Ozone treatment for selective silicon nitride etch over silicon

Patent metadata

Field	Value
Publication number	US-11043393-B2
Application number	US-202016744403-A
Country	US
Kind code	B2
Filing date	Jan 16, 2020
Priority date	Jan 17, 2019
Publication date	Jun 22, 2021
Grant date	Jun 22, 2021

Abstract

Apparatus, systems, and methods for processing a workpiece are provided. In one example implementation, the workpiece can include a silicon nitride layer and a silicon layer. The method can include admitting an ozone gas into a processing chamber. The method can include exposing the workpiece to the ozone gas. The method can include generating one or more species from a process gas using a plasma induced in a plasma chamber. The method can include filtering the one or more species to create a filtered mixture. The method can further include exposing the workpiece to the filtered mixture in the processing chamber such that the filtered mixture at least partially etches the silicon nitride layer more than the silicon layer. Due to ozone gas reacting with surface of silicon layer prior to etching process with fluorine-containing gas, selective silicon nitride etch over silicon can be largely promoted.

First claim

What is claimed is:

1. A method for processing a workpiece, the workpiece comprising a silicon nitride layer and a silicon layer, the method comprising:
admitting an ozone gas into a processing chamber, the processing chamber comprising the workpiece supported on a workpiece support;
exposing the workpiece to the ozone gas;
generating one or more species from a process gas using a plasma induced in a plasma chamber;
filtering the one or more species to create a filtered mixture;
exposing the workpiece to the filtered mixture in the processing chamber such that the filtered mixture at least partially etches the silicon nitride layer more than the silicon layer;
wherein the workpiece is exposed to the ozone gas prior to being exposed to the filtered mixture.

2. The method of claim 1 , further comprising alternating exposing the workpiece to the ozone gas and exposing the workpiece to the filtered mixture such that the filtered mixture at least partially etches the silicon nitride layer faster than the silicon layer.

3. The method of claim 1 , wherein a ratio of an etch rate of silicon nitride to an etch rate of silicon is greater than about 90.

4. The method of claim 1 , wherein the process gas comprises a fluorine-containing gas.

5. The method of claim 4 , wherein the fluorine-containing gas comprises one or more of tetrafluoromethane (CF 4 ), fluoroform (CHF 3 ), nitrogen trifluoride (NF 3 ), or sulfur hexafluoride (SF 6 ).

6. The method of claim 5 , wherein the tetrafluoromethane (CF 4 ) or the nitrogen trifluoride (NF 3 ) is injected with a controllable flow rate through a gas injection source.

7. The method of claim 1 , wherein the process gas comprises a hydrogen-containing gas.

8. The method of claim 7 , wherein the hydrogen-containing gas comprises one or more of hydrogen (H 2 ), methane (CH 4 ), or ammonia (NH 3 ).

9. The method of claim 1 , wherein the process gas comprises an oxygen-containing gas.

10. The method of claim 9 , wherein the oxygen-containing gas comprises one or more of oxygen (O 2 ), nitric oxide (NO), or carbon, dioxide (CO 2 ).

11. The method of claim 1 , wherein the ozone gas is admitted with a carrier gas.

12. The method of claim 11 , wherein a concentration of the ozone gas in the carrier gas is in the range of about 1% to about 20%.

13. The method of claim 1 , wherein filtering the one or more species to create the filtered mixture comprises filtering the one or more species to create the filtered mixture via a separation grid separating the plasma chamber from the processing chamber.

14. The method of claim 13 , wherein the ozone gas is admitted through one or more gas injection ports into the separation grid.

15. The method of claim 1 , wherein the ozone gas reacts with the silicon layer to form a silicon oxide layer on top of the silicon layer.

16. The method of claim 1 , further comprising controlling an ion energy of the plasma by a bias source in the processing chamber.

17. A method for processing a workpiece, the workpiece comprising a silicon nitride layer and a silicon layer, the method comprising:
admitting an ozone gas into a processing chamber via a separation grid separating a processing chamber from a plasma chamber;
exposing the workpiece to the ozone gas;
generating one or more species from a process gas using a plasma induced in the plasma chamber;
filtering the one or more species to create a filtered mixture via the separation grid;
exposing the workpiece to the filtered mixture in the processing chamber such that the filtered mixture etches the silicon nitride layer more than the silicon layer;
wherein the workpiece is exposed to the ozone gas prior to being exposed to the filtered mixture.

18. The method of claim 17 , further comprising alternating exposing the workpiece to the ozone gas and exposing the workpiece to the filtered mixture such that the filtered mixture at least partially etches the silicon nitride layer faster than the silicon layer.

19. The method of claim 17 , wherein the ozone gas is admitted through one or more gas injection ports into the separation grid.

20. The method of claim 17 , wherein the ozone gas reacts with the silicon layer to form a silicon oxide layer on top of the silicon layer.

Assignees

• Mattson Tech Inc
• Beijing E Town Semiconductor Tech Co Ltd

Inventors

• Wang Shanyu
• Xie Ting
• Yan Chun
• Lu Xinliang
• Chung Hua
• Yang Michael X

Classifications

• H10P50/283 Primary

  by chemical means · CPC title

• H10P14/6308

  of Group IV semiconductors · CPC title

• H10P76/4085

  characterised by the processes involved to create the masks · CPC title

• H01J37/3244

  Gas supply means · CPC title

• H01J37/32357 Primary

  Generation remote from the workpiece, e.g. down-stream · CPC title