelope body. 3. The laser apparatus according to claim 1 , wherein the control unit determines that anomaly is occurring at an envelope block including a first temperature sensor having measured the change rate of the first temperature to be equal to or larger than a predetermined threshold in the envelope body. 4. The laser apparatus according to claim 1 , wherein the first temperature sensor of each envelope block measures a first temperature of the purge gas discharged from the discharge unit. 5. The laser apparatus according to claim 4 , further comprising: a gas supply device configured to supply the purge gas into the envelope body through a main supply path and a bifurcation supply path bifurcated from the main supply path and coupled with the intake unit; and a second temperature sensor provided to the main supply path, configured to measure a second temperature of the purge gas supplied from the gas supply device, and connected with the control unit, wherein the control unit specifies an envelope block at which anomaly is occurring in the envelope body based on a temperature difference between the first and second temperatures thus measured. 6. The laser apparatus according to claim 5 , wherein the control unit determines that anomaly is occurring at an envelope block including a first temperature sensor having measured temperature difference between the first and second temperatures to be equal to or larger than a predetermined threshold in the envelope body. 7. The laser apparatus according to claim 5 , wherein the control unit determines that anomaly is occurring at an envelope block including a first temperature sensor having measured the change rate of the temperature difference between the first and second temperatures to be equal to or larger than a predetermined threshold in the envelope body. 8. The laser apparatus according to claim 4 , further comprising a second temperature sensor provided to each envelope block, configured to measure a second temperature of the purge gas introduced through the intake unit, and connected with the control unit, wherein the control unit specifies an envelope block at which anomaly is occurring in the envelope body based on a temperature difference between the first and second temperatures thus measured. 9. The laser apparatus according to claim 8 , wherein the control unit determines that anomaly is occurring at an envelope block including a first temperature sensor having measured the temperature difference between the first and second temperatures to be equal to or larger than a predetermined threshold in the envelope body. 10. The laser apparatus according to claim 8 , wherein the control unit determines that anomaly is occurring at an envelope block including a first temperature sensor having measured the change rate of the temperature difference between the first and second temperatures to be equal to or larger than a predetermined threshold in the envelope body. 11. The laser apparatus according to claim 1 , wherein the envelope blocks each include a first block edge and a second block edge, the intake unit is provided closer to the first block edge in each envelope block, and the discharge unit is provided closer to the second block edge in each envelope block. 12. The laser apparatus according to claim 1 , further comprising a holder holding at least one of the optical elements, wherein the first temperature sensor measures the first temperature of gas at the position also away from the holder. 13. The laser apparatus according to claim 1 , wherein each first temperature sensor is provided inside the envelope block. 14. An EUV light generation system comprising: an EUV chamber in which EUV light is generated; and a laser apparatus configured to emit a laser beam toward the EUV chamber, the laser apparatus including a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element, an envelope body including the envelope blocks and covering the laser beam path, and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring, wherein the gas includes purge gas, and the envelope body includes an intake unit provided to each envelope block and configured to introduce the purge gas to inside of the envelope body, and a discharge unit provided to each envelope block and configured to discharge the purge gas from inside of the envelope body. 15. A laser apparatus comprising: an optical element disposed on a laser beam path; a plurality of optical path tubes each covering the optical element and including an intake unit configured to introduce purge gas to inside of the optical path tube, a discharge unit configured to discharge the purge gas from inside of the optical path tube, and a first temperature sensor configured to measure a first temperature of the purge gas discharged from the discharge unit; an envelope body covering the laser beam path with the optical path tubes; and a control unit connected with each first temperature sensor and configured to specify an optical path tube in which increase of the first temperature is measured in the envelope body as an optical path tube in which anomaly is occurring.

Assignees

Inventors

Classifications

  • the energy-carrying beam being a laser beam · CPC title

  • H01S3/2316Primary

    Cascaded amplifiers · CPC title

  • Monitoring arrangements not otherwise provided for (photometry G01J1/00, e.g. G01J1/4257; radiation pyrometry G01J5/00; measuring coherence of light G01J9/00; measuring wavelength of light G01J9/00, e.g. G01J9/0246; measuring optical pulses G01J11/00; calorimetrically measuring power of laser beams G01K17/003) · CPC title

  • Constructional details {(housings or packages of fibre lasers H01S3/06704)} · CPC title

  • comprising a special atmosphere inside the housing · CPC title

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Frequently asked questions

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What does patent US11043784B2 cover?
A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope b…
Who is the assignee on this patent?
Gigaphoton Inc
What technology area does this patent fall under?
Primary CPC classification H01S3/2316. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 22 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).