Cold sintering of solid precursors

Patent metadata

Field	Value
Publication number	US-11035038-B2
Application number	US-201615766251-A
Country	US
Kind code	B2
Filing date	Oct 6, 2016
Priority date	Oct 6, 2015
Publication date	Jun 15, 2021
Grant date	Jun 15, 2021

Abstract

A solid delivery precursor is described, which is useful for volatilization to generate precursor vapor for a vapor deposition process. The solid delivery precursor comprises solid bodies of compacted particulate precursor, e.g., in a form such as pellets, platelets, tablets, beads, discs, or monoliths. When utilized in a vapor deposition process such as chemical vapor deposition, pulsed chemical vapor deposition, or atomic layer deposition, the solid delivery precursor in the form of solid bodies of compacted particulate precursor provide substantially increased flux of precursor vapor when subjected to volatilization conditions, in relation to the particulate precursor. As a result, vapor deposition process operation can be carried out in shorter periods of time, thereby achieving increased manufacturing rates of products such as semiconductor products, flat-panel displays, solar panels, LEDs, optical coatings, and the like.

First claim

What is claimed is:

1. A solid delivery precursor volatilized to generate precursor vapor for a vapor deposition process, wherein said solid delivery precursor is a compacted solid body of particulate precursor selected from the group consisting of hafnium chloride, zirconium chloride, pentakisdimethylamino tantalum (PDMAT), trimethylindium, bis-cyclopentadiene magnesium, tetramethyl zinc, tetraethyl zinc, tungsten hexacarbonyl, tungsten pentachloride, tungsten hexachloride, metal amidinates, metal formamidinates, and metal carboxylates, and wherein the solid delivery precursor comprises the particulate precursor compacted at a temperature of from 15° C. to 30° C. and has a bulk density that is at least 15% higher than a bulk density of the particulate precursor or is at least 80% of an absolute density of the particulate precursor.

2. The solid delivery precursor of claim 1 , wherein said compacted solid body of particulate precursor is in a form of pellets, platelets, tablets, beads, discs, or monoliths.

3. The solid delivery precursor of claim 1 , wherein the compacted solid body of particulate precursor exhibits a precursor vapor flux when heated in a volatilization operation that is substantially higher than precursor vapor flux exhibited by the particulate precursor under corresponding volatilization operation conditions.

4. The solid delivery precursor of claim 3 , wherein the precursor vapor flux exhibited by the compacted solid body of particulate precursor is at least 15% higher than the precursor vapor flux exhibited by the particulate precursor under corresponding volatilization operation conditions.

5. The solid delivery precursor of claim 1 , wherein the compacted solid body of particulate precursor comprises at least one precursor selected from the group consisting of tungsten hexacarbonyl, tungsten pentachloride, and tungsten hexachloride.

6. The solid delivery precursor of claim 1 , wherein the compacted solid body of particulate precursor comprises a binder or matrix material.

7. The solid delivery precursor of claim 6 , wherein the binder or matrix material comprises a non-volatile, non-reactive polymeric material.

8. The solid delivery precursor of claim 6 , wherein the binder or matrix material comprises a high purity, non-volatile carbonaceous material.

9. The solid delivery precursor of claim 1 , wherein the compacted solid body of particulate precursor comprises homologous compounds.

10. The solid delivery precursor of claim 1 , wherein the compacted solid body of particulate precursor comprises tungsten pentachloride and tungsten hexachloride.

Assignees

• Entegris Inc

Inventors

• Baum Thomas H
• Li Yuqi
• Eldridge David James
• Wright Robert L

Classifications

• C23C16/448 Primary

  characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

• C04B35/00

  Shaped ceramic products characterised by their composition {(porous ceramic products C04B38/00; ceramic articles characterised by particular shape, see the relevant classes, e.g. linings for casting ladles, tundishes, cups or the like B22D41/02; ceramic substrates for microelectronic semi-conductors H10W70/692)}; Ceramics compositions ({shaping of ceramics B28B;} containing free metal bonded to carbides, diamond, oxides, borides, nitrides, silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides or sulfides other than as macroscopic reinforcing agents C22C); Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products {(infiltration of sintered ceramic preforms with molten metal C04B41/51; chemical preparation of powders of inorganic compounds C01)} · CPC title

• C04B35/6303

  Inorganic additives · CPC title

• C23C16/4481 Primary

  by evaporation using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title

• C04B2235/604

  Pressing at temperatures other than sintering temperatures · CPC title