System And Method For Making A Structured Material
US-2024424553-A1 · Dec 26, 2024 · US
US11043320B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11043320-B2 |
| Application number | US-201815915901-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 8, 2018 |
| Priority date | Mar 9, 2017 |
| Publication date | Jun 22, 2021 |
| Grant date | Jun 22, 2021 |
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Official abstract text for this publication.
A dust core includes a metal magnetic material, a resin, and an insulation film. The insulation film contacts with a surface of the metal magnetic material and covers the metal magnetic material. The insulation film includes a first film and a second film. The first film contacts with the surface of the metal magnetic material. The second film contacts with a surface of the first film. A density of the first film is higher than a density of the second film.
Opening claim text (preview).
The invention claimed is: 1. A dust core comprising: a metal magnetic particle; a resin; and an insulation film contacting with a surface of the metal magnetic particle and covering the metal magnetic particle, wherein the insulation film comprises: a first film contacting with the surface of the metal magnetic particle; and a second film contacting with a surface of the first film, wherein the first film and the second film are made of a same material, and wherein a density of the first film is higher than a density of the second film. 2. The dust core according to claim 1 , wherein each of the first film and the second film comprises a Si—O based oxide. 3. The dust core according to claim 2 , wherein the first film and the second film comprise different contrasts from each other observed by TEM. 4. The dust core according to claim 2 , wherein 1.25<I 1 /I 2 <10.0 is satisfied, where I 1 is a Si detection intensity of the first film, and I 2 is a Si detection intensity of the second film, in TEM-EDS analysis of the first film and the second film. 5. The dust core according to claim 3 , wherein 1.25<I 1 /I 2 <10.0 is satisfied, where I 1 is a Si detection intensity of the first film, and I 2 is a Si detection intensity of the second film, in TEM-EDS analysis of the first film and the second film. 6. The dust core according to claim 1 , wherein 0.075<D 1 /D 2 <10.0 is satisfied, where D 1 is a thickness of the first film, and D 2 is a thickness of the second film. 7. The dust core according to claim 2 , wherein 0.075<D 1 /D 2 <10.0 is satisfied, where D 1 is a thickness of the first film, and D 2 is a thickness of the second film. 8. The dust core according to claim 3 , wherein 0.075<D 1 /D 2 <10.0 is satisfied, where D 1 is a thickness of the first film, and D 2 is a thickness of the second film. 9. The dust core according to claim 4 , wherein 0.075<D 1 /D 2 <10.0 is satisfied, where D 1 is a thickness of the first film, and D 2 is a thickness of the second film. 10. The dust core according to claim 5 , wherein 0.075<D 1 /D 2 <10.0 is satisfied, where D 1 is a thickness of the first film, and D 2 is a thickness of the second film. 11. The dust core according to claim 1 , wherein the metal magnetic particle comprises a main component of Fe. 12. The dust core according to claim 2 , wherein the metal magnetic particle comprises a main component of Fe. 13. The dust core according to claim 3 , wherein the metal magnetic particle comprises a main component of Fe. 14. The dust core according to claim 4 , wherein the metal magnetic particle comprises a main component of Fe. 15. The dust core according to claim 6 , wherein the metal magnetic particle comprises a main component of Fe. 16. The dust core according to claim 1 , wherein the metal magnetic particle comprises a main component of Fe and Si. 17. The dust core according to claim 2 , wherein the metal magnetic particle comprises a main component of Fe and Si. 18. The dust core according to claim 3 , wherein the metal magnetic particle comprises a main component of Fe and Si. 19. The dust core according to claim 4 , wherein the metal magnetic particle comprises a main component of Fe and Si.
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