P-type semiconductor film containing heterofullerene, and electronic device

US11031558B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11031558-B2
Application numberUS-201816635021-A
CountryUS
Kind codeB2
Filing dateAug 7, 2018
Priority dateAug 31, 2017
Publication dateJun 8, 2021
Grant dateJun 8, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A p-type semiconductor film including heterofullerene having a further sufficiently high hole mobility is provided. The p-type semiconductor film contains heterofullerene in which n+r number (where n and r are both positive odd numbers) of carbon atoms constituting a fullerene are substituted by n number of boron atom or atoms and r number of nitrogen atom or atoms.

First claim

Opening claim text (preview).

The invention claimed is: 1. A p-type semiconductor film comprising a fullerene C 601 , wherein the fullerene C 60 includes carbon atoms, a single boron atom, and a single nitrogen atom, and the single boron atom is a substitution of a carbon atom at position 1 in the fullerene C 60 , the single nitrogen atom is a substitution of another carbon atom at position 60 in the fullerene C 60 . 2. A p-type semiconductor film comprising a structure where one of carbon atoms constituting a fullerene C 70 is substituted by one boron atom and another carbon atom of the carbon atoms constituting a fullerene C 70 is substituted by one nitrogen atom, wherein a substitution position of the one boron atom and a substitution position of the one nitrogen atom are respectively a 1st position and a 2nd position or respectively 1st position and 70th position. 3. An electronic device comprising the p-type semiconductor film according to claim 1 . 4. An electronic device comprising: a source electrode, a drain electrode, a gate electrode, and a semiconductor film, wherein the semiconductor film is the p-type semiconductor film according to claim 1 .

Assignees

Inventors

Classifications

  • comprising boron · CPC title

  • Thin-film transistors [TFT] {(Stacked nanowire, nanosheet or nanoribbon FETs H10D30/501)} · CPC title

  • Carbides · CPC title

  • After-treatment · CPC title

  • Boron carbide · CPC title

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What does patent US11031558B2 cover?
A p-type semiconductor film including heterofullerene having a further sufficiently high hole mobility is provided. The p-type semiconductor film contains heterofullerene in which n+r number (where n and r are both positive odd numbers) of carbon atoms constituting a fullerene are substituted by n number of boron atom or atoms and r number of nitrogen atom or atoms.
Who is the assignee on this patent?
Panasonic Ip Man Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01L51/0046. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 08 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).